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    Liquid jet recording head and recording system incorporating the same
    2.
    发明授权
    Liquid jet recording head and recording system incorporating the same 失效
    液体喷射记录头和包含其的记录系统

    公开(公告)号：US4847639A

    公开(公告)日：1989-07-11

    申请号：US242283

    申请日：1988-09-09

    申请人： Masao Sugata ,  Tatsuo Masaki, deceased ,  Shinichi Hirasawa ,  Hirokazu Komuro ,  Yasuhiro Yano

    发明人： Masao Sugata ,  Tatsuo Masaki, deceased ,  Shinichi Hirasawa ,  Hirokazu Komuro ,  Yasuhiro Yano

    IPC分类号： B41J2/14

    CPC分类号： B41J2/14129 ,  B41J2202/03 ,  Y10T428/30

    摘要： A liquid jet recording head such as an ink jet recording head has liquid passages having liquid outlets through which a recording liquid is discharged in the form of jet of droplet, and electro-thermal transducers for generating heat which produce energy for discharging the liquid in response to inputted electric signals. The electro-thermal transducer has a heat-generating resistance layer which is made of an amorphous material containing halogen atoms and hydrogen atoms in a matrix of carbon atoms. Disclosed also is a recording system incorporating this recording head. The amorphous material can further contain silicon atoms and/or germanium atoms.

    摘要翻译： 诸如喷墨记录头的液体喷射记录头具有液体通道，液体通道具有液体出口，以液滴的形式喷射记录液体;以及电热换能器，用于产生用于响应地产生排出液体的能量的热量 输入电信号。 电热换能器具有由在碳原子基体中含有卤素原子和氢原子的无定形材料制成的发热电阻层。 还公开了一种结合该记录头的记录系统。 无定形材料可以进一步含有硅原子和/或锗原子。

    Method of fabricating semiconductor device
    4.
    发明授权
    Method of fabricating semiconductor device 有权

    公开(公告)号：US07994039B2

    公开(公告)日：2011-08-09

    申请号：US12399140

    申请日：2009-03-06

    申请人： Shinichi Hirasawa ,  Shinya Watanabe

    发明人： Shinichi Hirasawa ,  Shinya Watanabe

    IPC分类号： H01L21/28

    CPC分类号： H01L21/28273 ,  H01L27/11521 ,  H01L29/7881

    摘要： A method of fabricating a semiconductor device according to one embodiment includes: forming a plurality of Si-based pattern portions above a semiconductor substrate, the plurality of Si-based pattern portions being adjacent in a direction substantially parallel to a surface of the semiconductor substrate via insulating films; forming a metal film above the plurality of Si-based pattern portions and the insulating films so as to contact with the plurality of Si-based pattern portions; processing whole areas or upper portions of the plurality of Si-based pattern portions into a plurality of silicide layers by a silicidation reaction between the plurality of Si-based pattern portions and the metal film by heat treatment; and removing the plurality of silicide layers formed above the insulating films by applying planarizing treatment to the plurality of silicide layers.

    Ink-jet recording apparatus and recovery process method of the same
    5.
    发明授权
    Ink-jet recording apparatus and recovery process method of the same 失效
    喷墨记录装置及其回收处理方法相同

    公开(公告)号：US06196655B1

    公开(公告)日：2001-03-06

    申请号：US08123269

    申请日：1993-09-20

    申请人： Shinichi Hirasawa ,  Koichi Sato ,  Koji Terasawa ,  Akira Miyakawa ,  Tsutomu Abe ,  Yoshifumi Hattori

    发明人： Shinichi Hirasawa ,  Koichi Sato ,  Koji Terasawa ,  Akira Miyakawa ,  Tsutomu Abe ,  Yoshifumi Hattori

    IPC分类号： B41J2165

    CPC分类号： B41J2/16552 ,  B41J2/16523 ,  B41J2/19

    摘要： There is disclosed a method and apparatus for recovering an ink jet head having an opening communicating with a discharge port, the opening being provided on a same planar surface on which the discharge port for discharging ink is provided. An area of the opening is larger than an area of the discharge port. The method includes the steps of forcibly introducing gas into the ink jet head simultaneously through the discharge port and the opening, and exhausting the gas introduced into the ink jet head in the introducing step with ink through the discharge port. The gas introduced into the ink jet head enables the ink to be exhausted at an increased velocity in the exhausting step.

