公开(公告)号：US6107007A

公开(公告)日：2000-08-22

申请号：US15437

申请日：1993-02-09

申请人： Tadahiro Ohmi ,  Hisayuki Shimada ,  Shigeki Shimomura ,  Akiyoshi Suzuki ,  Mamoru Miyawaki ,  Miyoko Noguchi

发明人： Tadahiro Ohmi ,  Hisayuki Shimada ,  Shigeki Shimomura ,  Akiyoshi Suzuki ,  Mamoru Miyawaki ,  Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03F7/32 ,  G03C5/00

CPC分类号： G03F7/701 ,  G03F7/322

摘要： A lithography process for forming a pattern having different sizes or different shapes of pattern components, comprises steps of exposing a resist to a predetermined light pattern by modified illumination, and removing, at least one step of forming the resist pattern, a region of the resist by employing a lithography-developing solution containing a surfactant, the surfactant being capable of promoting dissolution of a smaller pattern component to be removed of the resist.The surfactant is represented by the general formula below:HO(CH.sub.2 CH.sub.2 O).sub.a (CH(CH.sub.3)CH.sub.2 O).sub.b (CH.sub.2 CH.sub.2 O).sub.c Hwhere a, b, and c are respectively an integer.The surfactant satisfies the relation:(A+C)/(A+B+C).ltoreq.0.3where A represents the molecular weight of HO(CH.sub.2 CH.sub.2 O).sub.a, B represents the molecular weight of (CH(CH.sub.3)CH.sub.2 O).sub.b, and C represents the molecular weight of (CH.sub.2 CH.sub.2 O).sub.c H.

摘要翻译： 用于形成具有不同尺寸或不同形状的图案部件的图案的光刻工艺包括以下步骤：通过改进的照明将抗蚀剂暴露于预定的光图案，以及去除形成抗蚀剂图案的至少一个步骤， 通过使用含有表面活性剂的光刻显影液，表面活性剂能够促进较小的图案成分的溶解，以除去抗蚀剂。 表面活性剂由以下通式表示：HO（CH 2 CH 2 O）a（CH（CH 3）CH 2 O）b（CH 2 CH 2 O）c H其中a，b和c分别为整数。 表面活性剂满足下列关系：（A + C）/（A + B + C）≤0.3其中A表示HO（CH 2 CH 2 O）a的分子量，B表示（CH（CH 3）CH 2 O）b的分子量 ，C表示（CH 2 CH 2 O）c H的分子量。

公开(公告)号：US06473160B2

公开(公告)日：2002-10-29

申请号：US09768335

申请日：2001-01-25

申请人： Akiyoshi Suzuki ,  Miyoko Noguchi

发明人： Akiyoshi Suzuki ,  Miyoko Noguchi

IPC分类号： G03B2742

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70558

摘要： A projection exposure apparatus includes a light source for emitting light, a condensing optical system for receiving the light from the light source, for condensing the received light and for impinging the condensed light on a mask having a circuit pattern, a projection lens system for projecting the light passed through the mask onto a surface of a wafer, and an aperture member provided between the light source and the condensing optical system. The aperture member has a circular light transmitting portion for transmitting the light from the light source and a light blocking member extending across the circular light transmitting portion.

摘要翻译： 投影曝光装置包括用于发光的光源，用于接收来自光源的光的会聚光学系统，用于聚光接收的光并将会聚的光照射在具有电路图案的掩模上;投影透镜系统，用于突出 光通过掩模到晶片的表面，以及设置在光源和聚光系统之间的孔部件。 光圈构件具有用于透射来自光源的光的圆形光透射部分和延伸穿过圆形透光部分的遮光构件。

公开(公告)号：US06271909B1

公开(公告)日：2001-08-07

申请号：US08427709

申请日：1995-04-24

申请人： Akiyoshi Suzuki ,  Miyoko Noguchi

发明人： Akiyoshi Suzuki ,  Miyoko Noguchi

IPC分类号： G03B2742

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70558

摘要： An exposure apparatus and a device manufacturing method for transferring a device pattern on a substrate by illuminating the device pattern with light from a light source include features of changing a photointensity distribution of the light source and adjusting an illuminance distribution on the substrate in accordance with a change of the photointensity distribution.

