利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

168 条记录 (耗时 0.031 秒)

    Catadioptric projection objective
    4.
    发明授权
    Catadioptric projection objective 有权
    反射折射投影物镜

    公开(公告)号：US07697198B2

    公开(公告)日：2010-04-13

    申请号：US10576265

    申请日：2004-10-15

    申请人： David Shafer ,  Alexander Epple ,  Aurelian Dodoc ,  Wilhelm Ulrich ,  Karl-Heinz Schuster

    发明人： David Shafer ,  Alexander Epple ,  Aurelian Dodoc ,  Wilhelm Ulrich ,  Karl-Heinz Schuster

    IPC分类号： G02B17/08

    CPC分类号： G02B13/143 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70275

    摘要： A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.

    摘要翻译： 一种反折射投射物镜，用于将布置在投影物镜的物平面中的图案投影到投影物镜的像平面中，具有：第一物镜部分，用于将物平面中的物场投影到第一实际中间像中; 第二目标部分，用于利用来自第一目标部分的辐射产生第二实际中间图像; 第三目标部分，用于利用来自第二目标部分的辐射产生第三实际中间图像; 以及用于将第三实际中间图像投影到图像平面中的第四目标部分。

    Microlithographic projection exposure apparatus
    7.
    发明授权
    Microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置

    公开(公告)号：US07532306B2

    公开(公告)日：2009-05-12

    申请号：US10917371

    申请日：2004-08-13

    申请人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    发明人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/54

    CPC分类号： G03F7/7015 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983

    摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

    摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。

    Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate
    9.
    发明授权
    Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate 失效
    用于光学地检测成像系统的图像平面与基板表面的偏差的方法

    公开(公告)号：US07442908B2

    公开(公告)日：2008-10-28

    申请号：US11102818

    申请日：2005-04-11

    申请人： Karl-Heinz Schuster

    发明人： Karl-Heinz Schuster

    IPC分类号： G02B7/04 ,  G03B27/52

    CPC分类号： G03F9/7026 ,  G02B7/28

    摘要： A microlithographic projection illumination system has a focus-detection system for optically detecting deviations of the image plane of a projection lens from the upper surface of a substrate arranged in the vicinity of its image plane. The focus-detection system has a system for coupling in at least one measuring beam that is obliquely incident on, and to be reflected at, the substrate surface into an intermediate zone between the final optical surface of the imaging system and the substrate surface and a system for coupling out the measuring beam and detecting it following its reflection at the substrate surface. The system for coupling the measuring beam in and the system for coupling it out are configured such that the measuring beam is reflected at least once at the substrate surface and at least once at a reflecting surface of the imaging system that reflects the light employed for measurement purposes before the measuring beam enters the system for coupling it out, which allows employing the image side of the imaging system as part of the focus-detection system. The focus-detection system also operates reliably when used on ultrahigh-aperture lenses that have correspondingly short working distances.

    摘要翻译： 微光刻投影照明系统具有聚焦检测系统，用于光学地检测投影透镜的图像平面与布置在其图像平面附近的基板的上表面的偏差。 焦点检测系统具有用于耦合到至少一个测量光束的系统，所述至少一个测量光束倾斜地入射到衬底表面上并且被反射到成像系统的最终光学表面与衬底表面之间的中间区域中， 用于耦合出测量光束并在其在衬底表面处的反射之后检测它的系统。 用于耦合测量光束的系统和用于耦合测量光束的系统被配置为使得测量光束在基板表面处被反射至少一次，并且至少在反射用于测量的光的成像系统的反射表面反射一次 测量光束进入系统以将其耦合出来的目的，这允许将成像系统的像侧作为焦点检测系统的一部分。 当使用具有相应较短工作距离的超高孔径镜头时，对焦检测系统也可靠地运行。

    Imaging System
    10.
    发明申请
    Imaging System 审中-公开
    成像系统

    公开(公告)号：US20080259441A1

    公开(公告)日：2008-10-23

    申请号：US12146357

    申请日：2008-06-25

    申请人： David Shafer ,  Aurelia Dodoc ,  Karl-Heinz Schuster

    发明人： David Shafer ,  Aurelia Dodoc ,  Karl-Heinz Schuster

    IPC分类号： G02B17/08

    CPC分类号： G03F7/70225 ,  G02B17/08 ,  G02B17/0848 ,  G02B17/0892 ,  G02B27/0025 ,  G03F7/70275

    摘要： An imaging system for imaging an object field arranged in an object surface of the imaging system onto an image field arranged in an image surface of the optical system while creating at least one intermediate image including: a first imaging subsystem for creating the intermediate image from radiation coming from the object surface, the first imaging subsystem having a first optical axis; and a second imaging subsystem different in construction from the first imaging subsystem for imaging the intermediate image onto the image surface, the second imaging subsystem having a second optical axis; wherein the first optical axis is offset with respect to the second optical axis by an axis offset at the intermediate image and wherein the intermediate image has a correction status adapted to the axis-offset such that the correction status of the image field is essentially free from aberrations caused by the axis-offset.

    摘要翻译： 一种成像系统，用于将布置在成像系统的物体表面中的物体场成像到布置在光学系统的图像表面中的图像场，同时创建至少一个中间图像，所述中间图像包括：第一成像子系统，用于从辐射创建中间图像 来自物体表面的第一成像子系统具有第一光轴; 以及与所述第一成像子系统不同的第二成像子系统，用于将所述中间图像成像到所述图像表面上，所述第二成像子系统具有第二光轴; 其中所述第一光轴相对于所述第二光轴偏移在所述中间图像处的偏移，并且其中所述中间图像具有适于所述轴偏移的校正状态，使得所述图像场的校正状态基本上不存在 轴偏移造成的像差。