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    Etching liquid for film of multilayer structure containing copper layer and molybdenum layer
    1.
    发明授权
    Etching liquid for film of multilayer structure containing copper layer and molybdenum layer 有权
    含有铜层和钼层的多层结构膜蚀刻液

    公开(公告)号：US09580818B2

    公开(公告)日：2017-02-28

    申请号：US13805118

    申请日：2011-05-27

    Applicant: Satoshi Tamai ,  Satoshi Okabe ,  Masahide Matsubara ,  Kunio Yube

    Inventor： Satoshi Tamai ,  Satoshi Okabe ,  Masahide Matsubara ,  Kunio Yube

    IPC: C23F1/10 ,  C23F1/14 ,  C23F1/18 ,  C23F1/26 ,  C23F1/34 ,  C23F1/38 ,  H01L21/3213

    CPC classification number: C23F1/10 ,  C23F1/14 ,  C23F1/18 ,  C23F1/26 ,  C23F1/34 ,  C23F1/38 ,  H01L21/32134

    Abstract: The present invention relates to an etching solution for a multilayer thin film containing a copper layer and a molybdenum layer, and a method of etching a multilayer thin film containing a copper layer and a molybdenum layer using the etching solution. There are provided an etching solution for a multilayer thin film containing a copper layer and a molybdenum layer, including (A) an organic acid ion supply source containing two or more carboxyl groups and one or more hydroxyl groups in a molecule thereof, (B) a copper ion supply source and (C) an ammonia and/or ammonium ion supply source, the etching solution having a pH value of from 5 to 8, and an etching method using the etching solution.

    Abstract translation: 本发明涉及一种用于含有铜层和钼层的多层薄膜的蚀刻溶液，以及使用该蚀刻溶液蚀刻含有铜层和钼层的多层薄膜的方法。 提供了含有铜层和钼层的多层薄膜的蚀刻溶液，包括（A）分子中含有两个以上羧基和一个以上羟基的有机酸离子供给源，（B） 铜离子供应源和（C）氨和/或铵离子供应源，所述蚀刻溶液具有5至8的pH值，以及使用蚀刻溶液的蚀刻方法。

    ETCHING LIQUID FOR FILM OF MULTILAYER STRUCTURE CONTAINING COPPER LAYER AND MOLYBDENUM LAYER
    2.
    发明申请
    ETCHING LIQUID FOR FILM OF MULTILAYER STRUCTURE CONTAINING COPPER LAYER AND MOLYBDENUM LAYER 有权
    用于包含铜层和钼层的多层结构膜的蚀刻液

    公开(公告)号：US20130105729A1

    公开(公告)日：2013-05-02

    申请号：US13805118

    申请日：2011-05-27

    Applicant: Satoshi Tamai ,  Satoshi Okabe ,  Masahide Matsubara ,  Kunio Yube

    Inventor： Satoshi Tamai ,  Satoshi Okabe ,  Masahide Matsubara ,  Kunio Yube

    IPC: C23F1/10

    CPC classification number: C23F1/10 ,  C23F1/14 ,  C23F1/18 ,  C23F1/26 ,  C23F1/34 ,  C23F1/38 ,  H01L21/32134

    Abstract: The present invention relates to an etching solution for a multilayer thin film containing a copper layer and a molybdenum layer, and a method of etching a multilayer thin film containing a copper layer and a molybdenum layer using the etching solution. There are provided an etching solution for a multilayer thin film containing a copper layer and a molybdenum layer, including (A) an organic acid ion supply source containing two or more carboxyl groups and one or more hydroxyl groups in a molecule thereof, (B) a copper ion supply source and (C) an ammonia and/or ammonium ion supply source, the etching solution having a pH value of from 5 to 8, and an etching method using the etching solution.

    Abstract translation: 本发明涉及一种用于含有铜层和钼层的多层薄膜的蚀刻溶液，以及使用该蚀刻溶液蚀刻含有铜层和钼层的多层薄膜的方法。 提供了含有铜层和钼层的多层薄膜的蚀刻溶液，包括（A）分子中含有两个以上羧基和一个以上羟基的有机酸离子供给源，（B） 铜离子供应源和（C）氨和/或铵离子供应源，所述蚀刻溶液具有5至8的pH值，以及使用蚀刻溶液的蚀刻方法。

    Thiol compounds
    3.
    发明授权
    Thiol compounds 失效
    硫醇化合物

    公开(公告)号：US5659043A

    公开(公告)日：1997-08-19

    申请号：US570888

    申请日：1995-12-12

    Applicant: Kazuhiko Hayashi ,  Chisato Sato ,  Satoshi Tamai

    Inventor： Kazuhiko Hayashi ,  Chisato Sato ,  Satoshi Tamai

    IPC: C07D417/04 ,  C07D417/12 ,  C07D477/20

    CPC classification number: C07D477/20 ,  C07D417/04 ,  C07D417/12

    Abstract: This invention relates to 3-mercapto-1-(1,3-thiazolin-2-yl)azetidine represented by the following formula and its acid addition salts ##STR1## and to the production process therefor. The above compounds are useful as intermediates for preparing carbapenem compounds, which have strong antibacterial activity, with convenience and high yield.

