公开(公告)号：US4507078A

公开(公告)日：1985-03-26

申请号：US479197

申请日：1983-03-28

申请人： Johann Tam ,  Jalal Ashjaee ,  Nobuo B. Kuwaki ,  Tuan M. Ngo ,  Susan W. Kung

发明人： Johann Tam ,  Jalal Ashjaee ,  Nobuo B. Kuwaki ,  Tuan M. Ngo ,  Susan W. Kung

IPC分类号： B65G43/08 ,  B65G49/07 ,  B65H5/02 ,  B65H9/14 ,  G03F7/26 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68 ,  F27D3/00 ,  B65G15/00 ,  B65G43/00 ,  F27B9/14

CPC分类号： H01L21/681 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67706 ,  Y10S414/136

摘要： A wafer handling method and apparatus insures proper centering of a wafer at a work station and controls the heat transferred to the wafer in a baking operation. The amount of heat transferred and the rate at which the heat is transferred to the wafer are regulated by controlling the distance between the wafer and a hot plate. The hot plate is maintained at a constant temperature higher than the bake out or equilibrium temperature to which the wafer is to be heated.

摘要翻译： 晶片处理方法和装置确保在工作站处适当地对准晶片，并且在烘烤操作中控制传递到晶片的热量。 通过控制晶片和热板之间的距离来调节传递的热量和传递到晶片的速率。 热板保持在高于晶片加热到的烘烤温度或平衡温度的恒定温度。

公开(公告)号：US4227347A

公开(公告)日：1980-10-14

申请号：US942268

申请日：1978-09-14

申请人： Johann Tam

发明人： Johann Tam

IPC分类号： B24B9/06 ,  B24B47/12 ,  B28D5/02 ,  B24B47/00

CPC分类号： B24B47/12 ,  B24B9/065 ,  B28D5/02

摘要： A drive mechanism for a wafer processing machine of the kind which holds a silicon wafer on a vacuum chuck and rotates the wafer for processing operations on the wafer periphery or upper surface incorporates a low-speed motor, a high-speed motor and an overrunning clutch. The low-speed motor is connected to a drive shaft for the chuck through the overrunning clutch and rotates the chuck and wafer at a relatively low and precisely-controlled speed while the edge of the wafer is contoured by a grinding wheel or while the upper surface is mechanically cleaned by a brush engaged with the upper surface of the wafer. The high-speed motor is directly connected to the drive shaft and, when energized for a rinsing and drying operation, rotates the chuck and wafer in the same direction of rotation as the low-speed motor but at high speed while the wafer is being rinsed and dried after the grinding or cleaning operation. During the grinding or cleaning operation the high-speed motor is energized toward rotation in a direction opposed to the direction of rotation produced by the low-speed motor. The biasing torque so produced insures against any slack or rebounding through the overrunning clutch which could result in skipping or chattering of the engagement of the grinding wheel with the periphery of the wafer during the contouring of the periphery of the wafer or which could result in loss of clamping contact between the chuck and the wafer.

摘要翻译： 用于在真空卡盘上保持硅晶片并使晶片旋转以用于在晶片周边或上表面上进行处理操作的晶片处理机的驱动机构包括低速电动机，高速电动机和超速离合器 。 低速电动机通过超越离合器连接到用于卡盘的驱动轴，并且以相对较低且精确控制的速度旋转卡盘和晶片，同时晶片的边缘由砂轮构成，或者当上表面 通过与晶片的上表面接合的刷子进行机械清洁。 高速电机直接连接到驱动轴上，当通电用于冲洗和干燥操作时，旋转卡盘和晶片与低速电机相同的旋转方向，但是在冲洗晶片的同时高速运转 并在研磨或清洁操作后干燥。 在研磨或清洁操作期间，高速电动机沿与低速电动机产生的旋转方向相反的方向被激励。 所产生的偏置扭矩确保抵抗超越离合器的任何松弛或反弹，这可能导致在晶片周边轮廓形成期间磨轮与晶圆周边的接合跳跃或颤动，或者可能导致损失 卡盘和晶片之间的夹紧接触。

