SUBSTRATE SUPPORT APPARATUS FOR USE IN A POSITION MEASURING DEVICE
    2.
    发明申请
    SUBSTRATE SUPPORT APPARATUS FOR USE IN A POSITION MEASURING DEVICE 审中-公开
    用于位置测量装置的基板支撑装置

    公开(公告)号:US20070103667A1

    公开(公告)日:2007-05-10

    申请号:US11554338

    申请日:2006-10-30

    IPC分类号: G03B27/58

    CPC分类号: G03F7/70716 G03F7/70625

    摘要: The invention relates to a substrate support apparatus (41) for use in a position measuring device (1) for determining the position of a substrate (30, 45) supported by the substrate support apparatus (41) by means of a laser interferometer system (29), wherein the substrate support apparatus (41) comprises a traversable stage construction (26, 42), and a stage mirror (9, 43) fixedly associated with the stage construction for reflecting a laser beam of the laser interferometer system, wherein it is suggested that the measurement-critical components, associated in a spatially fixed way, of the substrate support apparatus (41) in the combination of elements ranging from the stage mirror (9, 43) to the substrate (30, 45) are of material structures having moduli of elasticity which differ from that of the substrate (30, 45) by not more than 15%. As a result, the negative effects of air pressure fluctuations on the laser-interferometric position measurement can be greatly reduced.

    摘要翻译: 本发明涉及一种用于位置测量装置(1)的基板支撑装置(41),用于通过激光干涉仪系统来确定由基板支撑装置(41)支撑的基板(30,45)的位置( 其特征在于,所述基板支撑装置(41)包括可移动平台结构(26,42)和与所述载物台结构固定地相关联的反射激光干涉仪系统的激光束的平台反射镜(9,43),其中 建议在从台式反射镜(9,43)到基板(30,45)的范围内组合的基板支撑装置(41)以空间固定的方式相关联的测量关键部件是材料 具有不同于基板(30,45)的弹性模量不超过15%的结构的结构。 结果,可以大大降低空气压力波动对激光干涉测量位置测量的负面影响。

    Test mask for optical and electron optical systems.
    3.
    发明申请
    Test mask for optical and electron optical systems. 失效
    光学和电子光学系统的测试掩模。

    公开(公告)号:US20070031739A1

    公开(公告)日:2007-02-08

    申请号:US11424500

    申请日:2006-06-15

    IPC分类号: G03F1/00

    CPC分类号: G02B21/0016 G03F1/36 G03F1/44

    摘要: A test mask 1 for microscopy is disclosed, which is formed on a substrate of quartz. The test mask 1 comprises a multiplicity of sub-masks 4, which are implemented such that each sub-mask 4 comprises structures which differ within a sub-mask 4 with regard to form and size. In addition, the structures of the individual sub-masks 4 are designed for optical or particle optical measurements according to size.

    摘要翻译: 公开了一种用于显微镜的测试掩模1,其形成在石英基片上。 测试掩模1包括多个子掩模4,其被实现为使得每个子掩模4包括关于形式和尺寸在子掩模4内不同的结构。 此外,各个子掩模4的结构被设计为根据尺寸进行光学或粒子光学测量。

    Test mask for optical and electron optical systems
    5.
    发明授权
    Test mask for optical and electron optical systems 失效
    光学和电子光学系统的测试掩模

    公开(公告)号:US07416819B2

    公开(公告)日:2008-08-26

    申请号:US11424500

    申请日:2006-06-15

    IPC分类号: G03F9/00

    CPC分类号: G02B21/0016 G03F1/36 G03F1/44

    摘要: A test mask 1 for microscopy is disclosed, which is formed on a substrate of quartz. The test mask 1 comprises a multiplicity of sub-masks 4, which are implemented such that each sub-mask 4 comprises structures which differ within a sub-mask 4 with regard to form and size. In addition, the structures of the individual sub-masks 4 are designed for optical or particle optical measurements according to size.

    摘要翻译: 公开了一种用于显微镜的测试掩模1,其形成在石英基片上。 测试掩模1包括多个子掩模4,其被实现为使得每个子掩模4包括关于形式和尺寸在子掩模4内不同的结构。 此外,各个子掩模4的结构被设计为根据尺寸的光学或粒子光学测量。