    Abstract translation: 本发明涉及由下式表示的3-巯基-1-（1,3-噻唑啉-2-基）氮杂环丁烷及其酸加成盐及其制备方法。 上述化合物可用作制备碳青霉烯类化合物的中间体，其具有强的抗菌活性，方便性和高产率。

    2-[1-(1,3-thiazolin-2-yl)azetidin-3-yl]thio-carbapenem derivatives
    4.
    发明授权
    2-[1-(1,3-thiazolin-2-yl)azetidin-3-yl]thio-carbapenem derivatives 失效
    2- [1-（1,3-噻唑啉-2-基）氮杂环丁烷-3-基]硫代碳代青霉烯衍生物

    公开(公告)号：US5534510A

    公开(公告)日：1996-07-09

    申请号：US267397

    申请日：1994-06-29

    Applicant: Takao Abe ,  Takeshi Isoda ,  Chisato Sato ,  Ado Mihira ,  Satoshi Tamai ,  Toshio Kumagai

    Inventor： Takao Abe ,  Takeshi Isoda ,  Chisato Sato ,  Ado Mihira ,  Satoshi Tamai ,  Toshio Kumagai

    IPC: C07D477/00 ,  A61K31/397 ,  A61K31/425 ,  A61P31/04 ,  C07D417/04 ,  C07D477/20 ,  C07D487/04 ,  A61K31/40

    CPC classification number: C07D477/20 ,  C07D417/04

    Abstract: Novel carbapenem compounds, (1R,5S,6S)-2-[1-(1,3-thiazolin-2-yl)azetidin-3-yl]thio-6-[(R)-1-hydroxyethyl]-1-methyl-carbapen-2-em-3 -carboxyic acid derivatives.These carbapenem compounds are represented by the following formula having a beta-coordinated methyl group introduced at the 1-position and a [1-(1,3-thiazolin-2-yl)azetidin-3-yl]thio group introduced at the 2-position. ##STR1## In the formula, R is hydrogen; lower alkyl group which is unsubstituted or substituted by hydroxy, lower alkoxy or lower alkoxy-lower alkoxy group; group --COOR.sup.1 (R.sup.1 is hydrogen or lower alkyl group); or group --CONR.sup.2 R.sup.3 (R.sup.2 and R.sup.3 are, independently each other, hydrogen or lower alkyl), andY is carboxy, --COO.sup..crclbar. or protected carboxy.These compounds are useful antibiotics for prevention and treatment of bacterial infections.

    Abstract translation: 新的碳青霉烯化合物（1R，5S，6S）-2- [1-（1,3-噻唑烷-2-基）氮杂环丁烷-3-基]硫基-6 - [（R）-1-羟乙基] -1- 甲基 - 碳代青霉-2-烯-3-羧酸衍生物。 这些碳青霉烯化合物由在1位引入的β-配位甲基和在2位引入的[1-（1,3-噻唑啉-2-基）氮杂环丁烷-3-基]硫基的下式表示 -位置。 在该式中，R是氢; 低级烷基，未取代或被羟基，低级烷氧基或低级烷氧基 - 低级烷氧基取代; 基团-COOR1（R1是氢或低级烷基）; 或基团-CONR 2 R 3（R 2和R 3彼此独立地为氢或低级烷基），Y为羧基，-COO（ - ）或被保护的羧基。 这些化合物是预防和治疗细菌感染的有用的抗生素。

    Recording medium stacker and recording apparatus with stored second stack member
    7.
    发明授权
    Recording medium stacker and recording apparatus with stored second stack member 有权
    具有存储的第二堆叠构件的记录介质堆垛机和记录装置

    公开(公告)号：US08448942B2

    公开(公告)日：2013-05-28

    申请号：US13102126

    申请日：2011-05-06

    Applicant: Aya Otani ,  Shinichiro Yoshikawa ,  Satoshi Tamai

    Inventor： Aya Otani ,  Shinichiro Yoshikawa ,  Satoshi Tamai

    IPC: B65H31/20

    CPC classification number: B65H31/20 ,  B65H31/02 ,  B65H2405/1111 ,  B65H2405/11164 ,  B65H2405/111646 ,  B65H2405/324 ,  B65H2801/12 ,  G03G15/6552

    Abstract: A second stacker is provided with base-end projection portions and leading-end projection portions that protrude outward in the width direction from the second stacker from both sides of the second stacker at the base end of the second stacker in the pull-out direction thereof. A first stacker is provided with guide rails on which the stated projection portions slide when the second stacker is pulled out; contact portions that do not make contact with and allow the leading-end projection portions to pass when the second stacker is pulled out but prevent the base-end projection portions from passing; and a support portion that supports the leading-end projection portions when the base-end projection portions are in contact with the contact portions.

