Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths
    1.
    发明授权
    Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths 有权
    具有反射目标的光学成像系统; 宽带客观镜面; 以及具有两个或更多个成像路径的折射透镜和宽带光学成像系统

    公开(公告)号:US09052494B2

    公开(公告)日:2015-06-09

    申请号:US12750488

    申请日:2010-03-30

    摘要: An optical system may include an objective having at least four mirrors including an outermost mirror with aspect ratio 0.7, central obscuration 0.7 and field of view >0.8 mm. An optical imaging system may comprise an objective and two or more imaging paths. The imaging paths may provide two or more simultaneous broadband images of a sample in two or more modes. The modes may have different illumination and/or collection pupil apertures or different pixel sizes at the sample.

    摘要翻译: 光学系统可以包括具有至少四个反射镜的物镜,其包括具有纵横比<20:1的最外镜和包括折射光学元件的聚焦光学元件。 该目标提供数值孔径> 0.7,瞳孔中心遮蔽<35%的成像。 物镜可以具有两个或更多个反射镜,一个具有折射模块的反射镜,该折射模块密封最外镜的中心开口。 宽带成像系统可以包括一个物镜和两个或更多个在数值孔径> 0.7和视场> 0.8mm处提供成像的成像路径。 光学成像系统可以包括物镜和两个或更多个成像路径。 成像路径可以以两种或更多种模式提供样本的两个或更多个同时宽带图像。 这些模式可以在样品处具有不同的照明和/或收集光瞳孔径或不同的像素尺寸。

    Reflective projection lens for EUV-photolithography
    2.
    发明申请
    Reflective projection lens for EUV-photolithography 有权
    EUV光刻用反射投影透镜

    公开(公告)号:US20070171558A1

    公开(公告)日:2007-07-26

    申请号:US11723831

    申请日:2007-03-22

    IPC分类号: G02B5/08

    摘要: A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.

    摘要翻译: 用于使用来自极紫外(EUV)光谱区域的电磁辐射将布置在物平面中的物体图案成像到图像平面的投影透镜在其物平面和图像平面之间具有限定投影透镜的光轴的成像反射镜,并且 有反光涂层。 这些反射镜中的至少一个具有梯度反射涂层,其具有相对于涂覆轴线旋转对称的膜厚度梯度,其中该涂覆轴相对于投影透镜的光轴被倾斜地布置。 提供至少一个中心,渐变,反射涂层允许设计投影透镜,允许高度均匀的场照度,并结合高透光率。