摘要翻译： 通过用来自光源的光照射装置图案来将装置图案转印到基板上的曝光装置和装置制造方法包括改变光源的光密度分布和根据照相机调整基板上的照度分布的特征 光密度分布的变化。

公开(公告)号：US6128068A

公开(公告)日：2000-10-03

申请号：US467149

申请日：1995-06-06

申请人： Akiyoshi Suzuki ,  Miyoko Noguchi

发明人： Akiyoshi Suzuki ,  Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70241 ,  G03F7/70558

摘要： An exposure apparatus for forming an image of a fine pattern having linear features extending in orthogonal first and second directions. The apparatus includes an illumination optical system for illuminating the pattern, the illumination optical system including a device for forming a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively, wherein the secondary light source includes four sections being distributed in four quadrants defined by the center and the first and second axes, a projection optical system for projecting, on an image plane, an image of the pattern illuminated with light from the secondary light source, and a quartered detector, having four detector sections, for detecting a light quantity distribution of the secondary light source. Each of the four detector sections of the quartered detector independently detects a light quantity of a corresponding one of the four sections of the secondary light source.

摘要翻译： 一种用于形成具有在正交的第一和第二方向上延伸的线性特征的精细图案的图像的曝光装置。 该装置包括用于照亮图案的照明光学系统，该照明光学系统包括用于形成在其中心处具有降低的强度部分的第二光源的装置，以及限定为在中心彼此相交并限定的第一和第二轴线的装置 分别沿着第一和第二方向，其中二次光源包括分布在由中心和第一和第二轴限定的四个象限中的四个部分，投影光学系统，用于在图像平面上投影图案的图像 用来自二次光源的光照射，四分之一检测器具有四个检测器部分，用于检测二次光源的光量分布。 四分之一检测器的四个检测器部分中的每一个独立地检测次级光源的四个部分中的相应一个的光量。

公开(公告)号：US5305054A

公开(公告)日：1994-04-19

申请号：US836509

申请日：1992-02-18

申请人： Akiyoshi Suzuki ,  Miyoko Noguchi

发明人： Akiyoshi Suzuki ,  Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70558

摘要： An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions is disclosed, which method is characterized by: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.

摘要翻译： 公开了一种用于对具有沿着正交的第一和第二方向延伸的线性特征的精细图案进行成像的成像方法，该方法的特征在于：在其中心处提供具有降低的强度部分的光源以及限定为与每个方向相交的第一和第二轴线 另一个在中心并分别沿着第一和第二方向限定; 并用来自光源的光照射图案。

公开(公告)号：US5424803A

公开(公告)日：1995-06-13

申请号：US312183

申请日：1994-09-26

申请人： Miyoko Noguchi

发明人： Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F7/701

摘要： A projection exposure apparatus includes an illumination optical system for constituting illumination source for illuminating an original having an exposure pattern, the illumination optical system including changing mechanism for changing a shape of the illumination source; a projection optical system for projecting an image of the exposure pattern onto a surface to be exposed; an adjuster responsive to the changing mechanism to adjust the projection optical system.

摘要翻译： 投影曝光装置包括：照明光学系统，用于构成用于照射具有曝光图案的原稿的照明源，所述照明光学系统包括用于改变照明源的形状的改变机构; 投影光学系统，用于将曝光图案的图像投影到待曝光的表面上; 响应于改变机构的调节器来调整投影光学系统。

公开(公告)号：US6084655A

公开(公告)日：2000-07-04

申请号：US857593

申请日：1997-05-16

申请人： Akiyoshi Suzuki ,  Miyoko Noguchi

发明人： Akiyoshi Suzuki ,  Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70241 ,  G03F7/70558

摘要： An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions is disclosed, which method is characterized by: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.

摘要翻译： 公开了一种用于对具有沿着正交的第一和第二方向延伸的线性特征的精细图案进行成像的成像方法，该方法的特征在于：在其中心处提供具有降低的强度部分的光源以及限定为与每个方向相交的第一和第二轴线 另一个在中心并分别沿着第一和第二方向限定; 并用来自光源的光照射图案。

公开(公告)号：US5673102A

公开(公告)日：1997-09-30

申请号：US470482

申请日：1995-06-06

申请人： Akiyoshi Suzuki ,  Miyoko Noguchi

发明人： Akiyoshi Suzuki ,  Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70241 ,  G03F7/70558

