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1.发明申请公开(公告)号：US20050002040A1
公开(公告)日：2005-01-06
申请号：US10825221
申请日：2004-04-16
IPC分类号： G01B9/02 , G01B11/00 , G03F7/20 , H01L21/027
CPC分类号： G01B9/02027 , G01B9/02018 , G01B9/0207 , G03F7/70775 , G03F9/7003
摘要： In an interferometric displacement measuring system, a correction for beamshear is made. The correction may be a polynomial of a variable proportional to the length of the optical path traversed by the measurement beam and the angle of the measurement mirror. The correction compensates for errors caused by non-planarity of the wavefront of the measurement beam.
摘要翻译： 在干涉位移测量系统中，进行横梁的校正。 校正可以是与由测量光束穿过的光路的长度和测量镜的角度成比例的变量的多项式。 校正补偿由测量光束的波前的非平面性引起的误差。
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公开(公告)号：US20070076218A1
公开(公告)日：2007-04-05
申请号：US11242130
申请日：2005-10-04
申请人： Tjarko Van Empel , Marcel Beems , Emiel Eussen
发明人： Tjarko Van Empel , Marcel Beems , Emiel Eussen
IPC分类号： G01B11/02
CPC分类号： G03F7/70891
摘要： A lithographic apparatus includes a position measurement system to determine along a measurement path a position of a first part of the lithographic apparatus with respect to a position of a second part of the lithographic apparatus. The position determination system comprises a plurality of temperature sensors to measure a temperature of a medium along the measurement path. The position measurement system corrects the determined position making use of the temperature as measured by the temperature sensors.
摘要翻译： 光刻设备包括位置测量系统，用于沿着测量路径确定光刻设备的第一部分相对于光刻设备的第二部分的位置的位置。 位置确定系统包括多个温度传感器，用于测量沿着测量路径的介质的温度。 位置测量系统使用由温度传感器测量的温度校正确定的位置。
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公开(公告)号：US20060238733A1
公开(公告)日：2006-10-26
申请号：US11135637
申请日：2005-05-24
申请人： Marcel Beems , Joe Sakai
发明人： Marcel Beems , Joe Sakai
IPC分类号： G03B27/52
CPC分类号： G03F7/70775
摘要： A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the substrate table with respect to an intermediate structure and a second measurement system to measure a position of the intermediate structure with respect to the reference structure. The intermediate structure may be connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure, and a distance between the intermediate structure and the reference structure may be small which results in a highly accurate position measurement.
摘要翻译： 光刻设备包括用于保持衬底的衬底台，参考结构和测量系统，以测量衬底台相对于参考结构的位置。 测量系统包括测量衬底台相对于中间结构的位置的第一测量系统和用于测量中间结构相对于参考结构的位置的第二测量系统。 中间结构可以连接或连接到驱动机构以驱动衬底台。 衬底台和中间结构之间的距离以及中间结构与参考结构之间的距离可能较小，这导致高度准确的位置测量。
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公开(公告)号：US20060238731A1
公开(公告)日：2006-10-26
申请号：US11109860
申请日：2005-04-20
申请人： Marcel Beems , Joe Sakai
发明人： Marcel Beems , Joe Sakai
IPC分类号： G03B27/52
CPC分类号： G03F7/70775
摘要： A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the substrate table with respect to an intermediate structure and a second measurement system to measure a position of the intermediate structure with respect to the reference structure. The intermediate structure may be connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure, resp. a distance between the intermediate structure and the reference structure may be small which results in a highly accurate position measurement.
摘要翻译： 光刻设备包括用于保持衬底的衬底台，参考结构和测量系统，以测量衬底台相对于参考结构的位置。 测量系统包括测量衬底台相对于中间结构的位置的第一测量系统和用于测量中间结构相对于参考结构的位置的第二测量系统。 中间结构可以连接或连接到驱动机构以驱动衬底台。 衬底台与中间结构之间的距离， 中间结构和参考结构之间的距离可能较小，这导致高度精确的位置测量。
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公开(公告)号：US20050248771A1
公开(公告)日：2005-11-10
申请号：US10995545
申请日：2004-11-24
IPC分类号： G01B9/02 , G01B11/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70775 , G01B9/02018 , G01B9/02019 , G01B9/02021 , G01B9/02027 , G01B2290/70
摘要： An improved lithographic interferometer system, is presented herein. The lithographic interferometer system comprises a beam generating mechanism, mirrors which reflect those beams, and detection devices for detecting an interference pattern of overlapping reflected beams. The beam generating mechanism comprises a beam-splitter, which splits the beams into reference beams and measuring beams, a reference mirror that provides a plane mirror interferometer, and a reflective surface that emits at least one reference beam used in a differential plane mirror interferometer.
摘要翻译： 本文提出了一种改进的光刻干涉仪系统。 光刻干涉仪系统包括光束产生机构，反射这些光束的反射镜和用于检测重叠反射光束的干涉图案的检测装置。 光束产生机构包括分束器，其将光束分成参考光束和测量光束，提供平面镜干涉仪的参考镜和发射在差分平面镜干涉仪中使用的至少一个参考光束的反射表面。
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公开(公告)号：US20050111005A1
公开(公告)日：2005-05-26
申请号：US10720752
申请日：2003-11-25
IPC分类号： G01B9/02 , G01B11/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70775 , G01B9/02018 , G01B9/02019 , G01B9/02021 , G01B9/02027 , G01B2290/70
摘要： An improved lithographic interferometer system, is presented herein. The lithographic interferometer system comprises a beam generating mechanism, mirrors which reflect those beams, and detection devices for detecting an interference pattern of overlapping reflected beams. The beam generating mechanism comprises a beam-splitter, which splits the beams into reference beams and measuring beams, a reference mirror that provides a plane mirror interferometer, and a reflective surface that emits at least one reference beam used in a differential plane mirror interferometer.
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