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    Illumination system for a microlithography projection exposure installation
    1.
    发明授权
    Illumination system for a microlithography projection exposure installation 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US07714983B2

    公开(公告)日：2010-05-11

    申请号：US10571475

    申请日：2004-09-13

    申请人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    发明人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    IPC分类号： G03B27/54 ,  G03B27/72 ,  G03B27/42

    CPC分类号： G03F7/70116 ,  G03F7/702

    摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

    摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

    Zoom system for an illumination device
    2.
    发明授权
    Zoom system for an illumination device 失效
    照明装置的变焦系统

    公开(公告)号：US06864960B2

    公开(公告)日：2005-03-08

    申请号：US10234143

    申请日：2002-09-05

    申请人： Jess Koehler ,  Johannes Wangler

    发明人： Jess Koehler ,  Johannes Wangler

    IPC分类号： G02B15/177 ,  G03F7/20 ,  G03B27/54 ,  G03B27/42

    CPC分类号： G03F7/70183 ,  G02B15/177

    摘要： A zoom system for an illumination device of a microlithographic projection exposure system is configured in the form of a focal-length zoom lens. The lenses of the zoom system define an object plane (6) and an image plane (8) that is a Fourier transform of the object plane. The zoom system is characterized by a large expansion of the illuminated area in the image plane, where expansion factors (D) in excess of four are feasible and are obtained by employing lens groups (33, 36) that are movable over large moving ranges.

    摘要翻译： 用于微光刻投影曝光系统的照明装置的变焦系统被配置为焦距变焦透镜的形式。 变焦系统的透镜定义物体平面（6）和作为物平面的傅里叶变换的图像平面（8）。 变焦系统的特征在于图像平面中的照明区域的大的扩展，其中超过4的扩展因子（D）是可行的，并且通过使用可在大移动范围上移动的透镜组（33,36）获得。

    ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION
    3.
    发明申请
    ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION 审中-公开
    用于微观投影曝光安装的照明系统

    公开(公告)号：US20100195077A1

    公开(公告)日：2010-08-05

    申请号：US12758554

    申请日：2010-04-12

    申请人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    发明人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70116 ,  G03F7/702

    摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

    摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

    Illumination system for a microlithography projection exposure installation
    4.
    发明申请
    Illumination system for a microlithography projection exposure installation 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US20070165202A1

    公开(公告)日：2007-07-19

    申请号：US10571475

    申请日：2004-09-13

    申请人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    发明人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70116 ,  G03F7/702

    摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

    摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

    Optical integrator for an illumination device
    5.
    发明授权
    Optical integrator for an illumination device 失效
    用于照明装置的光学积分器

    公开(公告)号：US06733165B2

    公开(公告)日：2004-05-11

    申请号：US10022866

    申请日：2001-12-20

    申请人： Sijbe Abraham Van Der Lei ,  Marnix Aldert Tas ,  Jan Hoegee ,  Paul Van Der Veen ,  Jess Koehler ,  Johannes Wangler

    发明人： Sijbe Abraham Van Der Lei ,  Marnix Aldert Tas ,  Jan Hoegee ,  Paul Van Der Veen ,  Jess Koehler ,  Johannes Wangler

    IPC分类号： F21V704

    CPC分类号： G03F7/70066 ,  G03F7/70075 ,  Y10S385/901

    摘要： An optical integrator for an illumination device of a microlithographic projection exposure system has a rod made of a material transparent for ultraviolet light and with a rectangular cross-section. A rod arrangement with, for example, seven small rods made of the same material is arranged before the entrance surface of the rod. The aspect ratio between width and height of the small rods is the inverse of the aspect ratio between width and height of the rod. The rod arrangement, or some analogous structure, surface or treatment substituted therefor, serves to compensate the direction-dependent total reflection losses of the rod.

    摘要翻译： 用于微光刻投影曝光系统的照明装置的光学积分器具有由对于紫外线透明并具有矩形横截面的材料制成的杆。 具有例如由相同材料制成的七个小杆的杆装置布置在杆的入口表面之前。 小杆的宽度和高度之间的纵横比与杆的宽度和高度之间的纵横比成反比。 棒布置或替代的一些类似结构的表面或处理用于补偿杆的方向依赖的全反射损失。

    Microlithographic projection exposure apparatus
    6.
    发明授权
    Microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置

    公开(公告)号：US08891057B2

    公开(公告)日：2014-11-18

    申请号：US12818501

    申请日：2010-06-18

    申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

    摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

    摘要翻译： 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。

    Illumination optical unit for projection lithography
    8.
    发明授权
    Illumination optical unit for projection lithography 有权
    用于投影光刻的照明光学单元

    公开(公告)号：US08294877B2

    公开(公告)日：2012-10-23

    申请号：US13368430

    申请日：2012-02-08

    申请人： Johannes Wangler ,  Markus Deguenther ,  Stig Bieling

    发明人： Johannes Wangler ,  Markus Deguenther ,  Stig Bieling

    IPC分类号： G03B27/54 ,  G03B27/42

    CPC分类号： G03F7/70058

    摘要： An illumination optical unit for projection lithography for illuminating an object field, in which an object to be imaged can be arranged, with illumination light has a field facet mirror having a plurality of field facets. A pupil facet mirror of the illumination optical unit has a plurality of pupil facets. The pupil facets serve for imaging the field facets respectively assigned individually to the pupil facets into the object field. An individual mirror array of the illumination optical unit has individual mirrors that can be tilted in driven fashion individually. The individual mirror array is arranged in an illumination light beam path upstream of the field facet mirror. This can result in flexibly configurable illumination by the illumination optical unit, this illumination being readily adaptable to predetermined values.

    摘要翻译： 用于照射物场的投影光刻用的照明光学单元，其中可以利用照明光布置要成像的物体，具有具有多个场面的场面反射镜。 照明光学单元的瞳孔面镜具有多个光瞳面。 瞳孔面用于将分别分配给瞳孔面的场面刻面成像为物场。 照明光学单元的单个反射镜阵列具有可以分别以驱动方式倾斜的各个反射镜。 单个反射镜阵列布置在场分面反射镜上游的照明光束路径中。 这可以导致由照明光学单元灵活配置的照明，该照明容易适应于预定值。

    Illumination system for a microlithographic projection exposure apparatus
    9.
    发明授权
    Illumination system for a microlithographic projection exposure apparatus 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US08004656B2

    公开(公告)日：2011-08-23

    申请号：US11505408

    申请日：2006-08-17

    申请人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

    发明人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G03B27/52 ,  G03B27/72

    CPC分类号： G03F7/7015 ,  G03B27/54 ,  G03F7/70075 ,  G03F7/70108

    摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

    摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。