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公开(公告)号：US10737322B2
公开(公告)日：2020-08-11
申请号：US15501409
申请日：2014-08-20
申请人： NINGXIA ORIENT TANTALUM INDUSTRY CO., LTD. , NATIONAL ENGINEERING RESEARCH CENTER FOR SPECIAL METAL MATERIALS OF TANTALUM AND NIOBIUM
发明人： Guoqi Yang , Aiguo Zheng , Yuezhong Ma
IPC分类号： B22F1/00 , B22F9/02 , B22F9/16 , H01G9/00 , B22F9/04 , B22F9/22 , C22F1/18 , H01G9/042 , H01G9/04
摘要： The present invention relates to a composite tantalum powder and a process for preparing the same, and to a capacitor anode prepared from the tantalum powder. The method for preparing a composite tantalum powder comprises the following steps of: 1) providing a tantalum powder prepared by a reduction process, and flattening the tantalum powder so as to prepare a flaked tantalum powder; 2) providing a granular tantalum powder prepared from tantalum ingot; 3) mixing the flaked tantalum powder and the granular tantalum powder to give a tantalum powder mixture; and 4) thermally treating the tantalum powder mixture, and then pulverizing, screening to give a composite tantalum powder. The present invention further relates to a composite tantalum powder prepared from the process and the use thereof in a capacitor.
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2.发明申请公开(公告)号：US20170232509A1
公开(公告)日：2017-08-17
申请号：US15501409
申请日：2014-08-20
申请人： NINGXIA ORIENT TANTALUM INDUSTRY CO., LTD. , NATIONAL ENGINEERING RESEARCH CENTER FOR SPECIAL METAL MATERIALS OF TANTALUM AND NIOBIUM
发明人： GUOQI YANG , Aiguo ZHENG , Yuezhong MA
摘要： The present invention relates to a composite tantalum powder and a process for preparing the same, and to a capacitor anode prepared from the tantalum powder. The method for preparing a composite tantalum powder comprises the following steps of: 1) providing a tantalum powder prepared by a reduction process, and flattening the tantalum powder so as to prepare a flaked tantalum powder; 2) providing a granular tantalum powder prepared from tantalum ingot; 3) mixing the flaked tantalum powder and the granular tantalum powder to give a tantalum powder mixture; and 4) thermally treating the tantalum powder mixture, and then pulverizing, screening to give a composite tantalum powder. The present invention further relates to a composite tantalum powder prepared from the process and the use thereof in a capacitor.
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3.发明公开公开(公告)号：US20240150194A1
公开(公告)日：2024-05-09
申请号：US18284211
申请日：2022-08-24
发明人： Shun Guo , Jinfeng Zheng , Tao Guo , Hongyuan Liang , Yuewei Cheng , Jingyi Zuo , Li Zhang , Ying Wang , Tong Liu , Hongjie Qin
IPC分类号： C01G35/00
CPC分类号： C01G35/00 , C01P2006/80
摘要： A low-carbon, high-purity tantalum pentoxide powder has a carbon content of no greater than 15 ppm. A preparation method for the powder includes: (1) adding a fluotantalic acid (H2TaF7) solution into a reaction kettle, controlling the temperature of the reaction kettle at 30-60° C., adding a precipitator until the pH of the reaction solution is 8-10, then stopping introducing ammonia, and aging to obtain a tantalum hydroxide slurry; (2) filtering and washing the slurry obtained in step (1), and then carrying out solid-liquid separation to obtain a tantalum hydroxide filter cake; (3) drying the filter cake obtained in step (2) to obtain white tantalum hydroxide powder; (4) calcining the tantalum hydroxide powder obtained in step (3), crushing and screening the calcined sample to obtain tantalum pentoxide powder; and (5) subjecting the tantalum pentoxide powder obtained in step (4) to heat treatment at a temperature of 1000-1500° C. to obtain the powder.
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公开(公告)号：US20210060654A1
公开(公告)日：2021-03-04
申请号：US16958150
申请日：2017-12-27
发明人： Haiyan MA , Hui LI , Guoqing LUO , Yuewei CHENG , Chunxia ZHAO , Xueqing CHEN , Zhidao WANG , Fukun LIN , Guoqi YANG , Ning WANG , Yinghui MA , Yanjie WANG , Lijun LI , Honggang ZHANG
摘要： A tantalum powder, a tantalum powder compact, a tantalum powder sintered body, a tantalum anode, an electrolytic capacitor and a preparation method for tantalum powder. The tantalum powder contains boron element, and the tantalum powder has a specific surface area of greater than or equal to 4 m2/g; the ratio of the boron content of the tantalum powder to the specific surface area of the tantalum powder is 2˜16; the boron content is measured in weight ppm, and the specific surface area is measured in m2/g; Powder that can pass through a ρ-mesh screen in the tantalum powder accounts for over 85% of the total weight of the tantalum powder, where ρ=150˜170; and the tantalum powder with high CV has a low leakage current and dielectric loss, and good moldability.
