Patterned functionalized silicon surfaces
    3.
    发明授权
    Patterned functionalized silicon surfaces 失效
    图案化的功能化硅表面

    公开(公告)号:US07553776B2

    公开(公告)日:2009-06-30

    申请号:US11499188

    申请日:2006-08-04

    IPC分类号: H01L21/31

    CPC分类号: H01L21/306 Y10S977/857

    摘要: The present invention provides a method for preparing a silicon substrate and a silicon substrate having a silicon surface comprising a pattern of covalently bound monolayers. Each of the monolayers comprises an alkyne, wherein at least a portion of each monolayer is no more than about 5 molecules of the alkyne wide.

    摘要翻译: 本发明提供一种制备硅衬底和硅衬底的方法,所述硅衬底具有包含共价结合单层图案的硅表面。 每个单层包含炔,其中每个单层的至少一部分不超过约5分子的炔。