Semiconductor device and method of manufacture thereof
    1.
    发明授权
    Semiconductor device and method of manufacture thereof 有权
    半导体装置及其制造方法

    公开(公告)号:US08541812B2

    公开(公告)日:2013-09-24

    申请号:US12918542

    申请日:2009-02-26

    IPC分类号: H01L29/66

    摘要: A semiconductor device (10) comprising a bipolar transistor and a field effect transistor within a semiconductor body (1) comprising a projecting mesa (5) within which are at least a portion of a collector region (22d and 22e) and a base region (33d) of the bipolar transistor. The bipolar transistor is provided with a first insulating cavity (92) provided in the collector region (22d and 22e). The base region (33d) is narrower in the plane of the substrate than the collector region (22d and 22e) due to a second insulating cavity (94) provided around the base region (33d) and between the collector region (22d and 22e) and the emitter region (4). By blocking diffusion from the base region the first insulating cavity (92) provides a reduction in the base collector capacitance and can be described as defining the base contact.

    摘要翻译: 一种半导体器件(10),包括半导体本体(1)内的双极晶体管和场效应晶体管,所述半导体本体(1)包括突出台面(5),所述突出台面(5)中至少一部分为集电极区域(22d和22e)和基极区域 33d)。 双极晶体管设置有设置在集电区域(22d和22e)中的第一绝缘腔(92)。 基极区域(33d)由于设置在基极区域(33d)周围的第二绝缘腔(94d)和集电极区域(22d〜22e)之间,在基板的平面内比集电体区域(22d,22e)窄, 和发射极区域(4)。 通过阻挡来自基极区域的扩散,第一绝缘腔(92)提供基极集电极电容的减小并且可以被描述为限定基极触点。