Dielectric coatings and use in capacitors
    2.
    发明授权
    Dielectric coatings and use in capacitors 有权
    电介质涂层和用于电容器

    公开(公告)号:US08030219B1

    公开(公告)日:2011-10-04

    申请号:US11348751

    申请日:2006-02-07

    IPC分类号: H01L21/31 H01L21/469

    摘要: A coated substrate product is described comprising a substrate and a dielectric coating material comprising carbon, hydrogen, silicon, and oxygen. According to the method, the substrate is processed by plasma cleaning the surface and then depositing a dielectric coating by a suitable plasma process. The coating may contain one or more layers. The substrate may be a rigid material or a thin film or foil. The coated products of this invention have superior dielectric material properties and utility as substrates for the manufacture of rolled or parallel plate capacitors with high energy densities.

    摘要翻译: 描述了涂覆的基底产品,其包括基底和包含碳,氢,硅和氧的电介质涂层材料。 根据该方法,通过等离子体清洁表面,然后通过合适的等离子体工艺沉积介电涂层来处理衬底。 涂层可以包含一层或多层。 衬底可以是刚性材料或薄膜或箔。 本发明的涂覆产品具有优良的介电材料性能和用作制造具有高能量密度的轧制或平行板式电容器的基板。