公开(公告)号：US07259777B2

公开(公告)日：2007-08-21

申请号：US11276516

申请日：2006-03-03

Applicant: Wolfgang Retschke ,  Wolfgang Senf ,  Steffen Rucker ,  Uwe Klowsky ,  Udo Battig ,  Ulrich Baumann

Inventor： Wolfgang Retschke ,  Wolfgang Senf ,  Steffen Rucker ,  Uwe Klowsky ,  Udo Battig ,  Ulrich Baumann

IPC: B41J2/435

CPC classification number: H04N1/192 ,  G03F7/203 ,  G03F7/2053 ,  G03F9/00 ,  H04N1/1008 ,  H04N1/1135 ,  H04N2201/0471 ,  H04N2201/04718 ,  H04N2201/04732 ,  H04N2201/04737 ,  H05K3/0082

Abstract: Apparatus for holding flat plates of varying sizes, including a base section having a flat surface and including plurality of interconnected channels formed on the surface thereof; at least one port connecting to the channels; a vacuum source connected to the at least one port; and an intermediate plate covering substantially all of the channels and having a multiplicity of holes formed therethrough, the holes being arranged to be covered by a flat plate that is to be held to the flat surface.

Abstract translation: 用于保持不同尺寸的平板的装置，包括具有平坦表面并且在其表面上形成的多个互连通道的基部; 至少一个端口连接到通道; 连接到所述至少一个端口的真空源; 以及中间板，其基本上覆盖所有通道，并且具有穿过其形成的多个孔，该孔被布置成被保持在平坦表面上的平板覆盖。

公开(公告)号：US07046266B1

公开(公告)日：2006-05-16

申请号：US09581377

申请日：1999-03-15

Applicant: Wolfgang Retschke ,  Wolfgang Senf ,  Steffen Rücker ,  Uwe Klowsky ,  Udo Battig ,  Ulrich Baumann

Inventor： Wolfgang Retschke ,  Wolfgang Senf ,  Steffen Rücker ,  Uwe Klowsky ,  Udo Battig ,  Ulrich Baumann

IPC: B41J2/47

CPC classification number: H04N1/192 ,  G03F7/203 ,  G03F7/2053 ,  G03F9/00 ,  H04N1/1008 ,  H04N1/1135 ,  H04N2201/0471 ,  H04N2201/04718 ,  H04N2201/04732 ,  H04N2201/04737 ,  H05K3/0082

Abstract: A method of scanning for writing a pattern on a surface, including providing a scanning beam comprised of a plurality of independently addressable sub-beams, scanning the surface with the scanning beam a plurality of times, the sub-beams scanning the surface side-by-side in the cross-scan direction, each sub-beam being modulated to reflect information to be written, and overlapping the beams in successive scans in the cross scan direction such that all written areas of the surface are written on during at least two scans.

Abstract translation: 一种在表面上扫描图案的方法，包括提供由多个可独立寻址的子光束组成的扫描光束，多次扫描光束扫描该表面，子光束扫描表面侧面 在横扫描方向上，每个子光束被调制以反映待写入的信息，并且在横扫扫描方向上以连续扫描重叠光束，使得在至少两次扫描期间写入表面的所有写入区域 。

公开(公告)号：US4583847A

公开(公告)日：1986-04-22

申请号：US631388

申请日：1984-07-16

Applicant: Udo Battig ,  Peter Dittrich ,  Norbert Oertel ,  Gunter Osterland ,  Mathias Rucknagel ,  Werner Scheler ,  Klaus Schultz

Inventor： Udo Battig ,  Peter Dittrich ,  Norbert Oertel ,  Gunter Osterland ,  Mathias Rucknagel ,  Werner Scheler ,  Klaus Schultz

IPC: G01B9/00 ,  G01B5/00 ,  G01B11/00 ,  H01L21/68 ,  H01L21/683 ,  G03B27/42

CPC classification number: H01L21/6838 ,  G01B11/002 ,  G01B5/0004 ,  G03F7/70716 ,  G03F7/70775 ,  H01L21/681

Abstract: The invention relates to an improvement for a wafer mounting table particularly for use in photolithographic apparatus for processing wafers comprising a compact mounting block made of glass-ceramics which has two neighboring back supports limiting two sides of a top face of said mounting block. The top face is provided with at least three studs for supporting a wafer to be processed. The sides of the back-supports facing away from said top face are provided with an elongated horizontally extending silvered area each, which is in opposition to a laser path measuring system each. The laser beams of said laser path measuring system define a plane which coincides with a projection plane of a projection lens being provided in opposition to a wafer mounted on said studs. Means are provided for substantially eliminating departures of the silvered areas from a straight plane. Further means are provided which enable a quick adaption of the laser mount for wafer charges having different thicknesses or diameters.

Abstract translation: 本发明涉及一种用于晶片安装台的改进，其特别适用于用于处理晶片的光刻设备，其包括由玻璃陶瓷制成的紧凑型安装块，其具有限制所述安装块的顶面的两侧的两个相邻的后支撑。 顶面设置有至少三个支柱，用于支撑待加工的晶片。 背面支撑物背离所述顶面的侧面设置有细长的水平延伸的镀银区域，每个都与激光路径测量系统相对立。 所述激光路径测量系统的激光束限定了与投影透镜的投影平面重合的平面，所述投影平面与安装在所述螺柱上的晶片相对。 提供了用于基本上消除镀银区域从直线平面偏离的装置。 提供了进一步的装置，其能够快速适应具有不同厚度或直径的晶片电荷的激光装置。

公开(公告)号：US20060132590A1

公开(公告)日：2006-06-22

申请号：US11276516

申请日：2006-03-03

Applicant: Wolfgang RETSCHKE ,  Wolfgang SENF ,  Steffen RUCKER ,  Uwe KLOWSKY ,  Udo BATTIG ,  Ulrich BAUMANN

Inventor： Wolfgang RETSCHKE ,  Wolfgang SENF ,  Steffen RUCKER ,  Uwe KLOWSKY ,  Udo BATTIG ,  Ulrich BAUMANN

IPC: G01D15/14

CPC classification number: H04N1/192 ,  G03F7/203 ,  G03F7/2053 ,  G03F9/00 ,  H04N1/1008 ,  H04N1/1135 ,  H04N2201/0471 ,  H04N2201/04718 ,  H04N2201/04732 ,  H04N2201/04737 ,  H05K3/0082

Abstract: Apparatus for holding flat plates of varying sizes, including a base section having a flat surface and including plurality of interconnected channels formed on the surface thereof; at least one port connecting to the channels; a vacuum source connected to the at least one port; and an intermediate plate covering substantially all of the channels and having a multiplicity of holes formed therethrough, the holes being arranged to be covered by a flat plate that is to be held to the flat surface.

Abstract translation: 用于保持不同尺寸的平板的装置，包括具有平坦表面并且在其表面上形成的多个互连通道的基部; 至少一个端口连接到通道; 连接到所述至少一个端口的真空源; 以及中间板，其基本上覆盖所有通道，并且具有穿过其形成的多个孔，该孔被布置成被保持在平坦表面上的平板覆盖。