利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

125 条记录 (耗时 0.028 秒)

    Method and apparatus for inspecting sample surface
    2.
    发明授权
    Method and apparatus for inspecting sample surface 有权
    检测样品表面的方法和装置

    公开(公告)号：US08859984B2

    公开(公告)日：2014-10-14

    申请号：US13954425

    申请日：2013-07-30

    申请人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

    发明人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

    IPC分类号： G01N23/00

    CPC分类号： H01J37/265 ,  G01R31/307 ,  H01J37/04 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2594 ,  H01J2237/2817

    摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.

    摘要翻译： 提供了一种用于以高精度检查样品表面的方法和装置。 提供了一种使用电子束法样品表面检查装置检查样品表面的方法，其中由电子束法样品表面检查装置的电子枪产生的电子束照射到样品表面上，并且发射二次电子 从样品表面形成为检测样品表面的检测器的电子检测面的图像，其特征在于，将检测器的检测面上的二次电子形成为图像的条件进行控制，使得 样品表面的电位根据照射到样品表面上的电子束的量而变化。

    Structure and method for determining a defect in integrated circuit manufacturing process
    3.
    发明授权
    Structure and method for determining a defect in integrated circuit manufacturing process 有权
    用于确定集成电路制造过程中的缺陷的结构和方法

    公开(公告)号：US08754372B2

    公开(公告)日：2014-06-17

    申请号：US13312152

    申请日：2011-12-06

    申请人： Hong Xiao

    发明人： Hong Xiao

    IPC分类号： H01J37/26

    CPC分类号： H01J37/26 ,  G01R31/024 ,  G01R31/307 ,  G11C11/401 ,  G11C2029/0403 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2814 ,  H01L22/12

    摘要： The present invention discloses a structure and a method for determining a defect in integrated circuit manufacturing process. Test keys are designed for the structure to be the interlaced arrays of grounded and floating conductive cylinders, and the microscopic image can be predicted to be an interlaced pattern of bright voltage contrast (BVC) and dark voltage contrast (DVC) signals for a charged particle beam imaging system. The system can detect the defects by comparing patterns of the detected VC signals and the predicted VC signals.

    摘要翻译： 本发明公开了一种用于确定集成电路制造工艺中的缺陷的结构和方法。 测试键设计用于结构为接地和浮动导电圆柱体的隔行阵列，并且微观图像可以预测为带电粒子的亮电压对比度（BVC）和暗电压对比度（DVC）信号的隔行扫描模式 光束成像系统。 该系统可以通过比较检测到的VC信号和预测的VC信号的模式来检测缺陷。

    Electron Beam Irradiation Method and Scanning Electron Microscope
    4.
    发明申请
    Electron Beam Irradiation Method and Scanning Electron Microscope 有权
    电子束照射方法和扫描电子显微镜

    公开(公告)号：US20130009057A1

    公开(公告)日：2013-01-10

    申请号：US13580288

    申请日：2011-02-09

    申请人： Toshiyuki Yokosuka ,  Minoru Yamazaki ,  Hideyuki Kazumi ,  Kazutami Tago

    发明人： Toshiyuki Yokosuka ,  Minoru Yamazaki ,  Hideyuki Kazumi ,  Kazutami Tago

    IPC分类号： H01J37/29

    CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/266 ,  H01J37/268 ,  H01J2237/0048 ,  H01J2237/24564 ,  H01J2237/2594

    摘要： The present invention has for its object to provide a charged particle beam irradiation method and a charged particle beam apparatus which can suppress unevenness of electrification even when a plurality of different kinds of materials are contained in a pre-dosing area or degrees of density of patterns inside the pre-dosing area differs with positions.To accomplish the above object, a charged particle beam irradiation method and a charged particle beam apparatus are provided according to which the pre-dosing area is divided into a plurality of divisional areas and electrifications are deposited to the plural divisional areas by using a beam under different beam irradiation conditions. With the above construction, the electrifications can be deposited to the pre-dosing area on the basis of such an irradiation condition that the differences in electrification at individual positions inside the pre-dosing area can be suppressed and consequently, an influence an electric field has upon the charged particle beam and electrons given off from the sample can be suppressed.

