公开(公告)号：US4583847A

公开(公告)日：1986-04-22

申请号：US631388

申请日：1984-07-16

申请人： Udo Battig ,  Peter Dittrich ,  Norbert Oertel ,  Gunter Osterland ,  Mathias Rucknagel ,  Werner Scheler ,  Klaus Schultz

发明人： Udo Battig ,  Peter Dittrich ,  Norbert Oertel ,  Gunter Osterland ,  Mathias Rucknagel ,  Werner Scheler ,  Klaus Schultz

IPC分类号： G01B9/00 ,  G01B5/00 ,  G01B11/00 ,  H01L21/68 ,  H01L21/683 ,  G03B27/42

CPC分类号： H01L21/6838 ,  G01B11/002 ,  G01B5/0004 ,  G03F7/70716 ,  G03F7/70775 ,  H01L21/681

摘要： The invention relates to an improvement for a wafer mounting table particularly for use in photolithographic apparatus for processing wafers comprising a compact mounting block made of glass-ceramics which has two neighboring back supports limiting two sides of a top face of said mounting block. The top face is provided with at least three studs for supporting a wafer to be processed. The sides of the back-supports facing away from said top face are provided with an elongated horizontally extending silvered area each, which is in opposition to a laser path measuring system each. The laser beams of said laser path measuring system define a plane which coincides with a projection plane of a projection lens being provided in opposition to a wafer mounted on said studs. Means are provided for substantially eliminating departures of the silvered areas from a straight plane. Further means are provided which enable a quick adaption of the laser mount for wafer charges having different thicknesses or diameters.

摘要翻译： 本发明涉及一种用于晶片安装台的改进，其特别适用于用于处理晶片的光刻设备，其包括由玻璃陶瓷制成的紧凑型安装块，其具有限制所述安装块的顶面的两侧的两个相邻的后支撑。 顶面设置有至少三个支柱，用于支撑待加工的晶片。 背面支撑物背离所述顶面的侧面设置有细长的水平延伸的镀银区域，每个都与激光路径测量系统相对立。 所述激光路径测量系统的激光束限定了与投影透镜的投影平面重合的平面，所述投影平面与安装在所述螺柱上的晶片相对。 提供了用于基本上消除镀银区域从直线平面偏离的装置。 提供了进一步的装置，其能够快速适应具有不同厚度或直径的晶片电荷的激光装置。