公开(公告)号：US20110142575A1

公开(公告)日：2011-06-16

申请号：US12897440

申请日：2010-10-04

申请人： Gerald M. Friedman ,  Michael L. Bufano ,  Christopher Hofmeister ,  Ulysses Gilchrist ,  William Fosnight

发明人： Gerald M. Friedman ,  Michael L. Bufano ,  Christopher Hofmeister ,  Ulysses Gilchrist ,  William Fosnight

IPC分类号： H01L21/677

CPC分类号： H01L21/677 ,  B65G47/50 ,  H01L21/67276 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  Y10S414/14

摘要： A substrate processing apparatus is provided. The apparatus has a casing, a low port interface and a carrier holding station. The casing has processing devices within for processing substrates. The load port interface is connected to the casing for loading substrates into the processing device. The carrier holding station is connected to the casing. The carrier holding station is adapted for holding at least one substrate transport carrier so the at least one substrate transport carrier is capable of being coupled to the load port interface without lifting the at least one substrate transport carrier off the carrier holding station. The carrier holding station is arranged to provide a substantially simultaneous swap section for substantially simultaneous replacement of the substrate transport carrier from the carrier holding station.

摘要翻译： 提供了一种基板处理装置。 该装置具有壳体，低端口接口和载体保持站。 壳体具有用于处理基板的处理装置。 负载端口接口连接到外壳，用于将基板装载到处理设备中。 托架保持站连接到外壳。 载体保持站用于保持至少一个基板输送载体，使得至少一个基板输送载体能够耦合到负载端口接口，而不将至少一个基板传输载体从载体保持站提起。 载体保持站布置成提供基本上同时的交换部分，用于基本上同时从载体保持站更换基板传输载体。

公开(公告)号：US07699573B2

公开(公告)日：2010-04-20

申请号：US10628980

申请日：2003-07-29

申请人： Jakob Blattner ,  Rudy Federici ,  William Fosnight ,  Clint Haris

发明人： Jakob Blattner ,  Rudy Federici ,  William Fosnight ,  Clint Haris

IPC分类号： H01L21/677

CPC分类号： G03F7/70925 ,  G03F7/70741 ,  H01L21/67359 ,  H01L21/67742 ,  H01L21/67769 ,  H01L21/68707 ,  Y10S414/139

摘要： A reticle manipulating device with an at least substantially closed housing for maintaining clean-room conditions inside the housing, an input/output station for introducing and discharging reticles in and out of the housing, and at least one functional unit arranged in the housing for impressing a predetermined function on the reticles. The device has a manipulating device also arranged inside the housing, for manipulating the reticles in the housing.

摘要翻译： 一种掩模版操纵装置，具有至少基本上封闭的壳体，用于在壳体内保持清洁室条件;输入/输出站，用于将掩模版引入和放出壳体;以及布置在壳体中的至少一个功能单元，用于压印 在掩模版上具有预定的功能。 该装置具有也布置在壳体内部的操纵装置，用于操纵壳体中的光罩。

公开(公告)号：US07607879B2

公开(公告)日：2009-10-27

申请号：US11154787

申请日：2005-06-15

申请人： Daniel A. Hall ,  Christopher Hofmeister ,  William Fosnight ,  Robert T. Caveney ,  Ulysses Gilchrist ,  Jeff G. Araujo

发明人： Daniel A. Hall ,  Christopher Hofmeister ,  William Fosnight ,  Robert T. Caveney ,  Ulysses Gilchrist ,  Jeff G. Araujo

IPC分类号： B65G49/07

CPC分类号： H01L21/67196 ,  Y10S414/135

摘要： A substrate processing apparatus having a frame, a housing, an access system and at least a substrate transport apparatus or a substrate processing device. The housing is connected to the frame. The access system is connected to the frame and forms an access through which substrates are moved in and out of the housing. The substrate transport apparatus or substrate processing device are connected to the frame and are at least partially positioned in the housing. The frame comprises a movable portion. The movable portion is movable relative to the frame so that movement of the movable portion causes separation of the access system and at least one of the substrate transport apparatus or substrate processing device from an installed position. The substrate transport apparatus is selectable from a number of different interchangeable substrate transport apparatus. Each of the different interchangeable substrate transport apparatus has a predetermined reference datum and positioning features for positioning the substrate transport apparatus relative to the frame. The positioning features of each substrate transport apparatus are controllably located relative to its predetermined reference datum to be in a repeatable predetermined location with substantially no variance between the different interchangeable substrate transport apparatus.

