公开(公告)号：US08653807B2

公开(公告)日：2014-02-18

申请号：US12841833

申请日：2010-07-22

申请人： Peter M Kopalidis ,  Zhimin Wan

发明人： Peter M Kopalidis ,  Zhimin Wan

IPC分类号： G01N27/00 ,  G01N27/62 ,  H01J37/08 ,  A61N5/00

CPC分类号： G01N27/404

摘要： Techniques for ion beam current measurement, especially for measuring low energy ion beam current, are disclosed. In one exemplary embodiment, the techniques may be realized as an ion beam current measurement apparatus has at least a planar Faraday cup and a magnet device. The planar Faraday cup is close to an inner surface of a chamber wall, and may be non-parallel to or parallel to the inner surface. The magnet device is located close to the planar Faraday cup. Therefore, by properly adjusting the magnetic field, secondary electrons, incoming electrons and low energy ions may be adequately suppressed. Further, the planar Faraday cup may surround an opening of an additional Faraday cup being any conventional Faraday cup. Therefore, the whole ion beam may be received and measured well by the larger cross-section area of at least the planar Faraday cup on the ion beam path.

摘要翻译： 公开了用于离子束电流测量的技术，特别是用于测量低能量离子束电流。 在一个示例性实施例中，可以实现这些技术，因为离子束电流测量装置至少具有平面的法拉第杯和磁体装置。 平面法拉第杯靠近腔壁的内表面，并且可以不平行于或平行于内表面。 磁铁装置靠近平面法拉第杯。 因此，通过适当地调整磁场，可以适当地抑制二次电子，入射电子和低能离子。 此外，平面法拉第杯可以围绕任何常规法拉第杯的附加法拉第杯的开口。 因此，可以通过离子束路径上的至少平面法拉第杯的较大横截面面积良好地接收和测量整个离子束。

公开(公告)号：US08890506B2

公开(公告)日：2014-11-18

申请号：US13227425

申请日：2011-09-07

申请人： Peter M. Kopalidis ,  Zhimin Wan

发明人： Peter M. Kopalidis ,  Zhimin Wan

IPC分类号： G01N27/00 ,  G01R19/00 ,  G01N27/62

CPC分类号： G01N27/62 ,  G01R19/0061

摘要： Techniques for measuring ion beam current, especially for measuring low energy ion beam current, are disclosed. The technique may be realized as an ion beam current measurement apparatus having at least a planar Faraday cup and a voltage assembly. The planar Faraday cup is located close to an inner surface of a chamber wall, and intersects an ion beam path. The voltage assembly is located outside a chamber having the chamber wall. Therefore, by properly adjusting the electric voltage applied on the planar Faraday cup by the voltage assembly, some undesired charged particles may be adequately suppressed. Further, the planar Faraday cup may surround an opening of a non-planar Faraday cup which may be any conventional Faraday cup. Therefore, the whole ion beam may be received and measured well by the larger cross-section area of the planar Faraday cup on the ion beam path.

摘要翻译： 公开了用于测量离子束电流的技术，特别是用于测量低能量离子束电流的技术。 该技术可以被实现为具有至少一个平面法拉第杯和电压组件的离子束电流测量装置。 平面法拉第杯位于靠近室壁的内表面并与离子束路相交。 电压组件位于具有室壁的室外。 因此，通过适当地调整通过电压组件施加在平面法拉第杯上的电压，可以充分抑制一些不期望的带电粒子。 此外，平面法拉第杯可以围绕可以是任何常规法拉第杯的非平面法拉第杯的开口。 因此，可以通过离子束路径上的平面法拉第杯的较大的横截面面积良好地接收和测量整个离子束。

