公开(公告)号：US20100195077A1

公开(公告)日：2010-08-05

申请号：US12758554

申请日：2010-04-12

申请人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

发明人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

IPC分类号： G03B27/54

CPC分类号： G03F7/70116 ,  G03F7/702

摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

公开(公告)号：US20070165202A1

公开(公告)日：2007-07-19

申请号：US10571475

申请日：2004-09-13

申请人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

发明人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

IPC分类号： G03B27/54

CPC分类号： G03F7/70116 ,  G03F7/702

摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

公开(公告)号：US07714983B2

公开(公告)日：2010-05-11

申请号：US10571475

申请日：2004-09-13

申请人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

发明人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03B27/42

CPC分类号： G03F7/70116 ,  G03F7/702

摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

公开(公告)号：US20060221453A1

公开(公告)日：2006-10-05

申请号：US11375552

申请日：2006-03-15

申请人： Jess Koehler ,  Damian Fiolka

发明人： Jess Koehler ,  Damian Fiolka

IPC分类号： G02B27/10

CPC分类号： G03F7/70075 ,  G02B5/3083 ,  G02B27/285 ,  G03F7/70566

摘要： A fly's eye condenser (15) for converting an input light distribution into an output light distribution has at least one raster arrangement of optical groups (21, 22), of which at least some comprise polarization-changing means (30) suitable for changing polarization. The polarization-changing means include at least one layer of birefringent material associated with an optical group. The layer of birefringent material of at least two optical groups has a different thickness in a passage direction of the light. The fly's eye condenser thus permits specific, location-dependent control of the polarization state of the output light distribution. If the fly's eye condenser is used in an illumination system (10), then it can be used not only to homogenize the light distribution on the illumination plane of the illumination system but, at the same time, a location-dependent or angle-dependent polarization distribution can also be set in the illumination plane.

摘要翻译： 用于将输入光分布转换成输出光分布的蝇眼聚光器（15）具有光学组（21,22）的至少一个光栅装置，其中至少一些包括适于改变偏振的偏振改变装置（30） 。 偏振改变装置包括与光学组相关联的至少一层双折射材料。 至少两个光学组的双折射材料层在光的通过方向上具有不同的厚度。 因此，蝇眼聚光器允许对输出光分布的偏振态的特定的，位置相关的控制。 如果在照明系统（10）中使用蝇眼聚光器，则不仅可以将照明系统的照明平面上的光分布均匀化，而且可以同时使用位置相关或角度依赖 也可以在照明平面中设置极化分布。

公开(公告)号：US20050094268A1

公开(公告)日：2005-05-05

申请号：US10922380

申请日：2004-08-19

申请人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

发明人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

IPC分类号： G02B17/08 ,  G02B27/09 ,  G02B27/28 ,  G03F7/20 ,  G02F1/1335

CPC分类号： G03F7/70241 ,  G02B27/0994 ,  G02B27/286 ,  G03F7/70191 ,  G03F7/70966

摘要： An optical system (1) includes a first optical subsystem (3) with at least a first birefringent optical element (7), and further includes a second optical subsystem (5) with at least a second birefringent optical element (9). Between the first optical subsystem and the second optical subsystem, an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a retardation of one-half of a wavelength between two mutually orthogonal states of polarization.

摘要翻译： 光学系统（1）包括具有至少第一双折射光学元件（7）的第一光学子系统（3），并且还包括具有至少第二双折射光学元件（9）的第二光学子系统（5）。 在第一光学子系统和第二光学子系统之间布置有至少具有第一光学延迟元件（15）的光学延迟系统（13），其引入两个相互正交的极化状态之间的波长的一半的延迟 。

公开(公告)号：US09316920B2

公开(公告)日：2016-04-19

申请号：US12717696

申请日：2010-03-04

申请人： Damian Fiolka ,  Daniel Walldorf ,  Ingo Saenger

发明人： Damian Fiolka ,  Daniel Walldorf ,  Ingo Saenger

IPC分类号： G03B27/72 ,  G03F7/20

CPC分类号： G03F7/702 ,  G03F7/70116 ,  G03F7/70566

摘要： The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states of polarization incident on different mirror units. The mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement.

