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    Electrode for an electric discharge machining apparatus
    2.
    发明授权
    Electrode for an electric discharge machining apparatus 失效
    放电加工装置用电极

    公开(公告)号：US5146061A

    公开(公告)日：1992-09-08

    申请号：US772686

    申请日：1991-10-07

    申请人： James E. Huebler ,  John M. Arnold ,  Narayan C. Saha

    发明人： James E. Huebler ,  John M. Arnold ,  Narayan C. Saha

    IPC分类号： B23H1/04

    CPC分类号： B23H1/04

    摘要： An electrode for an electric discharge machining apparatus comprising a wall which forms a hollow body open on at least one end, the open end having a shape of the opening to be cut in a structural member. The cutting edge of the electrode is formed by the wall at the open end of the electrode and has a contour which is complementary to the surface contour of the side of the structural member facing away from the electrode. The cutting edge has a thickness of about 0.005 inches to about 0.125 inches.

    摘要翻译： 一种用于放电加工设备的电极，包括形成在至少一端开口的中空体的壁，所述开口端具有在结构构件中被切割的开口的形状。 电极的切割边缘由电极开口端的壁形成，并且具有与结构构件背离电极的侧面的表面轮廓互补的轮廓。 切割刃具有约0.005英寸至约0.125英寸的厚度。

    Method and apparatus for application of surface treatment to food products
    3.
    发明授权
    Method and apparatus for application of surface treatment to food products 有权
    用于食品表面处理的方法和装置

    公开(公告)号：US06589580B1

    公开(公告)日：2003-07-08

    申请号：US09304329

    申请日：1999-05-03

    申请人： Hiren H. Thakar ,  John M. Arnold

    发明人： Hiren H. Thakar ,  John M. Arnold

    IPC分类号： A23C1911

    CPC分类号： A23C19/11 ,  A01J27/005 ,  A01J27/02 ,  A23B4/26 ,  A23B7/158 ,  A23B9/32 ,  A23L3/3454 ,  Y02A40/946

    摘要： A method and apparatus for applying a material to food products in a high speed packaging line at a controlled rate in compliance with applicable food-handling equipment standards, preferably in a liquid spray, without immersion, wherein the rate of application is sufficient for efficacy of the material without resulting in transfer of unacceptable quantities of the material or carrier to adjacent line components. The invention is particularly useful for spray application of a liquid antimycotic agent to cheese chunks, at a regulated rate that provides a sufficient surface concentration to inhibit mold growth on the surfaces of the cheese chunks after extended periods of exposure to ambient air, without unacceptable transfer of residue to adjacent components in the packaging line. The invention is preferably employed in application of natamycin to cheese chunks wherein a disk spray system applies a suspension of natamycin in an aqueous saline solution. It has been found that mold growth on cheese chunks can be substantially inhibited by application of natamycin in accordance with the invention at levels as low as about 0.5 &mgr;g/cm2. In a preferred embodiment of the invention, the process applies an average surface concentration of about 1.0 or 1.1 &mgr;g/cm2 to ensure that an adequate concentration is applied over substantially the entire exterior surface.

    摘要翻译： 一种方法和装置，其以符合适用的食品处理设备标准，优选在液体喷雾中，以不受浸渍的速度，以受控的速率将材料施加到食品中，其中施用的速率足以用于 该材料不会导致不可接受量的材料或载体转移到相邻的线路部件。 本发明特别可用于将液体抗霉菌剂喷雾施用于奶酪块，其调节速率提供了足够的表面浓度，以在长时间暴露于环境空气之后，在奶酪块的表面上抑制霉菌生长而没有不可接受的转移 的残留物到包装线中的相邻组分。 本发明优选用于将那他霉素应用于奶酪块，其中盘喷雾系统将游霉素的悬浮液施加在盐水溶液中。 已经发现，根据本发明的游霉素以低至约0.5m 2 / cm 2的水平可以基本上抑制奶酪块上的霉菌生长。 在本发明的优选实施方案中，该方法应用约1.0或1.1mug / cm 2的平均表面浓度，以确保在基本上整个外表面上施加足够的浓度。