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1.发明授权公开(公告)号：US06714624B2
公开(公告)日：2004-03-30
申请号：US09956275
申请日：2001-09-18
IPC分类号： H05G200
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70908 , H05G2/005
摘要： A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography.
摘要翻译： 气幕装置用于偏转由诸如放电等离子体源的极紫外和软X射线放射源产生的碎片。 气幕装置在辐射路径上投射气流以使碎片颗粒偏转到与辐射路径不同的方向。 可以使用气幕来防止在光刻中使用的光学器件上的碎片积聚。
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公开(公告)号：US06206528B1
公开(公告)日：2001-03-27
申请号：US09164413
申请日：1998-09-30
IPC分类号： G02B7182
CPC分类号： G03F7/70216 , G02B7/182 , G03F7/70825
摘要： A pedestal optical substrate that simultaneously provides high substrate dynamic stiffness, provides low surface figure sensitivity to mechanical mounting hardware inputs, and constrains surface figure changes caused by optical coatings to be primarily spherical in nature. The pedestal optical substrate includes a disk-like optic or substrate section having a top surface that is coated, a disk-like base section that provides location at which the substrate can be mounted, and a connecting cylindrical section between the base and optics or substrate sections. The optic section has an optical section thickness2/optical section diameter ratio of between about 5 to 10 mm, and a thickness variation between front and back surfaces of less than about 10%. The connecting cylindrical section may be attached via three spaced legs or members. However, the pedestal optical substrate can be manufactured from a solid piece of material to form a monolith, thus avoiding joints between the sections, or the disk-like base can be formed separately and connected to the connecting section. By way of example, the pedestal optical substrate may be utilized in the fabrication of optics for an extreme ultraviolet (EUV) lithography imaging system, or in any optical system requiring coated optics and substrates with reduced sensitivity to mechanical mounts.
摘要翻译： 同时提供高基板动态刚度的基座光学基板，为机械安装硬件输入提供低的表面图灵敏度，并且将由光学涂层引起的表面图形变化限制为主要是球形的。 基座光学基板包括具有被涂覆的顶表面的盘状光学元件或基板部分，提供可安装基板的位置的盘状基部部分和基部与光学元件或基板之间的连接圆柱形部分 部分。 光学部分的光学部分厚度2 /光学截面直径比在约5至10mm之间，前表面和背面之间的厚度变化小于约10％。 连接圆柱形部分可以通过三个间隔开的腿或构件附接。 然而，基座光学基板可以由固体材料制成以形成整料，从而避免了两部分之间的接合，或者可以单独地形成盘状基底并连接到连接部分。 作为示例，基座光学基板可以用于制造用于极紫外（EUV）光刻成像系统的光学器件，或者可用于需要涂覆的光学器件和对机械安装件的灵敏度降低的基板的任何光学系统中。
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公开(公告)号：US06198792B1
公开(公告)日：2001-03-06
申请号：US09187911
申请日：1998-11-06
IPC分类号： G21K500
CPC分类号： G03F7/70866 , G03F7/70233 , G03F7/70908
摘要： An EUVL device includes a wafer chamber that is separated from the upstream optics by a barrier having an aperture that is permeable to the inert gas. Maintaining an inert gas curtain in the proximity of a wafer positioned in a chamber of an extreme ultraviolet lithography device can effectively prevent contaminants from reaching the optics in an extreme ultraviolet photolithography device even though solid window filters are not employed between the source of reflected radiation, e.g., the camera, and the wafer. The inert gas removes the contaminants by entrainment.
摘要翻译： EUVL装置包括晶片室，其通过具有可对惰性气体透过的孔的屏障与上游光学元件分离。 在位于极紫外光刻装置的室中的晶片附近保持惰性气幕可以有效地防止污染物在极紫外光刻装置中到达光学器件，即使在反射辐射源之间没有采用固体滤光器， 例如，相机和晶片。 惰性气体通过夹带来除去污染物。
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公开(公告)号：US08563325B1
公开(公告)日：2013-10-22
申请号：US12893915
申请日：2010-09-29
IPC分类号： B01L3/00
CPC分类号： B01L3/502776 , B01L3/502707 , B01L2200/0636 , B01L2300/0816 , B01L2300/0867 , B01L2300/123 , B01L2400/0478 , B01L2400/0622
摘要： A coaxial fluid flow microreactor system disposed on a microfluidic chip utilizing laminar flow for synthesizing particles from solution. Flow geometries produced by the mixing system make use of hydrodynamic focusing to confine a core flow to a small axially-symmetric, centrally positioned and spatially well-defined portion of a flow channel cross-section to provide highly uniform diffusional mixing between a reactant core and sheath flow streams. The microreactor is fabricated in such a way that a substantially planar two-dimensional arrangement of microfluidic channels will produce a three-dimensional core/sheath flow geometry. The microreactor system can comprise one or more coaxial mixing stages that can be arranged singly, in series, in parallel or nested concentrically in parallel.
摘要翻译： 同轴流体微反应器系统设置在微流体芯片上，利用层流从溶液中合成颗粒。 由混合系统产生的流动几何形状利用流体动力学聚焦来将核心流动限制在流动通道横截面的小轴向对称的，中心定位的和空间上良好限定的部分，以提供反应物核心与反应物核心之间的高度均匀的扩散混合 鞘流。 以这样的方式制造微反应器，使得微流体通道的基本上平面的二维布置将产生三维芯/鞘流几何形状。 微反应器系统可以包括一个或多个同轴混合阶段，其可以单独地，并行排列，并联或同心地平行布置。
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公开(公告)号：US20100061926A1
公开(公告)日：2010-03-11
申请号：US12547065
申请日：2009-08-25
CPC分类号： H01M8/04208 , C01B3/001 , C01B3/0026 , C01B3/0031 , F23C13/00 , F23C2900/9901 , H01M8/04216 , Y02E60/327
摘要： Auxiliary heating systems that can supply heat to a hydrogen storage material, which may comprise at least one hydridable material, located inside a hydrogen storage tank have been developed. These auxiliary heating systems involve the catalytic combustion of hydrogen and oxygen in a catalytic heater to produce heat and combustion products. The heat produced from the catalytic combustion may then be transferred, either indirectly or directly, to the hydrogen storage material to stimulate the release of additional desorbable hydrogen that may be stored in the at least one hydrdidable material.
摘要翻译： 已经开发了可以向位于氢储罐内部的可能包含至少一种可混合材料的储氢材料供热的辅助加热系统。 这些辅助加热系统涉及催化加热器中氢和氧的催化燃烧以产生热和燃烧产物。 然后可以将催化燃烧产生的热量间接地或直接地转移到储氢材料中，以刺激可存储在至少一种可水解材料中的另外的可吸收氢的释放。
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