摘要翻译： 本公开涉及微光刻投影曝光装置的照明系统。 照明系统包括具有多个镜单元和在光传播方向上布置在镜装置前面的至少一个元件以产生入射在不同镜单元上的至少两种不同偏振态的反射镜装置。 反射镜单元彼此独立地移位，以改变由反射镜装置反射的光的角度分布。

公开(公告)号：US09304405B2

公开(公告)日：2016-04-05

申请号：US12974436

申请日：2010-12-21

申请人： Damian Fiolka ,  Michael Totzeck ,  Hartmut Enkisch ,  Stephan Muellender

发明人： Damian Fiolka ,  Michael Totzeck ,  Hartmut Enkisch ,  Stephan Muellender

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70566

摘要： An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.

摘要翻译： 用于微光刻的照明光学单元用照明光照亮物场。 该单元包括具有多个第一小面的第一小面镜和具有多个第二面的第二小面镜。 该单元具有分面对，其分别包括第一分面反射镜的小平面和第二分面反射镜的小平面，其预定义用于照亮对象场的多个照明通道。 至少一些照明通道在每种情况下都具有分配的偏振元件，用于预定义在各个照明通道中引导的照明光的单独偏振状态。

公开(公告)号：US09235137B2

公开(公告)日：2016-01-12

申请号：US13370829

申请日：2012-02-10

申请人： Damian Fiolka ,  Ralf Stuetzle

发明人： Damian Fiolka ,  Ralf Stuetzle

IPC分类号： G03B27/72 ,  G03F7/20 ,  G02B27/09 ,  G21K1/06 ,  G21K1/16

CPC分类号： G03F7/70233 ,  G02B27/0905 ,  G02B27/0977 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70566 ,  G21K1/06 ,  G21K1/16 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067

摘要： An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.

摘要翻译： 照明光学单元包括集光镜，其在照明光学单元的操作期间产生施加到第一刻面光学元件的偏振分布。 存在施加具有不同极化的辐射的至少两个第一小面元件。 第一刻面光学元件具有至少一个第一状态，其中第一面元件的反射表面的法向矢量被选择为使得在照明光学单元的操作期间在物场的位置处产生第一预定偏振分布 。

公开(公告)号：US09128389B2

公开(公告)日：2015-09-08

申请号：US13010145

申请日：2011-01-20

申请人： Damian Fiolka

发明人： Damian Fiolka

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70566

摘要： The disclosure relates to a method for modifying a polarization distribution in a microlithographic projection exposure apparatus, and to a microlithographic projection exposure apparatus. The projection exposure apparatus has an illumination device and a projection objective. The illumination device has an optical axis and a correction arrangement having a lambda/4 plate arranged rotatably about the optical axis and/or a lambda/2 plate arranged rotatably about the optical axis. The method includes determining a polarization distribution in a predetermined plane of the projection exposure apparatus, and rotating the lambda/4 plate and/or the lambda/2 plate about the optical axis so that a local variation of the polarization distribution is reduced after rotation in comparison with the state before the rotating.

摘要翻译： 本公开涉及一种用于修改微光刻投影曝光装置中的偏振分布的方法，以及微光刻投影曝光装置。 投影曝光装置具有照明装置和投影物镜。 照明装置具有光轴和具有围绕光轴可旋转地设置的λ/ 4板和/或围绕光轴可旋转地设置的λ/ 2板的校正装置。 该方法包括确定投影曝光设备的预定平面中的偏振分布，以及围绕光轴旋转λ/ 4板和/或λ/ 2板，使得在旋转之后偏振分布的局部变化减小 与旋转前的状态进行比较。

公开(公告)号：US09013684B2

公开(公告)日：2015-04-21

申请号：US13556408

申请日：2012-07-24

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC分类号： G03F7/20 ,  G02B26/08 ,  G01M11/00 ,  G01N21/55

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

摘要翻译： 微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。 每个元件基于施加到元件的控制信号偏离入射光束。 该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。 估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。 照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。