    Abstract translation: 第二堆垛机设置有从第二堆垛机的两侧在第二堆垛机的两端沿第二堆垛机的宽度方向向外突出的第二堆垛机的基端突出部和前端突出部 。 第一堆垛机设置有导轨，当第二堆垛机被拉出时，所述突出部分滑动到所述导轨上; 当第二堆垛机被拉出但防止基端突起部分通过时，不接触并允许前端突出部分通过的接触部分; 以及支撑部，其在所述基端突起部与所述接触部接触时支撑所述前端突起部。

    Sulfur-containing compounds method for their use and prodction
    10.
    发明授权
    Sulfur-containing compounds method for their use and prodction 失效
    含硫化合物的使用和生产方法

    公开(公告)号：US5783703A

    公开(公告)日：1998-07-21

    申请号：US795428

    申请日：1997-02-05

    Applicant: Kazuhiko Hayashi ,  Chisato Sato ,  Satoshi Tamai ,  Takao Abe ,  Takeshi Isoda ,  Ado Mihira ,  Toshio Kumagai

    Inventor： Kazuhiko Hayashi ,  Chisato Sato ,  Satoshi Tamai ,  Takao Abe ,  Takeshi Isoda ,  Ado Mihira ,  Toshio Kumagai

    IPC: C07D417/04

    CPC classification number: C07D417/04

    Abstract: A first embodiment of the invention relates to novel carbapenem compounds, (1R, 5S, 6S)-2-�1-(1,3-thiazolin-2-yl)azetidin-3-yl!thio-6-�(R)-1-hydroxy-ethyl!-1-methylcarbapen-2-em-3-carboxyic acid derivatives. These carbapenem compounds are represented by the following formula having a beta-coordinated methyl group introduced at the 1-position and a �1-(1,3-thia-zolin-2-yl)azetidin-3-yl!thio group introduced at the 2-position. ##STR1## In the formula, R is hydrogen; lower alkyl group which is unsubstituted or substituted by hydroxy, lower alkoxy or lower alkoxy-lower alkoxy group; group --COOR.sup.1 (R.sup.1 is hydrogen or lower alkyl group); or group --CONR.sup.2 R.sup.3 (R.sup.2 and R.sup.3 are, independently each other, hydrogen or lower alkyl), and Y is carboxy, --COO.sup..crclbar. or protected carboxy. These compounds are useful antibiotics for prevention and treatment of bacterial infections. The second embodiment of the invention relates to 3-mercapto-1-(1,3-thiazolin-2-yl)azetidine represented by the following formula and its acid addition salts ##STR2## and to the production process therefor. The above compounds are useful as intermediates for preparing carbapenem compounds, which have strong antibacterial activity, with convenience and high yield.

    Abstract translation: 本发明的第一个实施方案涉及新的碳青霉烯化合物，（1R，5S，6S）-2- [1-（1,3-噻唑烷-2-基）氮杂环丁烷-3-基]硫基-6 - [（R） -1-羟基 - 乙基] -1-甲基碳代青霉-2-烯-3-羧酸衍生物。 这些碳青霉烯类化合物由下式表示：在1-位引入的β-配位甲基和[1-（1,3-硫杂 - 唑啉-2-基）氮杂环丁烷-3-基]硫基引入到 2位。 在该式中，R是氢; 低级烷基，未取代或被羟基，低级烷氧基或低级烷氧基 - 低级烷氧基取代; 基团-COOR1（R1是氢或低级烷基）; 或基团-CONR 2 R 3（R 2和R 3彼此独立地为氢或低级烷基），Y为羧基，-COO（ - ）或被保护的羧基。 这些化合物是预防和治疗细菌感染的有用的抗生素。 本发明的第二个实施方案涉及由下式表示的3-巯基-1-（1,3-噻唑啉-2-基）氮杂环丁烷及其酸加成盐及其制备方法。 上述化合物可用作制备碳青霉烯类化合物的中间体，其具有强的抗菌活性，方便性和高产率。

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