公开(公告)号：US20100230049A1

公开(公告)日：2010-09-16

申请号：US12722614

申请日：2010-03-12

申请人： Oliver Ansell ,  Anthony Barrass ,  Paul Bennett ,  David Tossell

发明人： Oliver Ansell ,  Anthony Barrass ,  Paul Bennett ,  David Tossell

IPC分类号： C23F1/06

CPC分类号： H01L21/67253 ,  H01J37/32917 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/32972 ,  H01J37/32981 ,  H01J37/3299

摘要： Apparatus for chemically etching a workpiece includes a chamber for receiving a process gas and having a pumping port for extracting exhaust gases, and a workpiece support located in the chamber upstream of the pumping port. The chamber further includes a sub-chamber located upstream of the pumping port and downstream of the workpiece support, and the sub-chamber includes a window and an excitation source, adjacent the window, for creating a plasma in a sample of the exhaust gases to create an optical emission which can be monitored through the window.

摘要翻译： 用于化学蚀刻工件的设备包括用于接收处理气体并具有用于抽取废气的泵送端口的腔室和位于泵送端口上游的腔室中的工件支撑件。 腔室还包括位于泵送端口的上游并且在工件支撑件的下游的子室，并且子室包括与窗口相邻的窗口和激发源，用于在废气样本中产生等离子体 产生可通过窗口监测的光发射。

公开(公告)号：US09159599B2

公开(公告)日：2015-10-13

申请号：US12722614

申请日：2010-03-12

申请人： Oliver Ansell ,  Anthony Barrass ,  Paul Bennett ,  David Tossell

发明人： Oliver Ansell ,  Anthony Barrass ,  Paul Bennett ,  David Tossell

IPC分类号： H01L21/67 ,  H01J37/32

CPC分类号： H01L21/67253 ,  H01J37/32917 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/32972 ,  H01J37/32981 ,  H01J37/3299

摘要： Apparatus for chemically etching a workpiece includes a chamber for receiving a process gas and having a pumping port for extracting exhaust gases, and a workpiece support located in the chamber upstream of the pumping port. The chamber further includes a sub-chamber located upstream of the pumping port and downstream of the workpiece support, and the sub-chamber includes a window and an excitation source, adjacent the window, for creating a plasma in a sample of the exhaust gases to create an optical emission which can be monitored through the window.

摘要翻译： 用于化学蚀刻工件的设备包括用于接收处理气体并且具有用于抽取废气的泵送端口的腔室和位于泵送端口上游的腔室中的工件支撑件。 腔室还包括位于泵送端口的上游并且在工件支撑件的下游的子室，并且子室包括与窗口相邻的窗口和激发源，用于在废气样本中产生等离子体 产生可通过窗口监测的光发射。