公开(公告)号：US06477700B1

公开(公告)日：2002-11-05

申请号：US09526525

申请日：2000-03-16

申请人： Kazuki Yokota

发明人： Kazuki Yokota

IPC分类号： G06F1750

CPC分类号： G03F7/70425 ,  G03F1/44 ,  G03F7/20

摘要： A reticle has a main pattern to be transferred to a photo-sensitive layer and surrounded by a non-transparent layer, and a discriminative pattern loops in the non-transparent layer so as to define an area to be inspected for serious defects, wherein the discriminative pattern is implemented by plural non-transparent portions such as strips arranged at intervals less than the minimum width to be transferred at the maximum resolution of the reduction projection aligner; however, the discriminative pattern or the plural non-transparent portions occupy a looped area wider than a minimum width to be recognized by a pattern recognition system so that the discriminative pattern clearly defines the area to be inspected regardless of the resolution.

摘要翻译： 标线片具有要转印到感光层并被不透明层包围的主图案，并且鉴别图案在非透明层中环绕，以限定要检查的严重缺陷的区域，其中 通过多个不透明部分实现识别图案，例如以按照缩小投影对准器的最大分辨率传送的最小宽度的间隔排列的条带; 然而，鉴别图案或多个不透明部分占据比由图案识别系统识别的最小宽度更宽的环形区域，使得识别图案清楚地界定待检查的区域，而不管分辨率如何。

公开(公告)号：US6104019A

公开(公告)日：2000-08-15

申请号：US60961

申请日：1998-04-16

申请人： Kazuki Yokota

发明人： Kazuki Yokota

IPC分类号： G11B7/00 ,  G11B7/085 ,  G11B7/09

CPC分类号： G11B7/08511 ,  G11B2007/0013 ,  G11B7/0945

摘要： The first detection unit detects a focus search state in which focus search is required. The second detection unit detects one of the plurality of layers currently being accessed, i.e., information is being recorded or reproduced. Then, the focus search unit moves a light beam relative to the plurality of layers to obtain a focused state of the light beam on a desired one of the plurality of layers when the first detection unit detects the focus search state. Importantly, the focus search unit moves the light beam from one side of two surfaces of the storage medium, which is closer to the layer detected by the second detection unit, to the other side of the two surfaces of the storage medium. Therefore, the focus search can be quickly completed, and hence the reproduction of information can also be performed quickly.

摘要翻译： 第一检测单元检测需要聚焦搜索的焦点搜索状态。 第二检测单元检测当前正在被访问的多个层中的一个，即正在记录或再现信息。 然后，当第一检测单元检测到焦点搜索状态时，焦点搜索单元相对于多个层移动光束以获得光束在所述多个层中期望的一个层上的聚焦状态。 重要的是，焦点搜索单元将存储介质的两个表面的更靠近第二检测单元检测的层的两侧的光束移动到存储介质的两个表面的另一侧。 因此，可以快速完成焦点搜索，因此也可以快速地执行信息的再现。

公开(公告)号：US5897983A

公开(公告)日：1999-04-27

申请号：US655568

申请日：1996-05-30

申请人： Toshiyuki Hirota ,  Tomomi Kurokawa ,  Masanobu Zenke ,  Kazuki Yokota

发明人： Toshiyuki Hirota ,  Tomomi Kurokawa ,  Masanobu Zenke ,  Kazuki Yokota

IPC分类号： G03F7/20 ,  H01L21/02 ,  H01L21/027 ,  H01L21/822 ,  H01L21/8242 ,  H01L27/04 ,  H01L27/108 ,  G03C5/00

CPC分类号： H01L28/92 ,  H01L27/10852

摘要： In a method for forming an annular-shaped and vertically extending bottom electrode of a memory cell capacitor, a conductive film is formed on an inter-layer insulator. A photo-resist material is applied on the conductive film to form a photo-resist film thereon. The photo-resist film is patterned by a photo-lithography using a mask which includes a transparent plate-like body and a phase shifting film selectively provided on a predetermined region of the transparent plate-like body to form an annular-shaped and vertically extending photo-resist pattern over the conductive film. The conductive film is subjected to an anisotropic etching, in which the annular-shaped and vertically extending photo-resist pattern is used as a mask, to form an annular-shaped and vertically extending bottom electrode under the annular-shaped and vertically extending photo-resist pattern. The annular-shaped and vertically extending photo-resist pattern is removed.

