公开(公告)号：US20240270633A1

公开(公告)日：2024-08-15

申请号：US18627544

申请日：2024-04-05

申请人： Applied Materials, Inc.

发明人： Alexia Adilene PORTILLO RIVERA ,  Andrew CEBALLOS ,  Kenichi OHNO ,  Rami HOURANI ,  Karl J. ARMSTRONG ,  Brian Alexander COHEN

IPC分类号： C03C17/36 ,  C23C14/06 ,  C23C14/08 ,  C23C14/18 ,  C23C14/34

CPC分类号： C03C17/3615 ,  C03C17/3626 ,  C03C17/3642 ,  C03C17/3644 ,  C03C17/3663 ,  C23C14/0652 ,  C23C14/08 ,  C23C14/18 ,  C23C14/3407 ,  C03C2218/154

摘要： Embodiments of the present disclosure generally relate to encapsulated optical devices and methods for fabricating the encapsulated optical devices. In one or more embodiments, a method for encapsulating an optical device includes depositing a metallic silver layer on a substrate, depositing a barrier layer on the metallic silver layer, where the barrier layer contains silicon nitride, a metallic element, a metal nitride, or any combination thereof, and depositing an encapsulation layer containing silicon oxide on the barrier layer.

公开(公告)号：US20240231240A1

公开(公告)日：2024-07-11

申请号：US18609433

申请日：2024-03-19

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Yung-Yao LEE

IPC分类号： G03F7/00 ,  C09D1/00 ,  C09D5/00 ,  C23C14/06 ,  C23C14/08 ,  C23C16/34 ,  C23C16/40

CPC分类号： G03F7/70316 ,  C09D1/00 ,  C09D5/00 ,  C23C14/0652 ,  C23C14/0694 ,  C23C14/08 ,  C23C16/345 ,  C23C16/40 ,  G03F7/70341

摘要： A bottom lens for an immersion exposure tool includes a hydrophobic coating on the sidewalls of the bottom lens. A bottom portion of the bottom lens is not coated with the hydrophobic coating to maintain the optical performance of the bottom lens and to not distort a pattern that is to be transferred to a substrate. The hydrophobic coating may reduce the thermal instability of the bottom lens. This may reduce overlay variation during operation of the immersion exposure tool, which may increase manufacturing yield, decrease device failures, and/or decrease rework and repairs.

公开(公告)号：US11732363B2

公开(公告)日：2023-08-22

申请号：US17846626

申请日：2022-06-22

申请人： SAINT-GOBAIN GLASS FRANCE

发明人： Julian Lingner ,  Jan Hagen ,  Norbert Huhn ,  Julie Ruff

IPC分类号： C23C28/00 ,  C03C17/36 ,  C23C14/06 ,  C23C14/18 ,  C23C14/35 ,  C23C16/27 ,  C23C16/50

CPC分类号： C23C28/321 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3634 ,  C03C17/3649 ,  C23C14/0611 ,  C23C14/0652 ,  C23C14/18 ,  C23C14/35 ,  C23C16/27 ,  C23C16/50 ,  C23C28/343 ,  C03C2218/152 ,  C03C2218/156 ,  C03C2218/328 ,  Y10T428/12576 ,  Y10T428/12597 ,  Y10T428/12611 ,  Y10T428/12625 ,  Y10T428/12708 ,  Y10T428/12729

摘要： A coated substrate includes a coating, wherein the coating includes, starting from the substrate in this order: a. a layer of diamond-like carbon, b. a metallic multi-ply layer, wherein the metallic multi-ply layer contains b1) tin and at least one alloying element for tin, or b2) magnesium and at least one alloying element for magnesium, wherein the metallic multi-ply layer is formed from two, three, or more plies, wherein one or more plies contain tin and one or more plies made of at least one alloying element for tin selected from antimony, copper, lead, silver, indium, gallium and/or germanium, are arranged alternatingly, or wherein one or more plies contain magnesium and one or more plies made of at least one alloying element for magnesium selected from aluminum, bismuth, manganese, copper, cadmium, iron, strontium, zirconium, thorium, lithium, nickel, lead, silver, chromium, silicon, tin, gadolinium, yttrium, calcium and/or antimony, are arranged alternatingly.

公开(公告)号：US11669008B2

公开(公告)日：2023-06-06

申请号：US17077176

申请日：2020-10-22

申请人： Applied Materials, Inc.

