公开(公告)号：US4142528A

公开(公告)日：1979-03-06

申请号：US763617

申请日：1977-01-28

申请人： Joseph G. Whelan, Jr. ,  James P. Moss

发明人： Joseph G. Whelan, Jr. ,  James P. Moss

IPC分类号： A61F2/04 ,  A61M1/00 ,  A61M27/00

CPC分类号： A61M39/0247 ,  A61F2/04

摘要： This invention provides a novel tubular member that can be surgically inserted into the common bile duct of a patient to perform the plural functions of, initially, providing, through its interior, a conduit for drainage of bile from inside that duct to a location outside of the body wall of the patient and, subsequently, with its exterior, promoting the growth of a fistulous tract between the outside of the body wall of the patient and the inside of the duct through which an instrument, such as a steerable basket catheter and the like, that has been non-surgically inserted into the duct via the interior of the tubular member for removal of an object, such as a retained stone and the like, contained therein, can be non-surgically withdrawn together with the object and the tubular member itself to a location outside of the body wall of the patient. Basically, the novel device that is provided by the invention comprises a hollow tubular member having the shape of a "T", with the "T" including a crossbar that can be flexed and inserted into the common bile duct through an opening that has been surgically made through the duct wall and a stem which has its junction with the crossbar constructed such that the distal end of the stem which then extends through the duct opening can be extended outwardly through an incision that has been surgically made through the body wall of the patient. The crossbar and stem each have only a single lumen through its interior, with the single lumen of the stem being fluid-connected to the single lumen of the crossbar at the junction of the stem and the crossbar. And, the stem has, along its entirety, both inside and outside diametric dimensions that are, respectively, greater than the inside and outside diametric dimensions of the crossbar.

摘要翻译： 本发明提供了一种新颖的管状构件，其可以手术插入到患者的胆总管中，以执行多个功能，其最初通过其内部提供用于将胆汁从该管内排出到外部的位置的导管 患者的身体壁，随后与其外部一起促进患者体壁外侧和管道内侧之间的瘘管的生长，通过该内窥镜，诸如可操纵的篮子导管和仪器 通过管状构件的内部未被外科手术地插入导管中以除去容纳在其中的物体（例如保留的石头等）可以与物体和管状物一起非手术地抽出 成员本身到位于患者体壁外部的位置。 基本上，由本发明提供的新型装置包括具有“T”形状的中空管状构件，“T”包括横杆，该横杆可弯曲并通过已经被开口的开口插入到胆总管内 通过导管壁手术制成的杆和与其横截面结合的杆，其构造成使得杆延伸穿过管道开口的远端可以向外延伸穿过已经通过外科手术制成的切口 患者。 横杆和杆每个在其内部仅具有单个内腔，杆的单个内腔在杆和横杆的连接处流体连接到横杆的单腔。 而且，该杆整体上具有分别大于横杆内径和外径尺寸的内径和外径尺寸。

公开(公告)号：US06885429B2

公开(公告)日：2005-04-26

申请号：US10301627

申请日：2002-11-22

申请人： Joseph H. Lyons ,  Joseph G. Whelan

发明人： Joseph H. Lyons ,  Joseph G. Whelan

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/32 ,  G03B27/52

CPC分类号： G03F7/70516 ,  G01B11/00 ,  G03F7/70641

摘要： A system and method are used to calibrate a focus portion of an exposure section of a lithography tool. A wafer is exposed so that a resulted or formed patterned image is tilted with respect to the wafer. The tilting can be imposed based on controlling a wafer stage to tilt the wafer or a reticle stage to tilt the reticle. The wafer is developed. Characteristics of the tilted patterned image are measured with a portion of the lithography tool to determine focus parameters of an exposure system. The portion can be an alignment system. The measuring step can measure band width and/or band location of the tilted patterned image. Sometimes, more than one patterned image is formed on the wafer, then the measuring step can measure distance between bands and shifting of the bands with respect to a central axis of the wafer. The focus parameters can be focus tilt errors and/or focus offset. The focus parameters are used to perform calibration. Calibration is done by either automatically or manually entering compensation values for the measured focus parameters into the lithography tool.

摘要翻译： 系统和方法用于校准光刻工具的曝光部分的焦点部分。 使晶片曝光，使得所得到或形成的图案化图像相对于晶片倾斜。 可以基于控制晶片台来倾斜晶片或标线片台以使掩模版倾斜来施加倾斜。 开发晶圆。 用光刻工具的一部分测量倾斜图案图像的特性，以确定曝光系统的焦点参数。 该部分可以是对准系统。 测量步骤可以测量倾斜的图案化图像的带宽和/或带位置。 有时，在晶片上形成多于一个的图案化图像，则测量步骤可以测量带之间的距离和带相对于晶片的中心轴移动。 焦点参数可以是焦点倾斜误差和/或聚焦偏移。 焦点参数用于执行校准。 通过自动或手动输入光刻工具中测量的聚焦参数的补偿值进行校准。

公开(公告)号：US07081948B2

公开(公告)日：2006-07-25

申请号：US11103427

申请日：2005-04-12

申请人： Joseph H. Lyons ,  Joseph G. Whelan

发明人： Joseph H. Lyons ,  Joseph G. Whelan

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70516 ,  G01B11/00 ,  G03F7/70641

摘要： A system and method are used to calibrate a focus portion of an exposure section of a lithography tool. A wafer is exposed so that a resulted or formed patterned image is tilted with respect to the wafer. The tilting can be imposed based on controlling a wafer stage to tilt the wafer or a reticle stage to tilt the reticle. The wafer is developed. Characteristics of the tilted patterned image are measured with a portion of the lithography tool to determine focus parameters of an exposure system. The portion can be an alignment system. The measuring step can measure band width and/or band location of the tilted patterned image. Sometimes, more than one patterned image is formed on the wafer, then the measuring step can measure distance between bands and shifting of the bands with respect to a central axis of the wafer. The focus parameters can be focus tilt errors and/or focus offset. The focus parameters are used to perform calibration. Calibration is done by either automatically or manually entering compensation values for the measured focus parameters into the lithography tool.

摘要翻译： 系统和方法用于校准光刻工具的曝光部分的焦点部分。 使晶片曝光，使得所得到或形成的图案化图像相对于晶片倾斜。 可以基于控制晶片台来倾斜晶片或标线片台以使掩模版倾斜来施加倾斜。 开发晶圆。 用光刻工具的一部分测量倾斜图案图像的特性，以确定曝光系统的焦点参数。 该部分可以是对准系统。 测量步骤可以测量倾斜的图案化图像的带宽和/或带位置。 有时，在晶片上形成多于一个的图案化图像，则测量步骤可以测量带之间的距离和带相对于晶片的中心轴移动。 焦点参数可以是焦点倾斜误差和/或聚焦偏移。 焦点参数用于执行校准。 通过自动或手动输入光刻工具中测量的聚焦参数的补偿值进行校准。