Low Wetting Hysteresis Polysiloxane-Based Material and Method for Depositing Same
    1.
    发明申请
    Low Wetting Hysteresis Polysiloxane-Based Material and Method for Depositing Same 审中-公开
    低润湿滞后聚硅氧烷基材料及其沉积方法

    公开(公告)号:US20090081384A1

    公开(公告)日:2009-03-26

    申请号:US11922421

    申请日:2006-06-27

    CPC classification number: B05D1/62 B05D5/08 C09D4/00 C08G77/04

    Abstract: A polysiloxane-based material presents a predetermined structure or conformation such that the polysiloxane-based material comprises a ratio between a number of linear —Si—O— bonds and a number of cyclic —Si—O— bonds less than or equal to 0.4, and preferably less than or equal to 0.3. Such a polysiloxane-based material enables a wetting hysteresis less than 10°, and preferably less than 5° to be obtained. Such a low wetting hysteresis material can be achieved by chemical vapor deposition enhanced by a plasma wherein a precursor is injected. The precursor is selected from the group consisting of cyclic organosiloxanes such as octamethylcyclotetrasiloxane and derivatives thereof and cyclic organosilazanes such as octamethylcyclosilazane and derivatives thereof. A ratio between a power density dissipated in the plasma and a precursor flow rate injected in the plasma is less than or equal to 100 W.cm−2/mol.min−1.

    Abstract translation: 基于聚硅氧烷的材料具有预定的结构或构象,使得基于聚硅氧烷的材料包含多个直链-Si-O-键与小于或等于0.4的环状-Si-O-键的数量之间的比例, 优选小于或等于0.3。 这种基于聚硅氧烷的材料能够获得小于10°,优选小于5°的润湿滞后。 这种低润湿滞后材料可以通过其中注入前体的等离子体增强的化学气相沉积来实现。 前体选自环状有机硅氧烷如八甲基环四硅氧烷及其衍生物,环状有机硅氮烷如八甲基环四硅烷及其衍生物。 在等离子体中耗散的功率密度与在等离子体中注入的前体流速之间的比率小于或等于100W·cm-2 / mol·min -1。

    THIN FILM COATING METHOD
    4.
    发明申请
    THIN FILM COATING METHOD 审中-公开
    薄膜涂层方法

    公开(公告)号:US20100028526A1

    公开(公告)日:2010-02-04

    申请号:US12516459

    申请日:2007-11-06

    CPC classification number: B05D1/62 B05D1/34

    Abstract: The invention relates to a thin film coating method using a thin film having minimal adhesion in relation to biological species, of the type comprising the deposition of a thin film with —COOH function. The invention is characterised in that the method includes a step involving the vapour phase chemical decomposition of a carbonaceous precursor containing neither a carboxyl group nor a carbonyl group, in the presence of water. The invention is particularly suitable for use in the field of thin films.

    Abstract translation: 本发明涉及一种使用薄膜涂覆方法,该薄膜具有相对于生物物质具有最小粘附性的薄膜,其类型包括沉积具有-COOH功能的薄膜。 本发明的特征在于该方法包括在水存在下不含羧基和羰基的含碳前体的气相化学分解的步骤。 本发明特别适用于薄膜领域。

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