Composite barrier films and method
    2.
    发明申请
    Composite barrier films and method 审中-公开
    复合阻挡膜及方法

    公开(公告)号:US20050109606A1

    公开(公告)日:2005-05-26

    申请号:US10969836

    申请日:2004-10-21

    摘要: In one embodiment, the invention relates to a method of depositing a silicon nitride based coating on a plastic substrate to form a composite barrier film which comprises depositing a silicon nitride based coating on the substrate by sputtering of a silicon target in an atmosphere comprising at least about 75% by volume nitrogen. In another embodiment, the composite films prepared by the method of the invention comprise a silicon nitride based coating on a flexible plastic substrate wherein the silicon nitride based coating has a thickness of less than about 220 nm and a visible light transmittance of at least about 75%.

    摘要翻译: 在一个实施方案中,本发明涉及一种在塑料基材上沉积氮化硅基涂层以形成复合阻挡膜的方法,该方法包括通过在至少包括至少包括硅酸盐的气氛中溅射硅靶来在衬底上沉积氮化硅基涂层 约75体积%的氮气。 在另一个实施方案中,通过本发明的方法制备的复合膜包括在柔性塑料基材上的基于氮化硅的涂层,其中基于氮化硅的涂层具有小于约220nm的厚度和至少约75的可见光透射率 %。