发明人： Wen Xiao ,  Sanjay Bhat ,  Shiyu Liu ,  Binni Varghese ,  Vibhu Jindal ,  Azeddine Zerrade

IPC分类号： G03F1/22 ,  C23C14/34 ,  H01J37/34 ,  C23C14/06 ,  H01J37/32 ,  C23C14/00

CPC分类号： G03F1/22 ,  C23C14/0036 ,  C23C14/0652 ,  C23C14/0676 ,  C23C14/3464 ,  H01J37/32477 ,  H01J37/3429

摘要： Methods for the manufacture of extreme ultraviolet (EUV) mask blanks and production systems therefor are disclosed. A method for forming an EUV mask blank comprises forming a bilayer on a portion of a multi-cathode PVD chamber interior and then forming a multilayer stack of Si/Mo on a substrate in the multi-cathode PVD chamber.

公开(公告)号：US11668990B2

公开(公告)日：2023-06-06

申请号：US16947757

申请日：2020-08-14

申请人： View, Inc.

发明人： Robert T. Rozbicki ,  Sridhar Karthik Kailasam ,  Robin Friedman ,  Dane Thomas Gillaspie ,  Anshu A. Pradhan ,  Disha Mehtani

IPC分类号： G02F1/15 ,  G02F1/1524 ,  G02F1/1523 ,  G02F1/155 ,  H01B5/14 ,  H01B13/00 ,  G02F1/1333 ,  G02F1/153 ,  C23C14/34 ,  C23C14/02 ,  C23C14/06 ,  C23C14/08 ,  G02F1/13 ,  H01J37/34

CPC分类号： G02F1/15 ,  C23C14/028 ,  C23C14/06 ,  C23C14/0635 ,  C23C14/0641 ,  C23C14/0652 ,  C23C14/0676 ,  C23C14/08 ,  C23C14/081 ,  C23C14/083 ,  C23C14/086 ,  C23C14/34 ,  G02F1/1309 ,  G02F1/133345 ,  G02F1/155 ,  G02F1/1523 ,  G02F1/1524 ,  G02F1/1533 ,  H01B5/14 ,  H01B13/00 ,  H01J37/3429 ,  H01J37/3476 ,  G02F2001/1536 ,  G02F2001/1555 ,  G02F2201/508

摘要： Electrochromic devices and methods may employ the addition of a defect-mitigating insulating layer which prevents electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, an encapsulating layer is provided to encapsulate particles and prevent them from ejecting from the device stack and risking a short circuit when subsequent layers are deposited. The insulating layer may have an electronic resistivity of between about 1 and 108 Ohm-cm. In some embodiments, the insulating layer contains one or more of the following metal oxides: aluminum oxide, zinc oxide, tin oxide, silicon aluminum oxide, cerium oxide, tungsten oxide, nickel tungsten oxide, and oxidized indium tin oxide. Carbides, nitrides, oxynitrides, and oxycarbides may also be used.

公开(公告)号：US20180194676A1

公开(公告)日：2018-07-12

申请号：US15742310

申请日：2016-06-30

申请人： SAINT-GOBAIN GLASS FRANCE

发明人： Jean Carlos LORENZZI ,  Thierry KAUFFMANN

IPC分类号： C03C17/36 ,  C23C14/00 ,  C23C14/06 ,  C23C14/08 ,  C23C14/18 ,  C23C14/34

CPC分类号： C03C17/3639 ,  C03C17/36 ,  C03C17/3613 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C03C2218/156 ,  C23C14/0036 ,  C23C14/0652 ,  C23C14/083 ,  C23C14/086 ,  C23C14/185 ,  C23C14/3464

摘要： A material includes a transparent substrate coated with a stack of thin layers successively including, starting from the substrate, an alternation of three silver-based functional metallic layers and of four dielectric coatings, so that each functional metallic layer is positioned between two dielectric coatings. The thicknesses of the three functional layers and the thicknesses of the dielectric coatings are selected in order to give the materials solar factor values of less than 20% for a light transmission of the order of 40%.

公开(公告)号：US09989684B2

公开(公告)日：2018-06-05

申请号：US15004754

申请日：2016-01-22

申请人： Materion Corporation

发明人： Robert Sprague

IPC分类号： G02B5/28 ,  C23C14/16 ,  C23C14/34 ,  G02B5/20 ,  C23C14/06 ,  C23C14/10

CPC分类号： G02B5/281 ,  C23C14/0652 ,  C23C14/10 ,  C23C14/165 ,  C23C14/34 ,  C23C14/3414 ,  G02B5/207 ,  G02B5/208

摘要： An interference filter includes a layers stack comprising a plurality of layers of at least: layers of amorphous hydrogenated silicon with added nitrogen (a-Si:H,N) and layers of one or more dielectric materials, such as SiO2, SiOx, SiOxNy, a dielectric material with a higher refractive index in the range 1.9 to 2.7 inclusive, or so forth. The interference filter is designed to have a passband center wavelength in the range 750-1000 nm inclusive. Layers of a dielectric material with a higher refractive index in the range 1.9 to 2.7 inclusive provide a smaller angle shift compared with a similar interference filter using SiO2 as the low index layers.

