公开(公告)号：US07959493B2

公开(公告)日：2011-06-14

申请号：US12609247

申请日：2009-10-30

申请人： Mitsuru Horie ,  Hiroyuki Tomonaga ,  Masabumi Ito ,  Noriaki Shimodaira

发明人： Mitsuru Horie ,  Hiroyuki Tomonaga ,  Masabumi Ito ,  Noriaki Shimodaira

IPC分类号： B24B1/00

CPC分类号： G11B5/8404 ,  B24B37/042

摘要： Spots generated on a glass substrate after a polishing step are reduced. The present invention relates to a method for polishing a glass substrate including injecting a silica abrasive and a high-boiling solvent in a final glass substrate polishing step. The high-boiling solvent is preferably a solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher. As Examples of the high-boiling solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher includes ethylene glycol, propylene glycol and glycerine.

摘要翻译： 在抛光步骤之后在玻璃基板上产生的斑点减小。 本发明涉及一种用于抛光玻璃基板的方法，包括在最后的玻璃基板研磨步骤中注入二氧化硅研磨剂和高沸点溶剂。 高沸点溶剂优选分子量为300以下，沸点为150℃以上的溶剂。 分子量为300以下，沸点为150℃以上的高沸点溶剂的实例包括乙二醇，丙二醇和甘油。

公开(公告)号：US07857680B2

公开(公告)日：2010-12-28

申请号：US11739997

申请日：2007-04-25

申请人： Katsuaki Miyatani ,  Osamu Miyahara ,  Yuzuru Tanabe ,  Hiroshi Usui ,  Yoshihisa Beppu ,  Kazuo Sunahara ,  Mitsuru Horie ,  Satoshi Kashiwabara ,  Tomohiro Sakai ,  Yoshinori Kon ,  Iori Yoshida

发明人： Katsuaki Miyatani ,  Osamu Miyahara ,  Yuzuru Tanabe ,  Hiroshi Usui ,  Yoshihisa Beppu ,  Kazuo Sunahara ,  Mitsuru Horie ,  Satoshi Kashiwabara ,  Tomohiro Sakai ,  Yoshinori Kon ,  Iori Yoshida

IPC分类号： B24C3/00 ,  C01G1/00 ,  G11B5/706 ,  G11B5/64 ,  C03C21/00

CPC分类号： G11B5/8404 ,  C03C3/15 ,  C03C10/0054 ,  C03C19/00

摘要： A method for producing a glass substrate for a magnetic disk by polishing a circular glass plate, which comprises a step of polishing the principal plane of the circular glass plate by using a slurry containing a CeO2 crystal powder, the CeO2 crystal powder being obtained in such a manner that a melt containing CeO2 is quenched to obtain an amorphous material, and the amorphous material is subjected to heat treatment to obtain a CeO2 crystals-precipitated amorphous material, which is subjected to acid treatment to separate and extract the CeO2 crystal powder from the CeO2 crystals-precipitated amorphous material.

摘要翻译： 通过研磨圆形玻璃板来制造用于磁盘的玻璃基板的方法，该方法包括通过使用含有CeO 2晶体粉末的浆料对圆形玻璃板的主平面进行研磨的步骤，所述CeO 2晶体粉末是这样获得的 使含有CeO 2的熔体淬火以获得无定形材料的方式，并且对非晶材料进行热处理以获得CeO 2晶体沉淀的非晶态材料，其经过酸处理以从CeO 2晶体粉末中分离并提取CeO 2晶体粉末 CeO2晶体沉淀的非晶态材料。

公开(公告)号：US20070251270A1

公开(公告)日：2007-11-01

申请号：US11739997

申请日：2007-04-25

申请人： Katsuaki Miyatani ,  Osamu Miyahara ,  Yuzuru Tanabe ,  Hiroshi Usui ,  Yoshihisa Beppu ,  Kazuo Sunahara ,  Mitsuru Horie ,  Satoshi Kashiwabara ,  Tomohiro Sakai ,  Yoshinori Kon ,  Iori Yoshida

发明人： Katsuaki Miyatani ,  Osamu Miyahara ,  Yuzuru Tanabe ,  Hiroshi Usui ,  Yoshihisa Beppu ,  Kazuo Sunahara ,  Mitsuru Horie ,  Satoshi Kashiwabara ,  Tomohiro Sakai ,  Yoshinori Kon ,  Iori Yoshida