摘要： An exposure apparatus for and a method of forming an image of a fine pattern having linear features extending in orthogonal first and second directions. The apparatus includes an illumination optical system for illuminating the pattern. The illumination optical system includes a device for forming a secondary light source having decreased intensity portions at a center thereof and on first and second intersecting axes defined along the first and second directions, respectively. A projection optical system projects, on an image plane, an image of the pattern illuminated with light from the light source. The light source includes four sections having substantially the same intensity and being distributed in the four quadrants defined by the axes. An image of the light source is projected onto a pupil of the projection optical system. On the assumption of a coordinate system defined X and Y-axes extending along the first and second directions and intersecting at a center of the pupil, and that a radius of the pupil is one, coordinates of centers of the four sections are (p, p), (-p, p), (-p, -p) and (p, -p), wherein 0.25

摘要翻译： 一种形成具有在正交的第一和第二方向上延伸的线性特征的精细图案的图像的曝光装置和方法。 该装置包括用于照亮图案的照明光学系统。 照明光学系统包括用于形成二次光源的装置，该二次光源在其中心处具有减小的强度部分，以及沿着第一和第二方向限定的第一和第二相交轴。 投影光学系统在图像平面上投影由来自光源的光照射的图案的图像。 光源包括具有基本相同强度的四个部分，并且分布在由轴限定的四个象限中。 将光源的图像投影到投影光学系统的光瞳上。 假设坐标系确定了沿着第一和第二方向延伸并且在瞳孔的中心相交的X和Y轴，并且瞳孔的半径为一，四个部分的中心坐标为（p， p），（-p，p），（-p，-p）和（p，-p），其中0.25

公开(公告)号：US5587834A

公开(公告)日：1996-12-24

申请号：US10789

申请日：1993-01-29

申请人： Miyoko Noguchi

发明人： Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03F1/36 ,  G03F1/70 ,  H01L21/027 ,  H01L21/30 ,  G02B5/18 ,  G02B27/00

CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F7/701 ,  G03F7/70125

摘要： A semiconductor device manufacturing method is disclosed, which includes the steps of illuminating obliquely an original having a grating-like pattern, with a light beam having a main wavelength .lambda., and projecting a portion of diffraction light produced by the pattern onto a pupil plane of a projection optical system having a numerical aperture NA, so as to project the pattern onto a predetermined plane related to a photosensitive substrate, wherein the original has a partially isolated pattern and an auxiliary pattern, the partially isolated pattern is such a pattern having no adjoining pattern within a range of D.ltoreq.(.lambda./NA) where D is the distance from one side thereof as measured on the predetermined plane, the auxiliary pattern has a linewidth L which satisfies the relation L.ltoreq.0.2(.lambda./NA) and it extends parallel to at least a portion of the partially isolated pattern, the auxiliary pattern is provided at a distance S from one side of the partially isolated pattern in the direction substantially perpendicular to the one side, and the distance S is within a rage of 0.ltoreq.S.ltoreq.0.1(.lambda./NA).

摘要翻译： 公开了一种半导体器件制造方法，其包括如下步骤：用具有主要波长λ的光束倾斜地照射具有格子状图案的原稿，并将由图案产生的衍射光的一部分投影到光瞳面 具有数值孔径NA的投影光学系统，以将图案投影到与感光基板相关的预定平面上，其中原稿具有部分隔离图案和辅助图案，部分隔离图案是这样的图案，其没有相邻的 D（λ/ NA）范围内的图案，其中D是在预定平面上测量的距离其一侧的距离，辅助图案具有满足关系L <= 0.2（λ/ NA）的线宽L ），并且其平行于部分隔离图案的至少一部分延伸，辅助图案距离部分隔离图案i的一侧距离S 在基本垂直于一侧的方向上，距离S在0≤S≤0.1（λ/ NA）的范围内。

公开(公告)号：US5436692A

公开(公告)日：1995-07-25

申请号：US321455

申请日：1994-10-11

申请人： Miyoko Noguchi

发明人： Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03B27/72

CPC分类号： G03F7/701

摘要： A projection exposure apparatus includes an illumination optical system for constituting illumination source for illuminating an original having an exposure pattern, the illumination optical system including changing mechanism for changing a shape of the illumination source; a projection optical system for projecting an image of the exposure pattern onto a surface to be exposed; an adjuster responsive to the changing mechanism to adjust the projection optical system.