摘要翻译： 在形成存储单元电容器的环状且垂直延伸的底部电极的方法中，在层间绝缘体上形成导电膜。 在导电膜上涂布光致抗蚀剂材料以在其上形成光致抗蚀剂膜。 通过使用包括透明板状体的掩模和选择性地设置在透明板状体的规定区域上的相移膜的光刻法对光致抗蚀剂膜进行图案化，以形成环状且垂直延伸 导电膜上的光刻胶图案。 对导电膜进行各向异性蚀刻，其中使用环形和垂直延伸的光致抗蚀剂图案作为掩模，以在环形和垂直延伸的光致抗蚀剂图案下形成环形且垂直延伸的底部电极， 抗蚀图案 去除环形和垂直延伸的光刻胶图案。

公开(公告)号：US06801313B1

公开(公告)日：2004-10-05

申请号：US09627456

申请日：2000-07-27

申请人： Kazuki Yokota

发明人： Kazuki Yokota

IPC分类号： G01B1100

CPC分类号： G03F7/70633 ,  H01L23/544 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2924/0002 ,  Y10T428/24612 ,  Y10T428/24851 ,  H01L2924/00

摘要： The present invention relates to an overlay mark used for the measurement of the overlay accuracy between layered patterns and alignment at the time of exposure; which has a grooved pattern surrounding a mark pattern that is formed by engraving a groove or an indent in a prescribed position on a layer where a circuit pattern is formed so as to protect this mark pattern from being deformed by thermal expansion or contraction of this layer. The present invention enables to form a multi-layered circuit pattern with a high accuracy and a high yield in production, even in the formation of a minute and densely-spaced circuit pattern.

摘要翻译： 本发明涉及用于测量分层图案和曝光时的对准之间的重叠精度的重叠标记; 其具有围绕通过在形成电路图案的层上的规定位置上雕刻凹槽或凹槽而形成的标记图案的沟槽图案，以保护该标记图案不被该层的热膨胀或收缩而变形 。 本发明即使在形成微小且密集的电路图案的情况下也能够以高精度和高产量的形式形成多层电路图案。

公开(公告)号：US06498401B2

公开(公告)日：2002-12-24

申请号：US09788759

申请日：2001-02-20

申请人： Kazuki Yokota

发明人： Kazuki Yokota

IPC分类号： H01L2176

CPC分类号： G03F7/70633 ,  G03F9/7076

摘要： An alignment mark set is provided, which facilitates the formation of a desired contour of each alignment mark and which suppresses the degradation of measurement accuracy for alignment of patterns. This alignment mark set comprises: (a) a first alignment mark formed in an exposure area; the area having a periphery, first central axis, and a second central axis perpendicular to the first axis; the first alignment mark being located near the first central axis and apart from the second axis; (b) a second alignment mark formed in the exposure area; the second alignment mark being located near the second central axis and apart from the first axis; and (c) when the exposure areas are regularly arranged in such a way as to have a same orientation in a plane, each of the first and second alignment marks in one of the sets is not located close to the first and second alignment marks in another of the sets, thereby ensuring irradiation of exposing light to all the areas. It is preferred that each of the first and second marks is square.

摘要翻译： 提供了一种对准标记集，其有助于形成每个对准标记的期望轮廓，并且抑制了图案对准的测量精度的劣化。 该对准标记组包括：（a）形成在曝光区域中的第一对准标记; 所述区域具有周边，第一中心轴线和垂直于所述第一轴线的第二中心轴线; 所述第一对准标记位于所述第一中心轴线附近并且与所述第二轴线分开; （b）形成在曝光区域中的第二对准标记; 所述第二对准标记位于所述第二中心轴线附近并且与所述第一轴线分离; 和（c）当曝光区域以规定的方式排列成在平面内具有相同取向时，其中一个组中的每个第一和第二对准标记都不位于接近第一和第二对准标记的位置 另一套，从而确保对所有区域的曝光光照射。 优选地，第一和第二标记中的每一个都是正方形。