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    Dispense system of a photoresist coating machine
    3.
    发明授权
    Dispense system of a photoresist coating machine 失效
    光刻胶涂布机分配系统

    公开(公告)号：US6012607A

    公开(公告)日：2000-01-11

    申请号：US185436

    申请日：1998-11-03

    申请人： Hsien-Jung Hsu ,  Shih-Hsun Chiu ,  Hung-Lung Ma ,  Cha-Ming Kuo

    发明人： Hsien-Jung Hsu ,  Shih-Hsun Chiu ,  Hung-Lung Ma ,  Cha-Ming Kuo

    IPC分类号： B05C11/08 ,  B05C11/10 ,  H01L21/00 ,  B67D5/08

    CPC分类号： H01L21/6715 ,  B05C11/1002 ,  B05C11/08

    摘要： A photoresist dispensing system used in a photoresist coating machine includes a pump, a switch valve, a sucking-back valve, a solenoid valve, a first set of speed controllers a second set of speed controllers and a sucking-back speed controller. The pump is used to transport liquid photoresist to a wafer through the switch valve. The sucking-back valve is controlled by solenoid valve through the sucking-back speed controller to produce or release a sucking force on the liquid photoresist to prevent it from undesired dropping onto the wafer. The solenoid valve also controls the switch valve and the pump to start or stop photoresist dispensing. The first set of speed controllers is coupled between the switch valve and the solenoid valve and the second set of speed controller is coupled between the pump and the solenoid valve. The sucking-back speed controller is coupled between the sucking-back valve and the route, which is between the first set of speed controller and the switch valve so that the sucking-back valve has a sufficient delay time to effectively suck the liquid photoresist in a proper time order of operation.

    摘要翻译： 在光致抗蚀剂涂布机中使用的光刻胶分配系统包括泵，开关阀，回吸阀，电磁阀，第一组速度控制器，第二组速度控制器和吸回速度控制器。 该泵用于通过开关阀将液体光致抗蚀剂输送到晶片。 吸回阀由电磁阀通过吸回速度控制器控制，以产生或释放液体光致抗蚀剂上的吸力，以防止其不希望掉落到晶片上。 电磁阀还控制开关阀和泵启动或停止光刻胶分配。 第一组速度控制器耦合在开关阀和电磁阀之间，第二组速度控制器耦合在泵和电磁阀之间。 回吸速度控制器连接在第一组速度控制器和开关阀之间的回吸阀和路线之间，使得吸回阀具有足够的延迟时间以有效地吸入液态光致抗蚀剂 适当的时间顺序。