公开(公告)号：US06733165B2

公开(公告)日：2004-05-11

申请号：US10022866

申请日：2001-12-20

申请人： Sijbe Abraham Van Der Lei ,  Marnix Aldert Tas ,  Jan Hoegee ,  Paul Van Der Veen ,  Jess Koehler ,  Johannes Wangler

发明人： Sijbe Abraham Van Der Lei ,  Marnix Aldert Tas ,  Jan Hoegee ,  Paul Van Der Veen ,  Jess Koehler ,  Johannes Wangler

IPC分类号： F21V704

CPC分类号： G03F7/70066 ,  G03F7/70075 ,  Y10S385/901

摘要： An optical integrator for an illumination device of a microlithographic projection exposure system has a rod made of a material transparent for ultraviolet light and with a rectangular cross-section. A rod arrangement with, for example, seven small rods made of the same material is arranged before the entrance surface of the rod. The aspect ratio between width and height of the small rods is the inverse of the aspect ratio between width and height of the rod. The rod arrangement, or some analogous structure, surface or treatment substituted therefor, serves to compensate the direction-dependent total reflection losses of the rod.

摘要翻译： 用于微光刻投影曝光系统的照明装置的光学积分器具有由对于紫外线透明并具有矩形横截面的材料制成的杆。 具有例如由相同材料制成的七个小杆的杆装置布置在杆的入口表面之前。 小杆的宽度和高度之间的纵横比与杆的宽度和高度之间的纵横比成反比。 棒布置或替代的一些类似结构的表面或处理用于补偿杆的方向依赖的全反射损失。

公开(公告)号：US06958806B2

公开(公告)日：2005-10-25

申请号：US10717971

申请日：2003-11-21

申请人： Heine Melle Mulder ,  Jan Hoegee ,  Armand Eugene Albert Koolen

发明人： Heine Melle Mulder ,  Jan Hoegee ,  Armand Eugene Albert Koolen

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/74 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70108 ,  G03F7/70133 ,  G03F7/7085

摘要： In a lithographic apparatus the angle dependence of the intensity distribution of a projection beam at a substrate is controlled. A beam splitter is located in the beam near a pupil plane. The beam splitter splits off an auxiliary beam, which is used to measure information about the spatial intensity distribution of the beam at the pupil plane. The measured position dependence in the auxiliary beam may be decontrolled using boundary conditions inherent to the illuminator to compensate for offset between the pupil plane and a detection element. The measured position dependence may be used to control parameters of an optical element that manipulates the position dependence in the pupil plane. An example of such an optical element is a matrix of elements that controllably steer the direction of parts of the beam. Thus a continuous feedback loop may be realized.

摘要翻译： 在光刻设备中，控制投影光束在衬底处的强度分布的角度依赖性。 分束器位于光束附近的光瞳平面上。 分束器分离辅助光束，其用于测量关于光束在瞳孔平面处的空间强度分布的信息。 可以使用照明器固有的边界条件来对辅助光束中的测量位置依赖性进行解调，以补偿光瞳面与检测元件之间的偏移。 测量的位置依赖性可以用于控制操纵光瞳平面中的位置依赖性的光学元件的参数。 这种光学元件的示例是可控制地引导梁的部分的方向的元件的矩阵。 因此，可以实现连续反馈回路。

公开(公告)号：US06583855B2

公开(公告)日：2003-06-24

申请号：US09897720

申请日：2001-07-03

申请人： Jan Jaap Krikke ,  Markus Franciscus Antonius Eurlings ,  Jan Hoegee ,  Paul van der Veen

发明人： Jan Jaap Krikke ,  Markus Franciscus Antonius Eurlings ,  Jan Hoegee ,  Paul van der Veen

IPC分类号： G03B2754

CPC分类号： G03F7/70066 ,  G03F7/70191

摘要： A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.