公开(公告)号：US5415191A

公开(公告)日：1995-05-16

申请号：US263218

申请日：1994-06-17

申请人： Noriyoshi Mashimo ,  Katsuya Okumura

发明人： Noriyoshi Mashimo ,  Katsuya Okumura

IPC分类号： B08B3/08 ,  B08B9/02 ,  H01L21/00 ,  B08B3/10

CPC分类号： B08B9/027 ,  B08B3/08 ,  H01L21/67057 ,  B08B2203/005 ,  Y10S134/902

摘要： For cleaning semiconductor wafers in a cleaning vessel by supplying a cleaning fluid through a supply line thereto, a mixer is provided. Deionized water is supplied to the mixer through a deionized water supply line, and a cleaning gas is supplied thereto from a gas reservoir to produce the cleaning fluid. After treating the semiconductor wafers with the cleaning fluid, the deionized water is supplied to the cleaning vessel to rinse them.

摘要翻译： 为了通过向其提供清洁流体来清洁清洁容器中的半导体晶片，提供了一种混合器。 去离子水通过去离子水供给管路供给到混合器，并且从气体储存器向其提供清洁气体以产生清洗流体。 用清洁液处理半导体晶片后，将去离子水供应到清洗容器中以冲洗它们。

公开(公告)号：US5261966A

公开(公告)日：1993-11-16

申请号：US825589

申请日：1992-01-24

申请人： Noriyoshi Mashimo ,  Katsuya Okumura

发明人： Noriyoshi Mashimo ,  Katsuya Okumura

IPC分类号： B08B3/08 ,  B08B9/02 ,  H01L21/00 ,  C23G1/02

CPC分类号： B08B9/027 ,  B08B3/08 ,  H01L21/67057 ,  B08B2203/005 ,  Y10S134/902

摘要： For cleaning semiconductor wafers in a cleaning vessel by supplying a cleaning fluid through a supply line thereto, a mixer is provided. Deionized water is supplied to the mixer through a deionized water supply line, and a cleaning gas is supplied thereto from a gas reservoir to produce the cleaning fluid. After treating the semiconductor wafers with the cleaning fluid, the deionized water is supplied to the cleaning vessel to rinse them.

公开(公告)号：US5352359A

公开(公告)日：1994-10-04

申请号：US11904

申请日：1993-02-01

申请人： Hiroshi Nagai ,  Ken Nakajima ,  Yukio Ikeda ,  Noriyoshi Mashimo

发明人： Hiroshi Nagai ,  Ken Nakajima ,  Yukio Ikeda ,  Noriyoshi Mashimo

IPC分类号： C02F1/32 ,  C02F1/58

CPC分类号： C02F1/325 ,  C02F2201/3227 ,  C02F2201/328

摘要： An ultraviolet reactor for purifying a liquid, comprising a housing of circular or rectangular cross-sections, a multiplicity of ultraviolet lamps accommodated in the housing, an inlet and outlet for the liquid, which are provided at both ends, respectively, of the housing, and a plurality of mixing baffle plates provided inside the housing at a proper pitch along a longitudinal axis of the housing so that the liquid flows at right angles to the ultraviolet lamps.

摘要翻译： 一种用于净化液体的紫外线反应器，包括圆形或矩形横截面的壳体，容纳在壳体中的多个紫外灯，分别设置在壳体两端的用于液体的入口和出口， 以及沿壳体的纵向轴线以适当间距设置在壳体内部的多个混合挡板，使得液体与紫外线灯成直角流动。

公开(公告)号：US5318633A

公开(公告)日：1994-06-07

申请号：US846948

申请日：1992-03-06

申请人： Akihito Yamamoto ,  Naohiko Yasuhisa ,  Noriyoshi Mashimo ,  Masaharu Abe ,  Shingo Watanabe

发明人： Akihito Yamamoto ,  Naohiko Yasuhisa ,  Noriyoshi Mashimo ,  Masaharu Abe ,  Shingo Watanabe

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/46 ,  C30B25/08 ,  F27B17/00 ,  F27D7/02 ,  C23C16/00

CPC分类号： F27B17/0025 ,  C23C16/4404 ,  C23C16/45578 ,  C23C16/45591 ,  C23C16/46 ,  C30B25/08 ,  F27D7/02

摘要： A heat treating apparatus comprises a reaction tube for receiving a plurality of articles to be treated and a heating unit surrounding at least part of the reaction tube. The reaction tube comprises a first structural section, at least part of which is surrounded by the heating unit and a second structural section, at least part of which extends from the heating unit. The first structural section is made of material having thermal resistivity and thermal conductivity higher than the second structural section.

摘要翻译： 热处理装置包括用于接收多个待处理物品的反应管和围绕反应管的至少一部分的加热单元。 反应管包括第一结构部分，其至少一部分由加热单元包围，第二结构部分至少部分从加热单元延伸。 第一结构部分由具有高于第二结构部分的热阻和热导率的材料制成。