摘要翻译： 一种具有框架，壳体，存取系统和至少基板输送装置或基板处理装置的基板处理装置。 外壳连接到框架。 存取系统连接到框架并形成一个通路，通过该通道使基板移入和移出外壳。 基板输送装置或基板处理装置连接到框架并且至少部分地定位在壳体中。 框架包括可移动部分。 可移动部分可相对于框架移动，使得可移动部分的运动导致进入系统和基板输送装置或基板处理装置中的至少一个与安装位置的分离。 基板输送装置可从许多不同的可互换的基板输送装置中选择。 每个不同的可互换的基板输送装置具有预定的参考基准和用于相对于框架定位基板输送装置的定位特征。 每个基板输送装置的定位特征可相对于其预定参考基准可控地定位成处于可重复的预定位置，在不同的可互换的基板输送装置之间基本上没有变化。

公开(公告)号：US20080107507A1

公开(公告)日：2008-05-08

申请号：US11787981

申请日：2007-04-18

申请人： Michael L. Bufano ,  Ulysses Gilchrist ,  William Fosnight ,  Chrstopher Hofmeister ,  Daniel Babbs ,  Robert C. May

发明人： Michael L. Bufano ,  Ulysses Gilchrist ,  William Fosnight ,  Chrstopher Hofmeister ,  Daniel Babbs ,  Robert C. May

IPC分类号： H01L21/677

CPC分类号： H01L21/67386 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67276 ,  H01L21/67379 ,  H01L21/67715 ,  H01L21/67724 ,  H01L21/67727 ,  H01L21/6773 ,  H01L21/67733 ,  H01L21/67766 ,  H01L21/67772 ,  H01L21/67775

摘要： A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.

摘要翻译： 一种半导体工件处理系统，具有至少一个用于处理工件的处理装置，主输送系统，辅助输送系统以及第一输送系统和第二输送系统之间的一个或多个接口。 主要和次要运输系统各自具有基本上恒定速度的一个或多个部分和与等速段相通的队列部分。

公开(公告)号：US20080080963A1

公开(公告)日：2008-04-03

申请号：US11803077

申请日：2007-05-11

申请人： Michael Bufano ,  Ulysses Gilchrist ,  William Fosnight ,  Christopher Hofmeister ,  Daniel Babbs ,  Robert May

发明人： Michael Bufano ,  Ulysses Gilchrist ,  William Fosnight ,  Christopher Hofmeister ,  Daniel Babbs ,  Robert May

IPC分类号： B65B35/00

CPC分类号： H01L21/6732 ,  H01L21/67017 ,  H01L21/67276 ,  H01L21/67379 ,  H01L21/67386 ,  H01L21/67715 ,  H01L21/67727 ,  H01L21/6773 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778

摘要： A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.

公开(公告)号：US08328495B2

公开(公告)日：2012-12-11

申请号：US12544064

申请日：2009-08-19

申请人： Michael L. Bufano ,  Ulysses Gilchrist ,  William Fosnight ,  Christopher Hofmeister ,  Daniel Babbs ,  Robert C. May

发明人： Michael L. Bufano ,  Ulysses Gilchrist ,  William Fosnight ,  Christopher Hofmeister ,  Daniel Babbs ,  Robert C. May

IPC分类号： B65G1/00

CPC分类号： H01L21/67386 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67276 ,  H01L21/67379 ,  H01L21/67715 ,  H01L21/67724 ,  H01L21/67727 ,  H01L21/6773 ,  H01L21/67733 ,  H01L21/67766 ,  H01L21/67772 ,  H01L21/67775

摘要： A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.

