公开(公告)号：US06828571B1

公开(公告)日：2004-12-07

申请号：US10699708

申请日：2003-11-03

申请人： Mark A. McCord ,  Jan A. Lauber ,  Paul Petric ,  Ross W. Thompson ,  Jason Lim ,  Frank Y. H. Fan ,  Gabor D. Toth

发明人： Mark A. McCord ,  Jan A. Lauber ,  Paul Petric ,  Ross W. Thompson ,  Jason Lim ,  Frank Y. H. Fan ,  Gabor D. Toth

IPC分类号： H01L2100

CPC分类号： G01R31/307 ,  G01R31/2653 ,  H01J37/026 ,  H01J37/21 ,  H01J2237/0048 ,  H01J2237/20 ,  H01J2237/216 ,  H01J2237/2817

摘要： One embodiment disclosed relates to a method of setting a surface charge of an area on a substrate to a desired level. The substrate is held on a stage, and a stage bias voltage applied to the stage is controlled. A flood of electrons is directed to the area. The stage bias voltage is controlled such that the surface charge of the area reaches an equilibrium at the desired level. Another embodiment disclosed relates to a method of auto-focusing a main electron beam incident upon an imaging area of a substrate. A monitor electron beam is generated and directed towards a monitoring area of the substrate at a non-perpendicular incidence angle. An in-focus band in data collected from the monitor beam is detected. The focal length of an objective lens focusing the main beam is adjusted based upon a position of the in-focus band.

摘要翻译： 公开的一个实施例涉及一种将衬底上的区域的表面电荷设置到期望水平的方法。 将基板保持在平台上，并且控制施加到载物台的载物台偏置电压。 大量的电子被引导到该地区。 阶段偏置电压被控制使得该区域的表面电荷达到期望水平的平衡。 公开的另一实施例涉及一种自动聚焦入射到基板的成像区域上的主电子束的方法。 产生监视电子束并以非垂直入射角朝向基板的监视区域。 检测从监视器束收集的数据中的对焦带。 聚焦主光束的物镜的焦距基于对焦带的位置进行调整。