公开(公告)号：US06815653B2

公开(公告)日：2004-11-09

申请号：US10122687

申请日：2002-04-15

申请人： Jenq-Yann Tsay ,  Jeng-Chiang Chuang ,  Chih-Pen Yen ,  Yung-Mao Hsu

发明人： Jenq-Yann Tsay ,  Jeng-Chiang Chuang ,  Chih-Pen Yen ,  Yung-Mao Hsu

IPC分类号： H01L21306

CPC分类号： H01J37/32431 ,  C23C16/4401 ,  G01J3/443 ,  G01N21/55 ,  G01N2021/8411 ,  G01N2021/8427 ,  H01J2237/0225

摘要： A method and apparatus for detecting material accretion and peeling in a system such as a plasma process chamber, including multiple optical sensors which are provided in the chamber above a gas distribution plate or other surface inside the chamber. The optical sensors are connected to a central process controller that is capable of terminating operation of the chamber and may be equipped with an alarm. In the event that the optical sensors detect asymmetries in brightness or light reflection among various portions or regions of the gas distribution plate or other surface, which asymmetries may indicate the formation of a material coating on the plate or dislodging of contaminant particles from the plate, a signal is sent to the process controller, which may be adapted to terminate the plasma process, alert operating personnel, or both.

摘要翻译： 一种用于检测诸如等离子体处理室的系统中的材料吸积和剥离的方法和装置，包括设置在气室内的气体分配板或室内的其他表面上的多个光学传感器。 光学传感器连接到能够终止腔室操作的中央过程控制器，并且可以配备有报警器。 在光学传感器检测气体分布板或其他表面的各个部分或区域之间的亮度或光反射不对称性的情况下，这种不对称性可指示板上的材料涂层的形成或从板上移除污染物颗粒， 信号被发送到过程控制器，其可以适于终止等离子体处理，警报操作人员或两者。