公开(公告)号：US06221169B1

公开(公告)日：2001-04-24

申请号：US09309096

申请日：1999-05-10

申请人： James D. Bernstein ,  Peter M. Kopalidis ,  Brian S. Freer

发明人： James D. Bernstein ,  Peter M. Kopalidis ,  Brian S. Freer

IPC分类号： B08B700

CPC分类号： H01J37/317 ,  H01J2237/0041 ,  H01J2237/31701

摘要： A method and system is provided for cleaning a contaminated surface of a vacuum chamber, comprising means for (i) generating an ion beam (44) having a reactive species (e.g., fluorine) component; (ii) directing the ion beam toward a contaminated surface (100); (iii) neutralizing the ion beam (44) by introducing, into the chamber proximate the contaminated surface, a neutralizing gas (70) (e.g., xenon) such that the ion beam (44) collides with molecules of the neutralizing gas, and, as a result of charge exchange reactions between the ion beam and the neutralizing gas molecules, creates a beam of energetic reactive neutral atoms of the reactive species; (iv) cleaning the surface (100) by allowing the beam of energetic reactive neutral atoms of the reactive species to react with contaminants to create reaction products; and (v) removing from the chamber any volatile reaction products that result. Alternatively, the method and system include means for (i) generating an energetic non-reactive (e.g., xenon) ion beam (44); (ii) directing the non-reactive ion beam toward a contaminated surface (100); (iii) introducing a cleaning gas (70) proximate the contaminated surface, comprised at least partially of a reactive species (e.g., fluorine) component; (iv) dissociating the cleaning gas using the ion beam (44) to create a supply of energetic reactive neutral atoms of the reactive species; (v) cleaning the surface (100) by allowing the energetic reactive neutral atoms of the reactive species to react with contaminants to create reaction products; and (vi) removing from the chamber any volatile reaction products that result.

摘要翻译： 提供了一种用于清洁真空室的污染表面的方法和系统，包括用于（i）产生具有反应性物质（例如氟）组分的离子束（44）的装置; （ii）将离子束导向污染表面（100）; （iii）通过将靠近污染表面的中和气体（例如氙）引入到室内，使得离子束（44）与中和气体的分子碰撞来中和离子束（44） 作为离子束和中和气体分子之间的电荷交换反应的结果，产生反应性物质的能量反应中性原子束; （iv）通过允许反应性物质的能量反应性中性原子束与污染物反应以产生反应产物来清洁表面（100）; 和（v）从室中除去导致的任何挥发性反应产物。 或者，该方法和系统包括用于（i）产生能量非反应（例如氙）离子束（44）的装置; （ii）将非反应性离子束引向污染表面（100）; （iii）在污染表面附近引入清洁气体（70），其至少部分地由反应性物质（例如氟）组分组成; （iv）使用离子束（44）解离清洁气体以产生反应性物质的能量反应性中性原子; （v）通过使反应性物质的能量反应性中性原子与污染物反应以产生反应产物来清洁表面（100）; 和（vi）从室中除去导致的任何挥发性反应产物。

公开(公告)号：US20130057250A1

公开(公告)日：2013-03-07

申请号：US13227425

申请日：2011-09-07

申请人： Peter M. KOPALIDIS ,  Zhimin WAN

发明人： Peter M. KOPALIDIS ,  Zhimin WAN

IPC分类号： G01N27/62

CPC分类号： G01N27/62 ,  G01R19/0061

摘要： Techniques for measuring ion beam current, especially for measuring low energy ion beam current, are disclosed. The technique may be realized as an ion beam current measurement apparatus having at least a planar Faraday cup and a voltage assembly. The planar Faraday cup is located close to an inner surface of a chamber wall, and intersects an ion beam path. The voltage assembly is located outside a chamber having the chamber wall. Therefore, by properly adjusting the electric voltage applied on the planar Faraday cup by the voltage assembly, some undesired charged particles may be adequately suppressed. Further, the planar Faraday cup may surround an opening of an additional Faraday cup being any conventional Faraday cup. Therefore, the whole ion beam may be received and measured well by the larger cross-section area of the planar Faraday cup on the ion beam path.

