3D GLASSES WITH ADJUSTING DEVICE FOR ALLOWING USER TO ADJUST DEGREES OF CROSSTALK AND BRIGHTNESS AND RELATED 3D DISPLAY SYSTEM THEREOF
    1.
    发明申请
    3D GLASSES WITH ADJUSTING DEVICE FOR ALLOWING USER TO ADJUST DEGREES OF CROSSTALK AND BRIGHTNESS AND RELATED 3D DISPLAY SYSTEM THEREOF 审中-公开
    具有调节装置的3D玻璃,用于允许用户调节摇摆和亮度的相关3D显示系统及其相关3D显示系统

    公开(公告)号:US20120169778A1

    公开(公告)日:2012-07-05

    申请号:US13070481

    申请日:2011-03-24

    IPC分类号: G09G5/10 G02B27/22

    CPC分类号: H04N13/341 H04N2213/008

    摘要: The present invention provides 3D glasses and a 3D display system. The 3D glasses includes: a first glass, a second glass, a control device, a power supply unit, and an adjusting device. The first glass is utilized for receiving left eye image. The second glass is utilized for receiving right eye image. The control device includes: a duty cycle unit and a control unit. The duty cycle unit is utilized for providing a duty cycle, and the control unit is utilized for controlling the first glass and the second glass whether to be pervious to light or not. The power supply unit is coupled to the control device, and utilized for providing power. The adjusting device is coupled to the control device, and utilized for adjusting the duty cycle provided by the duty cycle unit according to a user input.

    摘要翻译: 本发明提供3D眼镜和3D显示系统。 3D眼镜包括:第一玻璃,第二玻璃,控制装置,电源单元和调节装置。 第一个玻璃用于接收左眼图像。 第二个玻璃用于接收右眼图像。 控制装置包括:占空比单元和控制单元。 占空比单元用于提供占空比,并且控制单元用于控制第一玻璃和第二玻璃是否透光。 电源单元耦合到控制装置,并用于提供电力。 调整装置与控制装置连接,用于根据用户输入调整由占空比单元提供的占空比。

    Repair of photolithography masks by sub-wavelength artificial grating technology
    2.
    发明授权
    Repair of photolithography masks by sub-wavelength artificial grating technology 有权
    通过亚波长人造光栅技术修复光刻掩模

    公开(公告)号:US07303841B2

    公开(公告)日:2007-12-04

    申请号:US10810385

    申请日:2004-03-26

    IPC分类号: G03F1/00 G03F1/14 G06K9/00

    CPC分类号: G03F1/72

    摘要: A method is disclosed for repairing mask damage defects. After determining topographical information of a defect on a mask, one or more grating repair specifications are determined based on an optical simulation using the topographical information. One or more artificial grating areas are formed on one or more sides of the defect based on the grating repair specification.

    摘要翻译: 公开了一种用于修复面罩损伤缺陷的方法。 在确定掩模上的缺陷的外形信息之后,基于使用地形信息的光学模拟来确定一个或多个光栅修复规范。 基于光栅修复规范,在缺陷的一个或多个侧面上形成一个或多个人造光栅区域。

    Multi-step phase shift mask and methods for fabrication thereof
    3.
    发明申请
    Multi-step phase shift mask and methods for fabrication thereof 有权
    多步相移掩模及其制造方法

    公开(公告)号:US20050089764A1

    公开(公告)日:2005-04-28

    申请号:US10693989

    申请日:2003-10-22

    IPC分类号: G03C5/00 G03F9/00

    CPC分类号: G03F1/30 G03F1/28

    摘要: A phase shift mask comprises a transparent substrate having a patterned opaque material layer formed thereupon to form a non-transmissive region of the transparent substrate and an adjoining transmissive region of the transparent substrate. A pit is formed within the transmissive region of the transparent substrate. The pit has a stepped sidewall such as to provide the phase shift mask with enhanced optical performance. The phase shift mask may be fabricated employing a self aligned method.

    摘要翻译: 相移掩模包括具有在其上形成的图案化不透明材料层的透明基板,以形成透明基板的非透射区域和透明基板的相邻透射区域。 在透明基板的透射区域内形成凹坑。 凹坑具有阶梯式侧壁,以提供具有增强的光学性能的相移掩模。 可以使用自对准方法来制造相移掩模。

    LIQUID CRYSTAL DISPLAY PANEL
    4.
    发明申请
    LIQUID CRYSTAL DISPLAY PANEL 审中-公开
    液晶显示面板

    公开(公告)号:US20110255040A1

    公开(公告)日:2011-10-20

    申请号:US13083606

    申请日:2011-04-11

    IPC分类号: G02F1/1337

    CPC分类号: G02F1/1339

    摘要: A liquid crystal display panel includes a first substrate, a second substrate, an active layer, a first alignment film, a second alignment film, a liquid crystal layer, and a sealant. The first substrate includes a display region and a sealant region encompassing the display region. The second substrate is disposed oppositely to the first substrate. The liquid crystal layer is disposed between the first alignment film and the second alignment film. The liquid crystal layer includes a plurality of liquid crystal molecules, wherein the dielectric anisotropy of the liquid crystal molecules is substantially equal to or greater than 7, or substantially equal to or less than −4. The sealant is disposed between the first substrate and the second substrate, and is disposed in the sealant region. The sealant includes acrylics, wherein a weight percentage of acrylics is substantially between 50 wt % and 90 wt %.