    摘要翻译： 本发明的目的是提供一种带电粒子束照射方法和带电粒子束装置，其即使在预给料区域中包含多种不同种类的材料或图案密度程度时也能抑制通电不均匀性 预给药区域内的位置与位置不同。 为了实现上述目的，提供一种带电粒子束照射方法和带电粒子束装置，根据该装置，预给料区域被分成多个分区，并且通过使用下面的束将电气沉积到多个分区域 不同的束照射条件。 通过上述结构，可以基于这样一种照射条件将电气沉积到预给料区域，即可以抑制预给料区域内各个位置的通电差异，从而影响电场 可以抑制带电粒子束和从样品发出的电子。

    METHOD AND DEVICE FOR MEASURING SURFACE POTENTIAL DISTRIBUTION, METHOD AND DEVICE FOR MEASURING INSULATION RESISTANCE, ELECTROSTATIC LATENT IMAGE MEASUREMENT DEVICE, AND CHARGING DEVICE
    5.
    发明申请
    METHOD AND DEVICE FOR MEASURING SURFACE POTENTIAL DISTRIBUTION, METHOD AND DEVICE FOR MEASURING INSULATION RESISTANCE, ELECTROSTATIC LATENT IMAGE MEASUREMENT DEVICE, AND CHARGING DEVICE 有权
    用于测量表面电位分布的方法和装置，用于测量绝缘电阻的方法和装置，静电图像测量装置和充电装置

    公开(公告)号：US20100239319A1

    公开(公告)日：2010-09-23

    申请号：US12788989

    申请日：2010-05-27

    申请人： Hiroyuki SUHARA

    发明人： Hiroyuki SUHARA

    IPC分类号： G03G15/02

    CPC分类号： G03F7/70675 ,  H01J37/268 ,  H01J2237/2594

    摘要： A surface potential distribution measurement method and device including setting a sample having a surface with a surface potential distribution in a sample installation unit wherein both an electric field intensity formed on the sample surface and a potential bias component of the sample are variable, and scanning the sample surface in a one-dimensional or two-dimensional manner by irradiating a charged particle beam to the sample. The method also includes obtaining a detection signal from charged particles generated by the scanning, to measure the surface potential distribution of the sample by varying the electric field intensity and the potential bias component in order to control a quantity of the detection signal obtained from the charged particles.

    摘要翻译： 一种表面电位分布测量方法和装置，包括在样品设置单元中设置具有表面电位分布的表面的样品，其中形成在样品表面上的电场强度和样品的电位偏置分量都是可变的，并且扫描 通过将带电粒子束照射到样品上，以一维或二维方式的样品表面。 该方法还包括从由扫描产生的带电粒子获得检测信号，通过改变电场强度和电位偏置分量来测量样品的表面电位分布，以便控制从带电的电流获得的检测信号的量 粒子。

    Inspection method and inspection system using charged particle beam
    7.
    发明授权
    Inspection method and inspection system using charged particle beam 失效
    使用带电粒子束的检查方法和检查系统

    公开(公告)号：US07521679B2

    公开(公告)日：2009-04-21

    申请号：US11706330

    申请日：2007-02-15

    申请人： Hidetoshi Nishiyama ,  Mari Nozoe

    发明人： Hidetoshi Nishiyama ,  Mari Nozoe

    IPC分类号： G21K7/00 ,  G01N23/00

    CPC分类号： H01J37/026 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/047 ,  H01J2237/2594 ,  H01J2237/2817

    摘要： An electron beam system using a scanning electron microscope equipped with a function for controlling a charged state of a sample to be observed includes electron optics for obtaining image data of the scanning electron microscope, and a monitor that displays a relationship between an equation for determining a degree of separation of peaks which appear in a histogram obtained on a basis of the image data and at least one parameter among parameters for controlling the charged state of the sample. An optimized parameter for controlling the charged stage of the sample can be visually distinguished on the monitor.

    摘要翻译： 使用具有用于控制要观察的样品的带电状态的功能的扫描电子显微镜的电子束系统包括用于获得扫描电子显微镜的图像数据的电子光学器件和显示用于确定扫描电子显微镜的方程之间的关系的监视器 基于图像数据获得的直方图中出现的峰的分离度和用于控制样品的充电状态的参数中的至少一个参数。 用于控制样品充电阶段的优化参数可以在显示器上进行目视辨别。

    METHOD AND APPARATUS FOR INSPECTING SAMPLE SURFACE
    9.
    发明申请
    METHOD AND APPARATUS FOR INSPECTING SAMPLE SURFACE 审中-公开
    检测样品表面的方法和装置

    公开(公告)号：US20090050802A1

    公开(公告)日：2009-02-26

    申请号：US12162067

    申请日：2007-01-24

    申请人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

    发明人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

    IPC分类号： G01N23/00

    CPC分类号： H01J37/265 ,  G01R31/307 ,  H01J37/04 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2594 ,  H01J2237/2817

    摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy.Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.

    摘要翻译： 提供了一种用于高精度地检查样品表面的方法和装置。 提供了一种使用电子束法样品表面检查装置检查样品表面的方法，其中由电子束法样品表面检查装置的电子枪产生的电子束照射到样品表面上，并且发射二次电子 从样品表面形成为检测样品表面的检测器的电子检测面的图像，其特征在于，将检测器的检测面上的二次电子形成为图像的条件进行控制，使得 样品表面的电位根据照射到样品表面上的电子束的量而变化。