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公开(公告)号：US20060194130A1
公开(公告)日：2006-08-31
申请号：US11065931
申请日：2005-02-25
CPC分类号： G03F7/70258 , G03F7/70283 , G03F7/706
摘要： An exposure tool includes an illumination source, a blazed phase grating reticle, a reticle stage holding the blazed phase grating reticle, a lens system including at least one adjustable lens element, a wafer stage holding a sample, and a controller. The controller is configured to control the illumination source and the position of the blazed phase grating reticle and the lens system relative to the wafer stage to expose the sample to generate a blazed phase grating sample. The controller is configured to adjust the at least one adjustable lens element to compensate for aberrations of the lens system based on feedback generated from analyzing images of the blazed phase grating sample.
摘要翻译： 曝光工具包括照明源，闪耀相位光栅掩模版，保持闪耀相位光栅掩模版的掩模版台，包括至少一个可调透镜元件的透镜系统，保持样品的晶片台和控制器。 控制器被配置为控制照明源和闪耀相位光栅掩模版和透镜系统相对于晶片台的位置以暴露样品以产生闪耀的相位光栅样本。 控制器被配置为基于从分析闪耀相位光栅样本的图像产生的反馈来调整至少一个可调透镜元件以补偿透镜系统的像差。
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公开(公告)号：US20060193531A1
公开(公告)日：2006-08-31
申请号：US11066638
申请日：2005-02-25
CPC分类号： G03F7/70283 , G03F7/706 , G03F7/70641
摘要： A system for analyzing images of a blazed phase grating sample includes an interface configured to receive images of sample points of a blazed phase grating sample obtained by an inspection system, a memory for storing the images, and a processor. Each image is named according to a sequential naming protocol that associates each image to a location on the blazed phase grating sample. The processor is configured to load the images from the memory, convert image data for each sample point to intensity values by pixel, determine a best focus by azimuth for each sample point based on the intensity values, and calculate parameters from the blazed phase grating sample based on the best focus by azimuth for each sample point.
摘要翻译： 用于分析闪耀相位光栅样本的图像的系统包括被配置为接收由检查系统获得的闪耀相位光栅样本的采样点的图像，用于存储图像的存储器和处理器的接口的接口。 每个图像根据顺序命名协议命名，将每个图像与闪耀的相位光栅样本上的一个位置相关联。 处理器被配置为从存储器加载图像，将每个采样点的图像数据逐个像素转换为强度值，基于强度值确定每个采样点的方位角的最佳焦点，并从闪耀的相位光栅样本中计算参数 基于每个采样点的方位角的最佳焦点。
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3.发明申请公开(公告)号：US20060192943A1
公开(公告)日：2006-08-31
申请号：US11066913
申请日：2005-02-25
IPC分类号： G01B9/00
CPC分类号： G03F7/70641
摘要： An exposure tool includes an illumination source, a blazed phase grating reticle, a lens system, a focus sensor configured for maintaining a focus of the lens system, a stage holding a sample, and a controller. The controller is configured to control the illumination source and a position of the blazed phase grating reticle and the lens system relative to the stage to expose the sample according to a product shot map to generate a blazed phase grating sample. The controller is configured to adjust a focus offset of the exposure tool by product shot to improve focal plane fitting based on feedback generated from an analysis of images of the blazed phase grating sample.
摘要翻译： 曝光工具包括照明源，闪耀相位光栅掩模版，透镜系统，被配置为保持透镜系统的焦点的焦点传感器，保持样本的台阶和控制器。 控制器被配置为控制照明源和闪耀的相位光栅掩模版和透镜系统相对于台的位置，以根据产品镜头图曝光样品以产生闪耀的相位光栅样本。 控制器被配置为通过产品镜头来调整曝光工具的聚焦偏移，以根据从闪耀相位光栅样本的图像分析产生的反馈改善焦平面拟合。
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公开(公告)号：US07248351B2
公开(公告)日：2007-07-24
申请号：US11067191
申请日：2005-02-25
CPC分类号： G03F7/70083 , G01N21/9501 , G01N21/956 , G03F7/70625
摘要： An inspection system includes an illumination source configured to illuminate a blazed phase grating sample, image collection pathways and an imaging system configured to capture an image of a sample point of the blazed phase grating sample, and a controller configured to adjust the illumination source in response to an analysis of the image of the sample point to determine illumination uniformity of the inspection system.
摘要翻译： 检查系统包括：照明源，被配置为照亮闪耀相位光栅样本，图像采集路径和被配置为捕获闪耀相位光栅样本的采样点的图像的成像系统;以及控制器，被配置为响应于调整照明源 对采样点的图像进行分析，以确定检查系统的照明均匀性。
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公开(公告)号：US20090168034A1
公开(公告)日：2009-07-02
申请号：US11966978
申请日：2007-12-28
申请人： Jens Staecker , Patrick Lomtscher
发明人： Jens Staecker , Patrick Lomtscher
IPC分类号： G03B27/42
CPC分类号： G03F7/70633
摘要： Methods and apparatus of manufacturing a semiconductor device are provided. Embodiments regard producing a first pattern in a first layer of a semiconductor substrate, producing a second pattern in a second layer of the semiconductor substrate, and matching the first pattern and the second pattern. The matching includes determining a mismatch between the first pattern and the second pattern that would occur without the matching and precorrecting the mismatch in the first layer.
摘要翻译： 提供制造半导体器件的方法和装置。 实施例涉及在半导体衬底的第一层中产生第一图案，在半导体衬底的第二层中产生第二图案，并且匹配第一图案和第二图案。 匹配包括确定在不匹配和预校正第一层中的不匹配的情况下将发生的第一图案和第二图案之间的不匹配。
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公开(公告)号：US20060192947A1
公开(公告)日：2006-08-31
申请号：US11067191
申请日：2005-02-25
IPC分类号： G01N21/88
CPC分类号： G03F7/70083 , G01N21/9501 , G01N21/956 , G03F7/70625
摘要： An inspection system includes an illumination source configured to illuminate a blazed phase grating sample, image collection pathways and an imaging system configured to capture an image of a sample point of the blazed phase grating sample, and a controller configured to adjust the illumination source in response to an analysis of the image of the sample point to determine illumination uniformity of the inspection system.
摘要翻译： 检查系统包括：照明源，被配置为照亮闪耀相位光栅样本，图像采集路径和被配置为捕获闪耀相位光栅样本的采样点的图像的成像系统;以及控制器，被配置为响应于调整照明源 对采样点的图像进行分析，以确定检查系统的照明均匀性。
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