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公开(公告)号：US10737320B2
公开(公告)日：2020-08-11
申请号：US15111632
申请日：2014-02-27
发明人： Zhongxiang Li , Yuewei Cheng , Xueqing Chen , Ting Wang , Dejun Shi , Zekun Tong , Yan Yan , Xiaoyu Tian , Zhonghuan Zhao
摘要： The present invention relates to a high-purity tantalum powder and a preparation method therefore. The tantalum powder has a purity of more than 99.995%, as analyzed by GDMS. Preferably, the tantalum powder has an oxygen content of not more than 1000 ppm, a nitrogen content of not more than 50 ppm, a hydrogen content of not more than 20 ppm, a magnesium content of not more than 5 ppm, and an average particle diameter D50 of less than 25 μm.
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公开(公告)号：US10513769B2
公开(公告)日：2019-12-24
申请号：US15125803
申请日：2014-11-03
发明人： Yuewei Cheng , Fukun Lin , Xueqing Zhang , Guoqing Luo , Haiyan Ma , Yinghui Ma , Yanjie Wang , Xuanyu Wang , Dongjie Zhang
IPC分类号： C22F1/18 , B22F9/20 , B22F1/00 , H01G9/052 , B22F3/10 , B22F5/00 , B22F9/24 , C21D3/02 , H01G9/00 , H01G9/042 , H01G9/04
摘要： The invention relates to the rare metal smelting field, and particularly, the present invention relates to a tantalum powder for preparing capacitors and a process for preparing the tantalum powder, and to a sintered anode prepared from the tantalum powder. As to the tantalum powder as provided by the invention, its primary tantalum powder has a BET of from 3.0 to 4.5 m2/g. After the secondary agglomeration, the tantalum powder has a large particle size. The tantalum powder has an average Fisher sub-sieve size (FSSS) of 1.2 to 3.0 μm wherein as measured with a standard sieve mesh, more than 75% of tantalum powder has a +325-mesh, and a particle size distribution D50 of more than 60 μm, that is, the secondary particle size is high. A resultant capacitor anode prepared by sintering the tantalum powder of the invention at 1200° C. for 20 minutes and then being energized at the voltage of 20 V has the specific capacitance of from 140,000 to 180,000 μFV/g and the residual current of less than 1.0 nA/μFV. Meantime, the invention provides an economical process for making the tantalum powder.
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公开(公告)号：US20150211107A1
公开(公告)日：2015-07-30
申请号：US14418882
申请日：2013-08-16
发明人： Guipeng Li , Chunheng Zhang , Zhaobo Li , Kai Wang , Lei Tong , Wenming Chen
IPC分类号： C23C14/34 , H01J37/34 , C23C14/14 , B21B15/00 , C22C27/02 , B21B1/02 , B21B45/00 , H01L21/285 , C22F1/18
CPC分类号： C23C14/3414 , B21B1/024 , B21B1/026 , B21B15/0007 , B21B45/004 , C22C27/02 , C22F1/18 , C23C14/14 , H01J37/3426 , H01J37/3491 , H01J2237/3323 , H01L21/2855
摘要： A method for preparing a high-performance tantalum target, a high-performance target prepared by the method, and a use of the high-performance target. The method for preparing the high-performance tantalum target comprises: firstly, preparing a tantalum ingot into a forging blank by a method of cold forging in conjunction with hot forging; then, rolling the forging blank by a hot rolling method; and finally, performing leveling, and performing discharging, milling and surface treatment according to a size of a finished product, so as to obtain the tantalum target. The tantalum target prepared by the method has uniform crystallization, with a grain size between 50 μm and 120 μm. A texture component where a texture (110) dominants in the thickness direction of the target is obtained. A total proportion of three textures (111), (110) and (100) is between 40% and 50%, ensuring a consistent sputtering rate of the tantalum target during use.