IPC分类号： G11B5/706 ,  C03C21/00 ,  C03C10/00

CPC分类号： G11B5/8404 ,  C03C3/15 ,  C03C10/0054 ,  C03C19/00

摘要： A method for producing a glass substrate for a magnetic disk by polishing a circular glass plate, which comprises a step of polishing the principal plane of the circular glass plate by using a slurry containing a CeO2 crystal powder, the CeO2 crystal powder being obtained in such a manner that a melt containing CeO2 is quenched to obtain an amorphous material, and the amorphous material is subjected to heat treatment to obtain a CeO2 crystals-precipitated amorphous material, which is subjected to acid treatment to separate and extract the CeO2 crystal powder from the CeO2 crystals-precipitated amorphous material.

摘要翻译： 一种通过研磨圆形玻璃板来制造用于磁盘的玻璃基板的方法，该方法包括通过使用含有CeO 2结晶粉末的浆料对圆形玻璃板的主平面进行抛光的步骤， 以使含有CeO 2 H 2的熔体淬火获得无定形材料的方式获得CeO 2结晶粉末，并对非晶材料进行热处理以获得 CeO 2结晶沉淀的非晶态材料，其经过酸处理以从CeO 2结晶中分离并提取CeO 2/2结晶粉末 - 沉淀的无定形材料。

公开(公告)号：US20100048375A1

公开(公告)日：2010-02-25

申请号：US12609247

申请日：2009-10-30

申请人： Mitsuru HORIE ,  Hiroyuki TOMONAGA ,  Masabumi ITO ,  Noriaki SHIMODAIRA

发明人： Mitsuru HORIE ,  Hiroyuki TOMONAGA ,  Masabumi ITO ,  Noriaki SHIMODAIRA

IPC分类号： B24B7/24 ,  C03C3/00 ,  B24B7/17

CPC分类号： G11B5/8404 ,  B24B37/042

摘要： Spots generated on a glass substrate after a polishing step are reduced. The present invention relates to a method for polishing a glass substrate including injecting a silica abrasive and a high-boiling solvent in a final glass substrate polishing step. The high-boiling solvent is preferably a solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher. As Examples of the high-boiling solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher includes ethylene glycol, propylene glycol and glycerine.

摘要翻译： 在抛光步骤之后在玻璃基板上产生的斑点减小。 本发明涉及一种用于抛光玻璃基板的方法，包括在最后的玻璃基板研磨步骤中注入二氧化硅研磨剂和高沸点溶剂。 高沸点溶剂优选分子量为300以下，沸点为150℃以上的溶剂。 分子量为300以下，沸点为150℃以上的高沸点溶剂的实例包括乙二醇，丙二醇和甘油。

公开(公告)号：US20100159808A1

公开(公告)日：2010-06-24

申请号：US12640419

申请日：2009-12-17

申请人： Noriaki Shimodaira ,  Mitsuru Horie ,  Masabumi Ito

发明人： Noriaki Shimodaira ,  Mitsuru Horie ,  Masabumi Ito

IPC分类号： C03C15/00 ,  B24B1/00

CPC分类号： B24B1/00 ,  B24B7/24 ,  B24B13/00 ,  C03C19/00 ,  C03C21/006 ,  C03C2218/34 ,  G11B5/8404

摘要： The present invention relates to a method of glass surface fine processing for forming a convex portion on a surface of a glass containing alkali-metal oxides, the method including: a step of coating a surface of a first region adjacent to a surface of a second region which is to be a convex portion, with a protective layer; a step of removing alkali ions from the surface of the second region; a step of removing the protective layer from the surface of the first region; and a step of polishing the surface of the second region from which the alkali ions have been removed and the surface of the first region from which the protective layer has been removed.

摘要翻译： 本发明涉及一种用于在含有碱金属氧化物的玻璃的表面上形成凸部的玻璃表面微细加工方法，该方法包括以下步骤：将邻近第二区域的表面的第一区域的表面 作为凸部的区域，具有保护层; 从第二区域的表面去除碱离子的步骤; 从所述第一区域的表面去除所述保护层的步骤; 以及抛光从其中除去碱离子的第二区域的表面和已经从其除去保护层的第一区域的表面的步骤。