    摘要翻译: 液晶显示面板包括第一基板,第二基板,有源层,第一取向膜,第二取向膜,液晶层和密封剂。 第一基板包括显示区域和包围显示区域的密封剂区域。 第二基板与第一基板相对设置。 液晶层设置在第一取向膜和第二取向膜之间。 液晶层包括多个液晶分子,其中液晶分子的介电各向异性基本上等于或大于7,或基本上等于或小于-4。 密封剂设置在第一基板和第二基板之间,并且设置在密封剂区域中。 密封剂包括丙烯酸类,其中丙烯酸类的重量百分比基本上在50重量%至90重量%之间。

    Repair of photolithography masks by sub-wavelength artificial grating technology
    5.
    发明申请
    Repair of photolithography masks by sub-wavelength artificial grating technology 有权
    通过亚波长人造光栅技术修复光刻掩模

    公开(公告)号:US20050214653A1

    公开(公告)日:2005-09-29

    申请号:US10810385

    申请日:2004-03-26

    IPC分类号: G03C5/00 G03F1/00 G03F9/00

    CPC分类号: G03F1/72

    摘要: A method is disclosed for repairing mask damage defects. After determining topographical information of a defect on a mask, one or more grating repair specifications are determined based on an optical simulation using the topographical information. One or more artificial grating areas are formed on one or more sides of the defect based on the grating repair specification.

    摘要翻译: 公开了一种用于修复面罩损伤缺陷的方法。 在确定掩模上的缺陷的外形信息之后,基于使用地形信息的光学模拟来确定一个或多个光栅修复规范。 基于光栅修复规范,在缺陷的一个或多个侧面上形成一个或多个人造光栅区域。

    DISPLAY PANEL
    6.
    发明申请
    DISPLAY PANEL 审中-公开
    显示面板

    公开(公告)号:US20120015115A1

    公开(公告)日:2012-01-19

    申请号:US12944724

    申请日:2010-11-12

    IPC分类号: C09K19/00

    摘要: A display panel includes a first substrate, a second substrate, a liquid crystal material between the first and second substrates, and an alignment layer on at least one of the first and second substrates. The liquid crystal material includes 10-90 wt % of a non-polar liquid crystal compound and 10-90 wt % of a polar liquid crystal compound, wherein a total amount of the non-polar and the polar liquid crystal compounds is 100 wt %. The non-polar liquid crystal compound has a dielectric anisotropy (Δε) of −1≦Δε≦1, and the polar liquid crystal compound has a dielectric anisotropy (Δε) of Δε≧1. The alignment layer has at least one of a polyamic acid and a cyclodehydration of the polyamic acid, wherein the polyamic acid is obtained by reacting a diamine compound with a tetracarboxylic acid dianhyhydirde compound.

    摘要翻译: 显示面板包括第一基板,第二基板,第一和第二基板之间的液晶材料以及第一和第二基板中的至少一个上的取向层。 该液晶材料包括10-90重量%的非极性液晶化合物和10-90重量%的极性液晶化合物,其中非极性和极性液晶化合物的总量为100重量% 。 非极性液晶化合物具有介电各向异性(&Dgr;&egr;),其极性液晶化合物具有介电各向异性(&Dgr& ≥1。 取向层具有聚酰胺酸和聚酰胺酸的环化脱水中的至少一种,其中聚酰胺酸通过使二胺化合物与四羧酸二氢化合物反应而获得。

    Mark focusing system for steppers
    7.
    发明授权
    Mark focusing system for steppers 有权
    标记用于步进器的聚焦系统

    公开(公告)号:US06190810B1

    公开(公告)日:2001-02-20

    申请号:US09483037

    申请日:2000-01-18

    IPC分类号: G03F900

    CPC分类号: G03F9/7026

    摘要: Single spot laser focusing systems are widely used by photolithographic stepping systems. The stage is moved until a spot, located in the immediate area in which the image is to be projected, achieves minimum size. This system is sensitive to the local topography within the area of the image and this can lead to less than optimum results. The present invention overcomes this problem by a process in which the spot is always directed to fall within an alignment mark field (as opposed to within the integrated circuit field). Several ways for accomplishing this are described.

    摘要翻译: 单点激光聚焦系统被光刻步进系统广泛使用。 舞台被移动到位于要投影图像的直接区域中的一个点,达到最小尺寸。 该系统对图像区域内的局部地形敏感,这可能导致不太优化的结果。 本发明通过一种方法克服了这个问题,其中光斑总是被指向落入对准标记场内(与集成电路领域相反)。 描述实现这一点的几种方法。

    Multi-step phase shift mask and methods for fabrication thereof
    8.
    发明授权
    Multi-step phase shift mask and methods for fabrication thereof 有权
    多步相移掩模及其制造方法

    公开(公告)号:US07135257B2

    公开(公告)日:2006-11-14

    申请号:US10693989

    申请日:2003-10-22

    IPC分类号: G01F9/00 G03C5/00

    CPC分类号: G03F1/30 G03F1/28

    摘要: A phase shift mask comprises a transparent substrate having a patterned opaque material layer formed thereupon to form a non-transmissive region of the transparent substrate and an adjoining transmissive region of the transparent substrate. A pit is formed within the transmissive region of the transparent substrate. The pit has a stepped sidewall such as to provide the phase shift mask with enhanced optical performance. The phase shift mask may be fabricated employing a self aligned method.

    摘要翻译: 相移掩模包括具有在其上形成的图案化不透明材料层的透明基板,以形成透明基板的非透射区域和透明基板的相邻透射区域。 在透明基板的透射区域内形成凹坑。 凹坑具有阶梯式侧壁,以提供具有增强的光学性能的相移掩模。 可以使用自对准方法来制造相移掩模。