公开(公告)号：US20060223010A1

公开(公告)日：2006-10-05

申请号：US11391257

申请日：2006-03-29

申请人： Takayuki Tsuji ,  Tomoki Nagai ,  Kentarou Harada ,  Daisuke Shimizu

发明人： Takayuki Tsuji ,  Tomoki Nagai ,  Kentarou Harada ,  Daisuke Shimizu

IPC分类号： G03C5/00

CPC分类号： G03F7/0045 ,  G03F7/0392 ,  Y10S430/114

摘要： A positive type radiation-sensitive resin composition suitable as a chemically-amplified resist sensitive to active radiation particularly to deep ultraviolet rays represented by a KrF excimer laser, an ArF excimer laser, or an F2 excimer laser, excelling particularly in a process margin for the KrF excimer laser is provided. The positive type radiation-sensitive resin composition comprises a photoacid generator and an acid-labile group-containing resin which is insoluble or scarcely soluble in alkali, but becomes alkali-soluble by the action of an acid, wherein the photoacid generator is a mixed photoacid generator containing a photoacid generator of the following formula (1) and a photoacid generator which is at least one compound selected from sulfonyloxyimide and disulfonyldiazomethane.

摘要翻译： 适合作为对活性辐射敏感的化学增幅抗蚀剂的正型辐射敏感树脂组合物，特别是由KrF准分子激光器，ArF准分子激光器或F 2激子准分子激光器表示的深紫外线， 提供特别是在KrF准分子激光器的工艺余量中优异。 正型辐射敏感性树脂组合物包含光酸产生剂和不溶于或几乎不溶于碱的酸不稳定基团的树脂，但通过酸的作用而变成碱溶性，其中光酸产生剂是混合的光酸 含有下式（1）的光致酸产生剂和光酸产生剂，其为选自磺酰氧基酰亚胺和二磺酰基重氮甲烷中的至少一种化合物。

公开(公告)号：US20090202945A1

公开(公告)日：2009-08-13

申请号：US12294386

申请日：2007-03-23

申请人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

发明人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

IPC分类号： G03F7/039 ,  C08F20/22

CPC分类号： G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

摘要： An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

摘要翻译： 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸液式液晶等液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供较大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感性酸产生剂（C），含氮化合物（D）和溶剂（E）。

公开(公告)号：US08697343B2

公开(公告)日：2014-04-15

申请号：US12294386

申请日：2007-03-23

申请人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

发明人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

IPC分类号： G03F7/26 ,  G03F7/039

CPC分类号： G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

摘要： An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

摘要翻译： 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸液式液晶等液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供较大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感性酸产生剂（C），含氮化合物（D）和溶剂（E）。

公开(公告)号：US20100255420A1

公开(公告)日：2010-10-07

申请号：US12740111

申请日：2008-10-21

申请人： Hirokazu Sakakibara ,  Makoto Shimizu ,  Takehiko Naruoka ,  Yoshifumi Ooizumi ,  Kentarou Harada ,  Takuma Ebata

发明人： Hirokazu Sakakibara ,  Makoto Shimizu ,  Takehiko Naruoka ,  Yoshifumi Ooizumi ,  Kentarou Harada ,  Takuma Ebata

IPC分类号： G03C1/00 ,  C08F118/02

CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08L2312/06 ,  C09D133/14 ,  C09D133/16 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  C08F220/24 ,  C08F220/38

摘要： A radiation-sensitive resin composition includes a polymer, an acid-labile group-containing resin, a radiation-sensitive acid generator, and a solvent, the polymer including repeating units shown by following general formulas (1) and (2). wherein R1 and R2 represent a hydrogen atom, a methyl group, or a trifluoromethyl group, R3 represents a linear or branched alkyl group having 1 to 6 carbon atoms or an alicyclic hydrocarbon group having 4 to 20 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom, or a derivative thereof, and Z represents a group that includes a group that generates an acid upon exposure to light. The radiation-sensitive resin composition produces an excellent pattern shape, reduces the amount of elution into an immersion liquid upon contact during liquid immersion lithography, ensures that a high receding contact angle is formed by a resist film and an immersion liquid, and rarely causes development defects.

摘要翻译： 辐射敏感性树脂组合物包括聚合物，含酸不稳定基团的树脂，辐射敏感性酸产生剂和溶剂，所述聚合物包括由以下通式（1）和（2）表示的重复单元。 其中R 1和R 2表示氢原子，甲基或三氟甲基，R 3表示碳原子数1〜6的直链或支链烷基或碳原子数4〜20的脂环式烃基，其中至少一个氢原子 被氟原子或其衍生物取代，Z表示包含在曝光时产生酸的基团的基团。 放射线敏感性树脂组合物产生优异的图案形状，在液浸光刻期间减少接触时浸入液中的洗脱量，确保通过抗蚀剂膜和浸渍液形成高后退接触角，并且很少引起显影 缺陷

公开(公告)号：US07488566B2

公开(公告)日：2009-02-10

申请号：US11391257

申请日：2006-03-29

申请人： Takayuki Tsuji ,  Tomoki Nagai ,  Kentarou Harada ,  Daisuke Shimizu

发明人： Takayuki Tsuji ,  Tomoki Nagai ,  Kentarou Harada ,  Daisuke Shimizu

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： G03F7/0045 ,  G03F7/0392 ,  Y10S430/114

摘要： A positive type radiation-sensitive resin composition suitable as a chemically-amplified resist sensitive to active radiation particularly to deep ultraviolet rays represented by a KrF excimer laser, an ArF excimer laser, or an F2 excimer laser, excelling particularly in a process margin for the KrF excimer laser is provided. The positive type radiation-sensitive resin composition comprises a photoacid generator and an acid-labile group-containing resin which is insoluble or scarcely soluble in alkali, but becomes alkali-soluble by the action of an acid, wherein the photoacid generator is a mixed photoacid generator containing a photoacid generator of the following formula (1) and a photoacid generator which is at least one compound selected from sulfonyloxyimide and disulfonyldiazomethane.

摘要翻译： 适合作为对活性辐射敏感的化学放大抗蚀剂的正型辐射敏感性树脂组合物，特别是由KrF准分子激光器，ArF准分子激光器或F2准分子激光器表示的深紫外线，特别优选在 提供KrF准分子激光器。 正型辐射敏感性树脂组合物包含光酸产生剂和不溶于或几乎不溶于碱的酸不稳定基团的树脂，但通过酸的作用而变成碱溶性，其中光酸产生剂是混合的光酸 含有下式（1）的光致酸产生剂和光酸产生剂，其为选自磺酰氧基酰亚胺和二磺酰基重氮甲烷中的至少一种化合物。