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    UV treatment reactor
    2.
    发明授权
    UV treatment reactor 有权
    紫外线处理反应器

    公开(公告)号：US07507973B2

    公开(公告)日：2009-03-24

    申请号：US11555930

    申请日：2006-11-02

    申请人： Keith G. Bircher

    发明人： Keith G. Bircher

    IPC分类号： G01N21/00

    CPC分类号： C02F1/325 ,  C02F2201/3222 ,  C02F2201/3227 ,  C02F2201/328

    摘要： An apparatus for treating fluids with UV comprises a housing for receiving a flow of fluid having a fluid inlet, a fluid outlet, a reaction chamber; and an assembly of UV sources positioned substantially perpendicular to the fluid. The assembly includes at least first and second pairs of UV sources located in the reactor chamber. The first pair of UV sources has upper and lower UV sources that are positioned relative to each other at a span that is greater than the span between the upper and lower UV sources in the second pair. The second pair is positioned in either the upstream or downstream flow of fluid such that the plane created by the upper UV sources of each pair of UV sources intersects with the plane created by the lower UV sources of each pair of UV sources Subsequent UV sources or pairs of UV sources may be advantageously used. The apparatus may be combined with a baffle arrangement wherein the baffles are preferably positioned in such a way to direct the fluid now into the treatment area.

    摘要翻译： 用UV处理流体的装置包括用于接收具有流体入口，流体出口，反应室的流体流的壳体; 以及基本上垂直于流体定位的UV源的组件。 组件包括位于反应器室中的至少第一和第二对UV源。 第一对UV源具有上和下UV源，它们相对于彼此定位，跨度大于第二对中的上和下UV源之间的跨度。 第二对位于流体的上游或下游流动中，使得由每对UV源的上部UV源产生的平面与由每对UV源的较低UV源产生的平面相交。随后的UV源或 可以有利地使用成对的UV源。 该装置可以与挡板装置组合，其中挡板优选地以使流体直接进入处理区域的方式定位。

    UV TREATMENT REACTOR
    3.
    发明申请
    UV TREATMENT REACTOR 有权
    紫外线处理反应器

    公开(公告)号：US20080121812A1

    公开(公告)日：2008-05-29

    申请号：US11555930

    申请日：2006-11-02

    申请人： Keith G. Bircher

    发明人： Keith G. Bircher

    IPC分类号： G01N23/12

    CPC分类号： C02F1/325 ,  C02F2201/3222 ,  C02F2201/3227 ,  C02F2201/328

    摘要： An apparatus for treating fluids with UV comprises a housing for receiving a flow of fluid having a fluid inlet, a fluid outlet, a reaction chamber; and an assembly of UV sources positioned substantially perpendicular to the fluid. The assembly includes at least first and second pairs of UV sources located in the reactor chamber. The first pair of UV sources has upper and lower UV sources that are positioned relative to each other at a span that is greater than the span between the upper and lower UV sources in the second pair. The second pair is positioned in either the upstream or downstream flow of fluid such that the plane created by the upper UV sources of each pair of UV sources intersects with the plane created by the lower UV sources of each pair of UV sources Subsequent UV sources or pairs of UV sources may be advantageously used. The apparatus may be combined with a baffle arrangement wherein the baffles are preferably positioned in such a way to direct the fluid now into the treatment area.

    摘要翻译： 用UV处理流体的装置包括用于接收具有流体入口，流体出口，反应室的流体流的壳体; 以及基本上垂直于流体定位的UV源的组件。 组件包括位于反应器室中的至少第一和第二对UV源。 第一对UV源具有上和下UV源，它们相对于彼此定位，跨度大于第二对中的上和下UV源之间的跨度。 第二对位于流体的上游或下游流动中，使得由每对UV源的上部UV源产生的平面与由每对UV源的较低UV源产生的平面相交。随后的UV源或 可以有利地使用成对的UV源。 该装置可以与挡板装置组合，其中挡板优选地以使流体直接进入处理区域的方式定位。

    UV reactor assembly with improved lamp cooling means
    5.
    发明授权
    UV reactor assembly with improved lamp cooling means 失效
    具有改进的灯冷却装置的UV反应器组件

    公开(公告)号：US5372781A

    公开(公告)日：1994-12-13

    申请号：US836617

    申请日：1992-02-18

    申请人： Ronald C. Hallett ,  Stephen R. Cater ,  Keith G. Bircher ,  J. Adele Buckley ,  R. D. Samuel Stevens

    发明人： Ronald C. Hallett ,  Stephen R. Cater ,  Keith G. Bircher ,  J. Adele Buckley ,  R. D. Samuel Stevens

    IPC分类号： A61L2/10 ,  B01J19/12 ,  C02F1/32

    CPC分类号： C02F1/325 ,  A61L2/10 ,  B01J19/123 ,  C02F2201/3223 ,  C02F2201/324 ,  C02F2201/328

    摘要： A reactor assembly is provided for destroying contaminants in fluids by the application of UV radiation to promote the destruction of the contaminants. The reactor assembly has a vertically orientated reactor chamber with a centrally located lamp emitting UV radiation and operating at temperatures in excess of 700.degree. C. A protective sheath transparent to the UV radiation encloses the lamp and isolates the lamp from reactor interior to define thereby an annular reactor space through which fluids to be treated flow. The fluids flowing through the annular reactor space and along the sheath effect a cooling of the sheath due to lamp heating. The lamp has a terminal portion at each end thereof. Each terminal portion has a temperature sensitive component. The lamp is of a sufficient length to extend the terminals beyond the end portions of the reactor which has a length equal to or greater than the arc length of the lamp. Cooling air is directed on to each of the upper and lower terminals of the lamp to cool the temperature sensitive portions thereby preventing deterioration of each lamp end due to excessive heating. In directing cooling air onto the lower terminal a pressure is developed which is greater than the pressure at the upper end of the sheath so that a control constant flow of cooling air is assured upwardly of the sheath and over the lamp. This constant flow of cooling air is assured upwardly over the sheath and over the lamp. This constant flow of cooling air is controlled to permit the lamp to operate at optimum operating temperatures to provide the necessary output of UV radiation to promote the destruction of the contaminants in the fluids.

    摘要翻译： 提供反应器组件，用于通过施加UV辐射来破坏流体中的污染物，以促进污染物的破坏。 反应器组件具有垂直取向的反应室，其中心位置的灯发射紫外线辐射并在超过700℃的温度下操作。对UV辐射透明的保护护套封装灯并将灯隔离反应器内部，由此定义 环形反应器空间，待处理的流体通过该空间流动。 流经环形反应器空间并沿护套流动的流体由于灯加热而影响护套的冷却。 灯在其两端具有端子部分。 每个端子部分都具有温度敏感元件。 灯具有足够的长度以将端子延伸超过反应器的端部，其长度等于或大于灯的电弧长度。 冷却空气被引导到灯的上端和下端中的每一个，以冷却温度敏感部分，从而防止由于过度加热导致的每个灯端的劣化。 在将冷却空气引导到下部端子上时，显示出比鞘的上端处的压力大的压力，使得冷却空气的控制恒定流量被确保在护套的上方和灯的上方。 冷却空气的这种恒定的流动可以通过护套向上确保并在灯上方。 这种恒定的冷却空气流被控制以允许灯在最佳操作温度下操作以提供必要的UV辐射输出，以促进流体中污染物的破坏。