公开(公告)号：US20180046053A1

公开(公告)日：2018-02-15

申请号：US15794805

申请日：2017-10-26

申请人： View, Inc.

发明人： Robert T. Rozbicki

IPC分类号： G02F1/153 ,  C23C14/02 ,  H01B13/00 ,  H01B5/14 ,  C23C14/08 ,  G02F1/155 ,  G02F1/15 ,  G02F1/1333 ,  G02F1/13 ,  C23C14/34 ,  H01J37/34 ,  C23C14/06

CPC分类号： G02F1/1533 ,  C23C14/028 ,  C23C14/06 ,  C23C14/0635 ,  C23C14/0641 ,  C23C14/0652 ,  C23C14/0676 ,  C23C14/08 ,  C23C14/081 ,  C23C14/083 ,  C23C14/086 ,  C23C14/34 ,  G02F1/1309 ,  G02F1/133345 ,  G02F1/15 ,  G02F1/1523 ,  G02F1/155 ,  G02F2001/1536 ,  G02F2001/1555 ,  G02F2201/508 ,  H01B5/14 ,  H01B13/00 ,  H01J37/3429 ,  H01J37/3476

摘要： Electrochromic devices and methods may employ the addition of a defect-mitigating insulating layer which prevents electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, an encapsulating layer is provided to encapsulate particles and prevent them from ejecting from the device stack and risking a short circuit when subsequent layers are deposited. The insulating layer may have an electronic resistivity of between about 1 and 108 Ohm-cm. In some embodiments, the insulating layer contains one or more of the following metal oxides: aluminum oxide, zinc oxide, tin oxide, silicon aluminum oxide, cerium oxide, tungsten oxide, nickel tungsten oxide, and oxidized indium tin oxide. Carbides, nitrides, oxynitrides, and oxycarbides may also be used.

公开(公告)号：US09874780B2

公开(公告)日：2018-01-23

申请号：US14908548

申请日：2015-12-28

申请人： Shenzhen China Star Optoelectronics Technology Co., Ltd.

发明人： Hongquan Wei ,  Yanan Wang

IPC分类号： G02F1/1335 ,  G02F1/1337 ,  C23C14/06

CPC分类号： G02F1/13362 ,  B82Y20/00 ,  C23C14/0652 ,  C23C14/225 ,  G02F1/133528 ,  G02F1/133533 ,  G02F1/133617 ,  G02F1/1337 ,  G02F2001/133614 ,  G02F2202/36

摘要： The present invention provides a liquid crystal display device and a manufacturing method thereof. The liquid crystal display device uses a quantum rod orientation layer (2) to conduct parallel alignment of a quantum rod layer (3) so that the aligned quantum rod layer (3) may replace a conventional lower polarizer. The liquid crystal display device manufacturing method applies an inclined vapor deposition process to form a quantum rod orientation layer (2). The quantum rod orientation layer (2) includes a plurality of grooves (21) that has an extension direction substantially perpendicular to a transmission axis direction of an upper polarizer (7). A quantum rod layer (3) is then formed on the quantum rod orientation layer (2). The quantum rod layer (3) so formed includes a plurality of quantum rods (31) that has a long axis direction substantially parallel to the extension direction of the grooves (21), namely parallel alignment of the quantum rod layer (3). The aligned quantum rod layer (3) may replace a conventional lower polarizer to improve light transmission rate and utilization of backlighting, increasing displaying brightness and reducing manufacturing cost.

公开(公告)号：US09850570B2

公开(公告)日：2017-12-26

申请号：US15203747

申请日：2016-07-06

申请人： Intevac, Inc.

发明人： Terry Bluck ,  Babak Adibi

IPC分类号： B32B15/04 ,  B32B17/06 ,  C23C14/48 ,  C03C17/245 ,  C23C14/06 ,  C23C14/08 ,  C23C14/56

CPC分类号： C23C14/48 ,  C03C17/245 ,  C03C17/36 ,  C03C17/3626 ,  C03C17/3644 ,  C03C17/366 ,  C23C14/0652 ,  C23C14/083 ,  C23C14/568

摘要： The use of non-mass analyzed ion implanter is advantageous in such application as it generates ion implanting at different depth depending on the ions energy and mass. This allows for gaining advantage from lubricity offered as a result of the very light deposition on the surface, and at the same time the hardness provided by the intercalated ions implanted below it, providing benefits for cover glass, low E enhancement, and other similar materials. In further aspects, ion implantation is used to create other desirable film properties such anti-microbial and corrosion resistance.