公开(公告)号：US4217977A

公开(公告)日：1980-08-19

申请号：US942608

申请日：1978-09-15

申请人： Johann Tam

发明人： Johann Tam

IPC分类号： B23Q7/00 ,  B23Q7/14 ,  B23Q16/00 ,  H01L21/677 ,  B65G15/12 ,  B65G43/08

CPC分类号： H01L21/67706 ,  B23Q16/00 ,  B23Q7/005 ,  B23Q7/14 ,  H01L21/67715 ,  H01L21/67736 ,  Y10S414/135

摘要： A conveyor system for conveying a relatively fragile work piece, such as a silicon wafer, to and from a work station where one or more processing operations are performed on the work piece comprises two parallel conveyor belts. Each conveyor belt is mounted on a separate carriage, and the carriages are moveable laterally toward and away from each other during different periods of operation of the conveyor system and also to enable different size work pieces to be carried by the conveyor belts. The conveyor belts are driven by a drive belt system which comprises a fixed length, closed loop drive belt and a pulley arrangement operatively associated with the drive belt for accommodating lateral motion of the carriages while permitting drive of the conveyor belts at all lateral positions of the carriages and without any change in the length of the drive belt. The conveyor system also provides positive handling of the work piece during all conveying and processing operations to minimize breakage of the work piece. The conveyor system incorporates a vertically moveable spindle and chuck at the work station for lowering the work piece to a processing position below the conveyor belt. Centering and sensing apparatus are located at the work station to center the work piece above the chuck and to coordinate the vertical movement of the chuck with the lateral movement of the carriages and to provide the positive handling of the work piece at each stage of transport and processing of the work piece.

摘要翻译： 用于将诸如硅晶片的相对脆弱的工件传送到工作站的工件的一个或多个处理操作的输送系统包括两个平行的传送带。 每个传送带安装在单独的托架上，并且托架可在输送机系统的不同操作期间横向移动并彼此远离，并且还使得能够由输送带承载不同尺寸的工件。 传送带由驱动带系统驱动，传动带系统包括固定长度的闭环传动带和与传动带可操作地相关联的滑轮装置，用于容纳滑架的横向运动，同时允许在传送带的所有横向位置驱动传送带 并且传动带的长度没有任何变化。 输送系统还可以在所有输送和加工操作过程中对工件进行正面的处理，以最大限度地减少工件的破损。 输送系统在工作站处包括可垂直移动的主轴和卡盘，用于将工件下降到输送带下方的加工位置。 定心和感测装置位于工作站，将工件定位在卡盘上方，并协调卡盘的垂直运动与托架的横向运动，并在运输的每个阶段提供工件的正面搬运， 加工工件。

公开(公告)号：US5700046A

公开(公告)日：1997-12-23

申请号：US527796

申请日：1995-09-13

申请人： Matthew J. Van Doren ,  Don Sauer ,  Alexander H. Slocum ,  David Pap Rocki ,  Johann Tam ,  Larry Gerszewski

发明人： Matthew J. Van Doren ,  Don Sauer ,  Alexander H. Slocum ,  David Pap Rocki ,  Johann Tam ,  Larry Gerszewski

IPC分类号： B25J15/02 ,  H01L21/687 ,  B25J15/08

CPC分类号： B25J15/026 ,  H01L21/68707 ,  Y10S294/902 ,  Y10S414/141

摘要： A wafer gripper assembly comprises first and second gripping members movably supported relative to each other. A motor propels the gripping members linearly towards and away from each other. Preferably both gripping members are movably supported, and a rotary-to-linear translator produces equal and opposite linear movement of the gripping members. Typically, at least six contactor elements are defined on the pair of gripping members. The contactor elements include a vertically extending portion having an inwardly facing convex surface for contacting an edge of a wafer, and an inwardly extending flange for supporting a lower surface of the wafer.

摘要翻译： 晶片夹持器组件包括相对于彼此可移动地支撑的第一和第二夹持构件。 电动机将夹持构件线性地向彼此推动并远离彼此。 优选地，两个夹持构件可移动地支撑，并且旋转到线性的平移器产生夹持构件的相等且相对的线性移动。 通常，至少六个接触器元件被限定在该对夹持构件上。 接触元件包括垂直延伸的部分，其具有用于接触晶片的边缘的向内的凸形表面和用于支撑晶片的下表面的向内延伸的凸缘。

公开(公告)号：US4313266A

公开(公告)日：1982-02-02

申请号：US145867

申请日：1980-05-01

申请人： Johann Tam

发明人： Johann Tam

IPC分类号： C30B33/00 ,  F26B5/08 ,  H01L21/00

CPC分类号： H01L21/67034 ,  C30B33/00 ,  F26B5/08 ,  Y10S269/902 ,  Y10S269/903 ,  Y10S414/138 ,  Y10S414/141

摘要： A method and apparatus for drying a wafer at a drying station includes a wafer holder which grips the wafer on its edge so that there is no contact with a face of the wafer. This eliminates contact areas which could cause stains on the face. A carriage mechanism brings a wet wafer into the drying station at one level and takes the dry wafer out of the drying station at a different level to prevent any contact between the dry wafer and residual moisture at the incoming level.

摘要翻译： 用于在干燥站干燥晶片的方法和装置包括：晶片保持器，其在晶片的边缘处握住晶片，使得不与晶片的表面接触。 这消除了可能导致脸部污渍的接触区域。 滑架机构将湿的晶片在一个水平面上带入干燥站，并将干燥的晶片从干燥站排出到不同的水平，以防止干燥晶片与进入水平的残留水分之间的任何接触。