摘要翻译： 一种制备高性能钽靶的方法，通过该方法制备的高性能靶，以及高性能靶的用途。 制备高性能钽靶的方法包括：首先，通过与热锻相结合的冷锻方法将钽锭制成锻造坯料; 然后用热轧法轧制锻造坯料; 最后进行整平，根据成品的尺寸进行放电，研磨，表面处理，得到钽靶。 通过该方法制备的钽靶具有均匀的结晶，晶粒尺寸在50μm和120μm之间。 获得纹理（110）在靶的厚度方向上占优势的纹理成分。 三个纹理（111），（110）和（100）的总比例在40％和50％之间，确保钽靶在使用过程中一致的溅射速率。
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8.发明公开公开(公告)号：US20240198422A1
公开(公告)日：2024-06-20
申请号：US18288855
申请日：2022-08-24
发明人： Yuewei Cheng , Jinfeng Zheng , Hongyuan Liang , Shun Guo , Haiyan Ma , Jingyi Zuo , Li Zhang , Hongjie Qin , Tong Liu , Ying Wang
CPC分类号： B22F9/20 , B22F1/142 , B22F1/145 , B22F2201/11 , B22F2201/20 , B22F2301/20 , B22F2998/10 , B22F2999/00
摘要： A method produces tantalum powder by reducing tantalum oxide with an alkaline earth metal. The method includes (1) mixing tantalum oxide with an excessive alkaline earth metal reducing agent, simultaneously mixing at least one alkali metal and/or alkaline earth metal halide accounting for 10-200% of the weight of the tantalum oxide, heating the mixture to a temperature of 700-1200° C. in a furnace filled with inert gas, and soaking so that the tantalum oxide and reducing agent are subjected to a reduction reaction; (2) at the end of soaking, lowering the temperature to 600-800° C., vacuumizing the interior of the furnace to 10 Pa or less, and soaking under the negative pressure so that the excessive magnesium and tantalum powder mixture are separated; (3) thereafter, raising the temperature of the furnace to 750-1200° C. in the presence of inert gas, and soaking so that the tantalum powder is further sintered in the molten salt; (4) then cooling to room temperature and passivating to obtain a mixed material containing halide and tantalum powder; and (5) separating the tantalum powder from the mixture.
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公开(公告)号：US20240157437A1
公开(公告)日：2024-05-16
申请号：US18284362
申请日：2022-08-24
发明人： Yuewei Cheng , Hongyuan Liang , Shun Guo , Jinfeng Zheng , Haiyan Ma , Jingyi Zuo , Li Zhang , Hongjie Qin , Tong Liu , Ying Wang
CPC分类号： B22F1/142 , B22F1/145 , B22F2301/20
摘要： A method produces tantalum powder. The method includes: (1) uniformly mixing a tantalum powder raw material, metal magnesium and at least one alkali metal and/or alkaline earth metal halide, loading the mixture into a container, and putting the container in a furnace; (2) raising the temperature of the furnace to 600-1200° C. in the presence of inert gas, and soaking; (3) at the end of soaking, lowering the temperature of the furnace to 600-800° C., vacuumizing the interior of the furnace to 10 Pa or less, soaking under the negative pressure so that the excessive metal is separated; (4) thereafter, raising the temperature of the furnace to 750-1200° C. in the presence of inert gas, and soaking so that the tantalum powder is sintered in the molten salt after oxygen reduction; (5) then cooling to room temperature and passivating to obtain a mixed material containing halide and tantalum powder; and (6) separating the tantalum powder from the resulting mixture.
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公开(公告)号：US20190308247A1
公开(公告)日：2019-10-10
申请号：US16317394
申请日：2016-07-13
发明人： Xueqing CHEN , Yuewei CHENG , Yuezhong MA , Zhongxiang LI , Zhidao WANG , Xia LI , Dejun SHI , Zhonghuan ZHAO
摘要： Provided are a flaked tantalum powder and method for preparation thereof; said flaked tantalum powder contains 300-1800 ppm of nitrogen, 10-100 ppm of phosphorus, and 1-40 ppm of boron. The flaked tantalum powder has high capacity and low leakage current, good puncture-resistance, and particularly outstanding high-frequency attributes. Doping with nitrogen during oxygen reduction is performed before three thermal treatments are carried out; the solution of performing three thermal treatments and a subsequent process improves the uniformity of distribution of elemental nitrogen and makes up for the deficiency of an oxide film, thereby increasing the pressure resistance of the product, and especially its high-frequency attributes.
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