摘要翻译： 公开了用于测量离子束电流的技术，特别是用于测量低能量离子束电流的技术。 该技术可以被实现为具有至少一个平面法拉第杯和电压组件的离子束电流测量装置。 平面法拉第杯位于靠近室壁的内表面并与离子束路相交。 电压组件位于具有室壁的室外。 因此，通过适当地调整通过电压组件施加在平面法拉第杯上的电压，可以充分抑制一些不期望的带电粒子。 此外，平面法拉第杯可以围绕任何常规法拉第杯的附加法拉第杯的开口。 因此，可以通过离子束路径上的平面法拉第杯的较大的横截面面积良好地接收和测量整个离子束。

公开(公告)号：US20120019257A1

公开(公告)日：2012-01-26

申请号：US12841833

申请日：2010-07-22

申请人： PETER M. KOPALIDIS ,  ZHIMIN WAN

发明人： PETER M. KOPALIDIS ,  ZHIMIN WAN

IPC分类号： G01N27/62

CPC分类号： G01N27/404

摘要： Techniques for ion beam current measurement, especially for measuring low energy ion beam current, are disclosed. In one exemplary embodiment, the techniques may be realized as an ion beam current measurement apparatus has at least a planar Faraday cup and a magnet device. The planar Faraday cup is close to an inner surface of a chamber wall, and may be non-parallel to or parallel to the inner surface. The magnet device is located close to the planar Faraday cup. Therefore, by properly adjusting the magnetic field, secondary electrons, incoming electrons and low energy ions may be adequately suppressed. Further, the planar Faraday cup may surround an opening of an additional Faraday cup being any conventional Faraday cup. Therefore, the whole ion beam may be received and measured well by the larger cross-section area of at least the planar Faraday cup on the ion beam path.

摘要翻译： 公开了用于离子束电流测量的技术，特别是用于测量低能量离子束电流。 在一个示例性实施例中，可以实现这些技术，因为离子束电流测量装置至少具有平面的法拉第杯和磁体装置。 平面法拉第杯靠近腔壁的内表面，并且可以不平行于或平行于内表面。 磁铁装置靠近平面法拉第杯。 因此，通过适当地调整磁场，可以适当地抑制二次电子，入射电子和低能离子。 此外，平面法拉第杯可以围绕任何常规法拉第杯的附加法拉第杯的开口。 因此，可以通过离子束路径上的至少平面法拉第杯的较大横截面面积良好地接收和测量整个离子束。

公开(公告)号：US06259105B1

公开(公告)日：2001-07-10

申请号：US09309466

申请日：1999-05-10

申请人： Ronald J. Eddy ,  Peter M. Kopalidis

发明人： Ronald J. Eddy ,  Peter M. Kopalidis

IPC分类号： H01J3736

CPC分类号： H01J37/3171 ,  H01J2237/022

摘要： A method and system for controllably stripping a portion of silicon (98) from a silicon coated surface, for example, from an interior portion of an ion implanter (10). The system comprises (i) a source (80) of gas comprised at least partially of a reactive gas, such as fluorine; and (ii) a dissociation device (70) such as a radio frequency (RF) plasma source located proximate the silicon coated surface for converting the reactive gas to a plasma of dissociated reactive gas atoms and for directing the dissociated reactive gas atoms toward the silicon coated surface. A control system (102) determines the rate of removal of the silicon (98) from the surface by controlling (i) a rate of source gas flow into and the amount of power supplied to the dissociation device, and (ii) the time of exposure of the silicon coated surface to the plasma. The invention is useful, among other things, for removing a contaminant-laden layer of silicon from a wafer-supporting disk (40) in an ion implanter, wherein the silicon coated surface has been formed by applying a layer (98) of silicon onto the surface by a plasma enhanced physical vapor deposition (PECVD) process.

摘要翻译： 一种用于从例如离子注入机（10）的内部的硅涂覆表面可控地剥离硅（98）的一部分的方法和系统。 该系统包括（i）气体源（80），至少部分由反应性气体（例如氟）组成; 和（ii）诸如位于硅涂覆表面附近的射频（RF）等离子体源的解离装置（70），用于将反应气体转化为解离的反应气体原子的等离子体，并将解离的反应气体原子引向硅 涂层表面。 控制系统（102）通过控制（i）进入分解装置的源气体流量和供给量，以及（ii）提供给解离装置的功率的时间，确定硅（98）从表面去除的速率 将硅涂覆的表面暴露于等离子体。 除其他外，本发明可用于从离子注入机中的晶片支撑盘（40）去除含有污染物的硅层，其中通过将硅层（98）施加到 表面经等离子体增强物理气相沉积（PECVD）工艺。