公开(公告)号：US20090016855A1

公开(公告)日：2009-01-15

申请号：US12123365

申请日：2008-05-19

申请人： Christopher Hofmeister ,  Martin R. Elliot ,  Alexander Krupyshev ,  Joseph Hallisey ,  Joseph A. Kraus ,  William Fosnight ,  Craig J. Carbone ,  Jeffrey C. Blahnik ,  Ho Yin Fong

发明人： Christopher Hofmeister ,  Martin R. Elliot ,  Alexander Krupyshev ,  Joseph Hallisey ,  Joseph A. Kraus ,  William Fosnight ,  Craig J. Carbone ,  Jeffrey C. Blahnik ,  Ho Yin Fong

IPC分类号： B65G53/34

CPC分类号： H01L21/67098 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67201

摘要： A substrate processing tool including a frame forming at least one isolatable chamber configured to hold a controlled atmosphere, at least two substrate supports located within each of the at least one isolatable chamber, each of the at least two substrate supports being stacked one above the other and configured to hold a respective substrate and a cooling unit communicably coupled to the at least two substrate supports such that the at least two substrate supports and cooling unit effect simultaneous conductive cooling of each of the respective substrates located on the at least two substrate supports.

摘要翻译： 一种基板处理工具，其包括形成至少一个可分隔室的框架，该隔离室被构造成保持受控气氛，至少两个基板支撑件，位于所述至少一个可隔离室的每一个内，所述至少两个基板支撑件中的每个基板支撑件彼此堆叠 并且被配置为保持相应的基板和可通信地联接到所述至少两个基板支撑件的冷却单元，使得所述至少两个基板支撑件和冷却单元对位于所述至少两个基板支撑件上的各个基板的每个基板进行同时导电冷却。

公开(公告)号：US08272825B2

公开(公告)日：2012-09-25

申请号：US12123365

申请日：2008-05-19

申请人： Christopher Hofmeister ,  Martin R. Elliot ,  Alexander Krupyshev ,  Joseph Hallisey ,  Joseph A. Kraus ,  William Fosnight ,  Craig J. Carbone ,  Jeffrey C. Blahnik ,  Ho Yin Owen Fong

发明人： Christopher Hofmeister ,  Martin R. Elliot ,  Alexander Krupyshev ,  Joseph Hallisey ,  Joseph A. Kraus ,  William Fosnight ,  Craig J. Carbone ,  Jeffrey C. Blahnik ,  Ho Yin Owen Fong

IPC分类号： B65G49/07

CPC分类号： H01L21/67098 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67201

摘要： A substrate processing tool including a frame forming at least one isolatable chamber configured to hold a controlled atmosphere, at least two substrate supports located within each of the at least one isolatable chamber, each of the at least two substrate supports being stacked one above the other and configured to hold a respective substrate and a cooling unit communicably coupled to the at least two substrate supports such that the at least two substrate supports and cooling unit effect simultaneous conductive cooling of each of the respective substrates located on the at least two substrate supports.

摘要翻译： 一种基板处理工具，其包括形成至少一个可分隔室的框架，该隔离室被构造成保持受控气氛，至少两个基板支撑件，位于所述至少一个可隔离室的每一个内，所述至少两个基板支撑件中的每个基板支撑件彼此堆叠 并且被配置为保持相应的基板和可通信地联接到所述至少两个基板支撑件的冷却单元，使得所述至少两个基板支撑件和冷却单元对位于所述至少两个基板支撑件上的各个基板的每个基板进行同时导电冷却。