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    Elastomer spatial light modulators for extreme ultraviolet lithography
    2.
    发明授权
    Elastomer spatial light modulators for extreme ultraviolet lithography 有权
    用于极紫外光刻的弹性体空间光调制器

    公开(公告)号：US07092138B2

    公开(公告)日：2006-08-15

    申请号：US10962055

    申请日：2004-10-08

    申请人： Jen-Shiang Wang ,  Il Woong Jung ,  Olav Solgaard

    发明人： Jen-Shiang Wang ,  Il Woong Jung ,  Olav Solgaard

    IPC分类号： G02F1/03

    CPC分类号： G02B5/0891 ,  G02B26/0825 ,  G21K1/06 ,  G21K2201/067

    摘要： A new design and fabrication process of an elastomer spatial light modulator (eSLM). The present invention resolves many known challenges and enables the eSLM to operate as programmable masks for the EUV lithography systems. Bottom electrodes are deposited and patterned on an insulation layer. A sacrificial layer is then deposited, patterned and polished on top of the bottom electrodes. A nitride shell forms a protection layer that prevents out-gassing and degradations of elastomer during operations. The sacrificial layer is removed, forming a cavity. An elastomer is injected at one end of the cavity and pulled into it by capillary forces. In an embodiment, the eSLM comprises a 2-D array of elastomer pillars, each containing a capacitive actuator with an elastomer as the supporting and dielectric structure. A stack of Mo/Si multilayer mirror is deposited on the surface to achieve a high reflectivity about 70% or more in EUV.

    摘要翻译： 弹性体空间光调制器（eSLM）的新设计和制造工艺。 本发明解决了许多已知的挑战，使eSLM能够作为EUV光刻系统的可编程掩模来操作。 在绝缘层上沉积和图案化底电极。 然后在底部电极的顶部上沉积，图案化和抛光牺牲层。 氮化物壳形成保护层，其在操作期间防止弹性体的排气和降解。 去除牺牲层，形成空腔。 在空腔的一端注入弹性体，并通过毛细管力将其拉入。 在一个实施例中，eSLM包括弹性体柱的2-D阵列，每个阵列包含具有弹性体作为支撑和电介质结构的电容性致动器。 一层Mo / Si多层反射镜沉积在表面上，以实现在EUV中约70％或更高的高反射率。

    Elastomer spatial light modulators for extreme ultraviolet lithography
    3.
    发明申请
    Elastomer spatial light modulators for extreme ultraviolet lithography 有权
    用于极紫外光刻的弹性体空间光调制器

    公开(公告)号：US20050146768A1

    公开(公告)日：2005-07-07

    申请号：US10962055

    申请日：2004-10-08

    申请人： Jen-Shiang Wang ,  Il Jung ,  Olav Solgaard

    发明人： Jen-Shiang Wang ,  Il Jung ,  Olav Solgaard

    IPC分类号： G02B5/08 ,  G02B26/08 ,  G02F1/03 ,  G02F1/07 ,  G21K1/06

    CPC分类号： G02B5/0891 ,  G02B26/0825 ,  G21K1/06 ,  G21K2201/067

    摘要： A new design and fabrication process of an elastomer spatial light modulator (eSLM). The present invention resolves many known challenges and enables the eSLM to operate as programmable masks for the EUV lithography systems. Bottom electrodes are deposited and patterned on an insulation layer. A sacrificial layer is then deposited, patterned and polished on top of the bottom electrodes. A nitride shell forms a protection layer that prevents out-gassing and degradations of elastomer during operations. The sacrificial layer is removed, forming a cavity. An elastomer is injected at one end of the cavity and pulled into it by capillary forces. In an embodiment, the eSLM comprises a 2-D array of elastomer pillars, each containing a capacitive actuator with an elastomer as the supporting and dielectric structure. A stack of Mo/Si multilayer mirror is deposited on the surface to achieve a high reflectivity about 70% or more in EUV.

    摘要翻译： 弹性体空间光调制器（eSLM）的新设计和制造工艺。 本发明解决了许多已知的挑战，使eSLM能够作为EUV光刻系统的可编程掩模来操作。 在绝缘层上沉积和图案化底电极。 然后在底部电极的顶部上沉积，图案化和抛光牺牲层。 氮化物壳形成保护层，其在操作期间防止弹性体的排气和降解。 去除牺牲层，形成空腔。 在空腔的一端注入弹性体，并通过毛细管力将其拉入。 在一个实施例中，eSLM包括弹性体柱的2-D阵列，每个阵列包含具有弹性体作为支撑和电介质结构的电容性致动器。 一层Mo / Si多层反射镜沉积在表面上，以实现在EUV中约70％或更高的高反射率。