摘要翻译： 一种半导体工件处理系统，具有至少一个用于处理工件的处理装置，主输送系统，辅助输送系统以及第一输送系统和第二输送系统之间的一个或多个接口。 主要和次要运输系统各自具有基本上恒定速度的一个或多个部分和与等速段相通的队列部分。

公开(公告)号：US08297319B2

公开(公告)日：2012-10-30

申请号：US11855484

申请日：2007-09-14

申请人： Daniel Babbs ,  William Fosnight

发明人： Daniel Babbs ,  William Fosnight

IPC分类号： B65B31/00

CPC分类号： H01L21/67393 ,  H01L21/67772

摘要： A method for pressurizing a substrate carrier including pressurizing a chamber that is of unitary construction with the carrier and/or a substrate cassette within the carrier and maintaining a pressure within the carrier by releasing gas from the chamber into the carrier.

摘要翻译： 一种用于对衬底载体加压的方法，包括将载体和/或衬底盒加载在载体内并且通过将气体从腔室释放到载体中来保持载体内的压力而使整体结构加压。

公开(公告)号：US08267634B2

公开(公告)日：2012-09-18

申请号：US11803077

申请日：2007-05-11

申请人： Michael L. Bufano ,  Ulysses Gilchrist ,  William Fosnight ,  Christopher Hofmeister ,  Daniel Babbs ,  Robert C. May

发明人： Michael L. Bufano ,  Ulysses Gilchrist ,  William Fosnight ,  Christopher Hofmeister ,  Daniel Babbs ,  Robert C. May

IPC分类号： B65G1/00

CPC分类号： H01L21/6732 ,  H01L21/67017 ,  H01L21/67276 ,  H01L21/67379 ,  H01L21/67386 ,  H01L21/67715 ,  H01L21/67727 ,  H01L21/6773 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778

摘要： A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.

公开(公告)号：US20110014016A1

公开(公告)日：2011-01-20

申请号：US12843659

申请日：2010-07-26

申请人： Daniel A. Hall ,  Christopher Hofmeister ,  William Fosnight ,  Jeff G. Araujo ,  Steven Allen ,  Glenn Sindledecker

发明人： Daniel A. Hall ,  Christopher Hofmeister ,  William Fosnight ,  Jeff G. Araujo ,  Steven Allen ,  Glenn Sindledecker

IPC分类号： H01L21/673

CPC分类号： H01L21/67775

摘要： A substrate processing apparatus has a frame and a load port connected to the frame and adapted to mate a substrate transport container to the frame. The apparatus has transportable storage that is adapted to be removably connected to the frame and fit beneath the load port. The storage may be an enclosure housing electrical, mechanical, or electromechanical devices of the substrate processing apparatus.

摘要翻译： 基板处理装置具有连接到框架并适于将基板输送容器与框架配合的框架和负载端口。 该装置具有适于可拆卸地连接到框架并且装配在装载口下方的可移动存储器。 存储器可以是容纳基板处理装置的电，机械或机电装置的外壳。

公开(公告)号：US20100054897A1

公开(公告)日：2010-03-04

申请号：US12544064

申请日：2009-08-19

申请人： Michael L. Bufano ,  Ulysses Gilchrist ,  William Fosnight ,  Christopher Hofmeister ,  Daniel Babbs ,  Robert C. May

发明人： Michael L. Bufano ,  Ulysses Gilchrist ,  William Fosnight ,  Christopher Hofmeister ,  Daniel Babbs ,  Robert C. May

IPC分类号： H01L21/67 ,  H01L21/673 ,  H01L21/677

CPC分类号： H01L21/67386 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67276 ,  H01L21/67379 ,  H01L21/67715 ,  H01L21/67724 ,  H01L21/67727 ,  H01L21/6773 ,  H01L21/67733 ,  H01L21/67766 ,  H01L21/67772 ,  H01L21/67775

摘要： A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.

摘要翻译： 一种半导体工件处理系统，具有至少一个用于处理工件的处理装置，主输送系统，辅助输送系统以及第一输送系统和第二输送系统之间的一个或多个接口。 主要和次要运输系统各自具有基本上恒定速度的一个或多个部分和与等速段相通的队列部分。