公开(公告)号：US20130156937A1

公开(公告)日：2013-06-20

申请号：US13328530

申请日：2011-12-16

申请人： Danny Wang ,  Kent Riley Child ,  Owen Ho Yin Fong

发明人： Danny Wang ,  Kent Riley Child ,  Owen Ho Yin Fong

IPC分类号： C23C16/52 ,  B05C11/00

CPC分类号： C23C14/54 ,  C23C14/3407 ,  C23C14/352 ,  H01J37/34

摘要： Embodiments provided herein describe systems and methods for aligning sputtering sources, such as in a substrate processing tool. The substrate processing tool includes at least one sputtering source and a device. Each of sputtering sources includes a target having a central axis. The device has an axis and is detachably coupled to the at least one sputtering source. The device indicates to a user a direction in which the central axis of the target of the at least one sputtering source is oriented.

摘要翻译： 本文提供的实施例描述了用于对准溅射源的系统和方法，例如在基板处理工具中。 基板处理工具包括至少一个溅射源和装置。 每个溅射源包括具有中心轴的靶。 该装置具有轴线并且可拆卸地联接至该至少一个溅射源。 该装置向使用者指示至少一个溅射源的靶的中心轴定向的方向。

公开(公告)号：US20090016855A1

公开(公告)日：2009-01-15

申请号：US12123365

申请日：2008-05-19

申请人： Christopher Hofmeister ,  Martin R. Elliot ,  Alexander Krupyshev ,  Joseph Hallisey ,  Joseph A. Kraus ,  William Fosnight ,  Craig J. Carbone ,  Jeffrey C. Blahnik ,  Ho Yin Fong

发明人： Christopher Hofmeister ,  Martin R. Elliot ,  Alexander Krupyshev ,  Joseph Hallisey ,  Joseph A. Kraus ,  William Fosnight ,  Craig J. Carbone ,  Jeffrey C. Blahnik ,  Ho Yin Fong

IPC分类号： B65G53/34

CPC分类号： H01L21/67098 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67201

摘要： A substrate processing tool including a frame forming at least one isolatable chamber configured to hold a controlled atmosphere, at least two substrate supports located within each of the at least one isolatable chamber, each of the at least two substrate supports being stacked one above the other and configured to hold a respective substrate and a cooling unit communicably coupled to the at least two substrate supports such that the at least two substrate supports and cooling unit effect simultaneous conductive cooling of each of the respective substrates located on the at least two substrate supports.

摘要翻译： 一种基板处理工具，其包括形成至少一个可分隔室的框架，该隔离室被构造成保持受控气氛，至少两个基板支撑件，位于所述至少一个可隔离室的每一个内，所述至少两个基板支撑件中的每个基板支撑件彼此堆叠 并且被配置为保持相应的基板和可通信地联接到所述至少两个基板支撑件的冷却单元，使得所述至少两个基板支撑件和冷却单元对位于所述至少两个基板支撑件上的各个基板的每个基板进行同时导电冷却。

公开(公告)号：US20130156936A1

公开(公告)日：2013-06-20

申请号：US13325348

申请日：2011-12-14

申请人： Owen Ho Yin Fong ,  Kent Riley Child

发明人： Owen Ho Yin Fong ,  Kent Riley Child

IPC分类号： C23C14/34 ,  C23C14/35

CPC分类号： C23C14/35 ,  C23C14/042 ,  C23C14/351 ,  C23C14/352 ,  C23C14/505 ,  C23C14/542 ,  C23C14/564 ,  H01J37/34 ,  H01J37/3402

摘要： A sputter source is provided. The sputter source includes a shaft extending through a central region of the sputter source. A first end of the shaft is coupled to a drive and a second end of the shaft is coupled to a bottom plate. A first plate having a ramped surface is included where the first plate is stationary. A second plate having a ramped surface is provided where the second plate is disposed above the first plate such that portions of the ramped surfaces contact each other. The second plate is coupled to the shaft, wherein the second plate is operable to rotate and move axially as the shaft rotates in a first direction and wherein the second plate is operable to remain stationary as the shaft rotates in a second direction.

摘要翻译： 提供溅射源。 溅射源包括延伸穿过溅射源的中心区域的轴。 轴的第一端联接到驱动器，并且轴的第二端联接到底板。 包括具有倾斜表面的第一板，其中第一板是静止的。 提供具有斜面的第二板，其中第二板设置在第一板的上方，使得倾斜表面的一部分彼此接触。 所述第二板联接到所述轴，其中当所述轴沿第一方向旋转时，所述第二板可操作以沿轴向旋转和移动，并且其中当所述轴沿第二方向旋转时，所述第二板可操作以保持静止。

公开(公告)号：US09085821B2

公开(公告)日：2015-07-21

申请号：US13325348

申请日：2011-12-14

申请人： Owen Ho Yin Fong ,  Kent Riley Child

发明人： Owen Ho Yin Fong ,  Kent Riley Child

IPC分类号： C23C14/34 ,  C23C14/35 ,  C23C14/04 ,  C23C14/50 ,  C23C14/54 ,  C23C14/56 ,  H01J37/34

CPC分类号： C23C14/35 ,  C23C14/042 ,  C23C14/351 ,  C23C14/352 ,  C23C14/505 ,  C23C14/542 ,  C23C14/564 ,  H01J37/34 ,  H01J37/3402

摘要： A sputter source is provided. The sputter source includes a shaft extending through a central region of the sputter source. A first end of the shaft is coupled to a drive and a second end of the shaft is coupled to a bottom plate. A first plate having a ramped surface is included where the first plate is stationary. A second plate having a ramped surface is provided where the second plate is disposed above the first plate such that portions of the ramped surfaces contact each other. The second plate is coupled to the shaft, wherein the second plate is operable to rotate and move axially as the shaft rotates in a first direction and wherein the second plate is operable to remain stationary as the shaft rotates in a second direction.

摘要翻译： 提供溅射源。 溅射源包括延伸穿过溅射源的中心区域的轴。 轴的第一端联接到驱动器，并且轴的第二端联接到底板。 包括具有倾斜表面的第一板，其中第一板是静止的。 提供具有斜面的第二板，其中第二板设置在第一板的上方，使得倾斜表面的一部分彼此接触。 所述第二板联接到所述轴，其中当所述轴沿第一方向旋转时，所述第二板可操作以沿轴向旋转和移动，并且其中当所述轴沿第二方向旋转时，所述第二板可操作以保持静止。