公开(公告)号：US20120273658A1

公开(公告)日：2012-11-01

申请号：US13281559

申请日：2011-10-26

申请人： Marco Jan-Jaco Wieland ,  Teunis Van De Peut ,  Alexander Hendrik Vincent Van Veen ,  Remco Jager ,  Stijn Willem Herman Karel Steenbrink ,  Ralph Van Melle ,  Henk Derks

发明人： Marco Jan-Jaco Wieland ,  Teunis Van De Peut ,  Alexander Hendrik Vincent Van Veen ,  Remco Jager ,  Stijn Willem Herman Karel Steenbrink ,  Ralph Van Melle ,  Henk Derks

IPC分类号： H01J3/26 ,  G21K5/04

CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

摘要： The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.

摘要翻译： 本发明涉及带电粒子多子束光刻系统。 该系统包括用于产生多个子束的光束发生器，用于对多个子束进行图案化的子束遮蔽器阵列，光纤布置和投影系统。 子束消除器阵列包括设置有包括一个或多个调制器的第一区域和不含调制器的第二区域的衬底。 子束消隐器阵列包括电连接到一个或多个调制器的一个或多个光敏元件，并被布置成接收携带图案数据的光束。 光纤布置包括多个光纤，用于将携带图案数据的光束引向一个或多个光敏元件。 光束布置在垂直于表面的方向上投射到子束消除器阵列的表面上完全落在第二区域内。

公开(公告)号：US20130043413A1

公开(公告)日：2013-02-21

申请号：US13452558

申请日：2012-04-20

申请人： Guido DE BOER ,  Ralph VAN MELLE ,  Teunis VAN DE PEUT ,  Henk DERKS ,  Frederik Matthias SPIEGELHALDER

发明人： Guido DE BOER ,  Ralph VAN MELLE ,  Teunis VAN DE PEUT ,  Henk DERKS ,  Frederik Matthias SPIEGELHALDER

IPC分类号： G21K5/00 ,  B29C65/52 ,  B32B38/00 ,  G02B6/12

CPC分类号： B32B37/142 ,  B32B37/1284 ,  B32B37/1292 ,  B32B38/0012 ,  B32B2551/00 ,  B82Y10/00 ,  B82Y40/00 ,  G02B6/3612 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/2482 ,  Y10T156/1002

摘要： A method of forming an optical fiber array. The method comprises providing a substrate having a first surface and an opposing second surface. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. Additionally, a plurality of fibers is provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. For each fiber, from the first surface side of the substrate, the fiber is inserted in a corresponding aperture such that the fiber end is positioned in close proximity of the second surface. Then the fiber is bent in a predetermined direction such that the fiber abuts a side wall of the aperture at a predetermined position. Finally, the bent fibers are bonded together using an adhesive material.

公开(公告)号：US20120145931A1

公开(公告)日：2012-06-14

申请号：US13281558

申请日：2011-10-26

申请人： Ralph VAN MELLE ,  Teunis VAN DE PEUT ,  Henk DERKS

发明人： Ralph VAN MELLE ,  Teunis VAN DE PEUT ,  Henk DERKS

IPC分类号： H01J3/26 ,  B32B37/12 ,  B01J19/08

CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

摘要： The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, a beamlet blanker array for patterning the beamlets in accordance with a pattern, and a projection system for projecting the patterned beamlets onto the target surface. The blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data. The blanker array is coupled to a fiber fixation substrate which accommodates end sections of a plurality of fibers for providing pattern data carrying light beams as an assembled group with a fixed connection.

摘要翻译： 本发明涉及一种用于将图案转印到目标表面上的带电粒子多子束光刻系统。 该系统包括用于产生多个带电粒子子束的束发生器，用于根据图案对子束进行图案化的子束遮断器阵列，以及用于将图案化的子束投影到目标表面上的投影系统。 遮光器阵列包括多个调制器和多个光敏元件。 光敏元件布置成接收携带光束的图案数据并将光束转换成电信号。 光敏元件电连接到一个或多个调制器以提供接收到的图案数据。 遮光器阵列耦合到光纤固定基板，该光纤固定基板容纳多个光纤的端部，用于提供携带光束的图案数据作为具有固定连接的组合组。

公开(公告)号：US09287081B2

公开(公告)日：2016-03-15

申请号：US13281558

申请日：2011-10-26

申请人： Ralph Van Melle ,  Teunis Van De Peut ,  Henk Derks

发明人： Ralph Van Melle ,  Teunis Van De Peut ,  Henk Derks

IPC分类号： H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/317

CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

摘要： The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, a beamlet blanker array for patterning the beamlets in accordance with a pattern, and a projection system for projecting the patterned beamlets onto the target surface. The blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data. The blanker array is coupled to a fiber fixation substrate which accommodates end sections of a plurality of fibers for providing pattern data carrying light beams as an assembled group with a fixed connection.

摘要翻译： 本发明涉及一种用于将图案转印到目标表面上的带电粒子多子束光刻系统。 该系统包括用于产生多个带电粒子子束的束发生器，用于根据图案对子束进行图案化的子束遮断器阵列，以及用于将图案化的子束投影到目标表面上的投影系统。 遮光器阵列包括多个调制器和多个光敏元件。 光敏元件布置成接收携带光束的图案数据并将光束转换成电信号。 光敏元件电连接到一个或多个调制器以提供接收到的图案数据。 遮光器阵列耦合到光纤固定基板，该光纤固定基板容纳多个光纤的端部，用于提供携带光束的图案数据作为具有固定连接的组合组。

公开(公告)号：US09036962B2

公开(公告)日：2015-05-19

申请号：US13452558

申请日：2012-04-20

申请人： Guido De Boer ,  Ralph Van Melle ,  Teunis Van De Peut ,  Henk Derks ,  Frederik Matthias Spiegelhalder ,  Roy Josephus Stephanus Derks ,  Edwin Johannes Theodorus Smulders

发明人： Guido De Boer ,  Ralph Van Melle ,  Teunis Van De Peut ,  Henk Derks ,  Frederik Matthias Spiegelhalder ,  Roy Josephus Stephanus Derks ,  Edwin Johannes Theodorus Smulders

IPC分类号： G02B6/42 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  G02B6/36

CPC分类号： B32B37/142 ,  B32B37/1284 ,  B32B37/1292 ,  B32B38/0012 ,  B32B2551/00 ,  B82Y10/00 ,  B82Y40/00 ,  G02B6/3612 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/2482 ,  Y10T156/1002

摘要： A method of forming an optical fiber array. The method comprises providing a substrate having a first surface and an opposing second surface. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. Additionally, a plurality of fibers is provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. For each fiber, from the first surface side of the substrate, the fiber is inserted in a corresponding aperture such that the fiber end is positioned in close proximity of the second surface. Then the fiber is bent in a predetermined direction such that the fiber abuts a side wall of the aperture at a predetermined position. Finally, the bent fibers are bonded together using an adhesive material.

摘要翻译： 一种形成光纤阵列的方法。 该方法包括提供具有第一表面和相对的第二表面的基底。 衬底设置有从第一表面延伸穿过衬底到第二表面的多个孔。 另外，提供多根纤维。 纤维具有直径小于孔的最小直径的纤维端。 对于每个光纤，从基板的第一表面侧，将纤维插入到相应的孔中，使得光纤端位于紧邻第二表面的位置。 然后纤维沿预定方向弯曲，使得纤维在预定位置处邻接孔的侧壁。 最后，使用粘合剂材料将弯曲的纤维粘合在一起。

公开(公告)号：US08921758B2

公开(公告)日：2014-12-30

申请号：US13281559

申请日：2011-10-26

申请人： Marco Jan-Jaco Wieland ,  Teunis Van De Peut ,  Alexander Hendrik Vincent Van Veen ,  Remco Jager ,  Stijn Willem Herman Karel Steenbrink ,  Ralph Van Melle ,  Henk Derks

发明人： Marco Jan-Jaco Wieland ,  Teunis Van De Peut ,  Alexander Hendrik Vincent Van Veen ,  Remco Jager ,  Stijn Willem Herman Karel Steenbrink ,  Ralph Van Melle ,  Henk Derks

IPC分类号： H01J3/14 ,  H01J5/16 ,  H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/317

CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

摘要： The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.

摘要翻译： 本发明涉及带电粒子多子束光刻系统。 该系统包括用于产生多个子束的光束发生器，用于对多个子束进行图案化的子束遮蔽器阵列，光纤布置和投影系统。 子束消除器阵列包括设置有包括一个或多个调制器的第一区域和不含调制器的第二区域的衬底。 子束消隐器阵列包括电连接到一个或多个调制器的一个或多个光敏元件，并被布置成接收携带图案数据的光束。 光纤布置包括多个光纤，用于将携带图案数据的光束引向一个或多个光敏元件。 光束布置在垂直于表面的方向上投射到子束消除器阵列的表面上完全落在第二区域内。