    摘要翻译： 公开了一种用于回收具有与排出口连通的开口的喷墨头的方法和装置，该开口设置在设置有用于排出墨的排出口的同一平面上。 开口的面积大于排出口的面积。 该方法包括通过排出口和开口同时强制地将气体引入喷墨头的步骤，并且在引入步骤中通过排出口将墨水引入到喷墨头中的气体排出。 引入喷墨头的气体使得能够在排气步骤中以增加的速度排出油墨。

    Color recording apparatus and method
    6.
    发明授权
    Color recording apparatus and method 失效
    彩色记录装置及方法

    公开(公告)号：US6022096A

    公开(公告)日：2000-02-08

    申请号：US454814

    申请日：1995-05-31

    申请人： Shinichi Hirasawa ,  Kenichirou Hashimoto ,  Kunihiko Maeoka

    发明人： Shinichi Hirasawa ,  Kenichirou Hashimoto ,  Kunihiko Maeoka

    IPC分类号： B41J2/05 ,  B41J2/13 ,  B41J2/21 ,  B41J29/38

    CPC分类号： B41J2/2132

    摘要： An ink jet recording method wherein ink is ejected onto a recording material, includes providing an ink jet head having a predetermined number of first ejection outlets for ejecting black ink and a smaller number of second ejection outlets for ejecting ink different from the black ink; effecting recording operation, while scanningly moving the ink jet head in a direction different from a direction in which the recording material is fed, using m second ejection outlets, m+k or m-k first ejection outlets; feeding the recording material through mxp, where p is an interval at which the ejection outlets are arranged; shifting a range of use of the first ejection outlets in a direction of feeding of the recording material; and repeating said recording, feeding and shifting steps.

    摘要翻译： 一种喷墨记录方法，其中将油墨喷射到记录材料上，包括提供具有预定数量的用于喷射黑色油墨的第一喷射出口的喷墨头和用于喷射不同于黑色油墨的油墨的较少数量的第二喷射出口; 在使用m个第二喷射口，m + k或m-k个第一喷射口的同时，使喷墨头沿与记录材料供给方向不同的方向扫描地进行记录操作; 通过mxp馈送记录材料，其中p是喷射出口布置的间隔; 在记录材料的馈送方向上移动第一喷射口的使用范围; 并重复所述记录，进给和转换步骤。

    Liquid jet recording method and apparatus having electro-thermal transducer connected to a higher power source potential side through a switch
    7.
    发明授权
    Liquid jet recording method and apparatus having electro-thermal transducer connected to a higher power source potential side through a switch 失效
    具有通过开关连接到较高电源电位侧的电热转换器的液体喷射记录方法和装置

    公开(公告)号：US5150129A

    公开(公告)日：1992-09-22

    申请号：US525315

    申请日：1990-05-21

    申请人： Toshitami Hara ,  Hisanori Tsuda ,  Shinichi Hirasawa

    发明人： Toshitami Hara ,  Hisanori Tsuda ,  Shinichi Hirasawa

    IPC分类号： B41J2/05

    CPC分类号： B41J2/04541 ,  B41J2/0458

    摘要： An apparatus for liquid-jet recording comprises an electro-thermal transducer and discharge openings for jetting a liquid by thermal action of the electrothermal transducer. The electro-thermal transducer is connected directly to a lower potential side of a power source and is connected to a higher potential side of the power source through a switch element. Thermal action of the thermal transducer occurs upon the application of a positive voltage of a high potential from the power source through the switch element.

    摘要翻译： 一种用于液体喷射记录的装置包括电热换能器和用于通过电热换能器的热作用喷射液体的排出口。 电热换能器直接连接到电源的较低电位侧，并且通过开关元件连接到电源的较高电位侧。 在从电源通过开关元件施加高电位的正电压时，发生热转换器的热作用。

    METHOD OF FABRICATING SEMICONDUCTOR DEVICE
    10.
    发明申请
    METHOD OF FABRICATING SEMICONDUCTOR DEVICE 有权
    制造半导体器件的方法

    公开(公告)号：US20090280583A1

    公开(公告)日：2009-11-12

    申请号：US12399140

    申请日：2009-03-06

    申请人： Shinichi HIRASAWA ,  Shinya Watanabe

    发明人： Shinichi HIRASAWA ,  Shinya Watanabe

    IPC分类号： H01L21/3205 ,  H01L21/66

    CPC分类号： H01L21/28273 ,  H01L27/11521 ,  H01L29/7881

    摘要： A method of fabricating a semiconductor device according to one embodiment includes: forming a plurality of Si-based pattern portions above a semiconductor substrate, the plurality of Si-based pattern portions being adjacent in a direction substantially parallel to a surface of the semiconductor substrate via insulating films; forming a metal film above the plurality of Si-based pattern portions and the insulating films so as to contact with the plurality of Si-based pattern portions; processing whole areas or upper portions of the plurality of Si-based pattern portions into a plurality of silicide layers by a silicidation reaction between the plurality of Si-based pattern portions and the metal film by heat treatment; and removing the plurality of silicide layers formed above the insulating films by applying planarizing treatment to the plurality of silicide layers.

    摘要翻译： 根据一个实施例的制造半导体器件的方法包括：在半导体衬底之上形成多个Si基图案部分，所述多个Si基图案部分在基本上平行于半导体衬底的表面的方向上相邻的方向 绝缘膜; 在所述多个Si基图案部分和所述绝缘膜之上形成金属膜以与所述多个Si基图案部分接触; 通过多个Si基图案部分和金属膜之间的硅化反应将多个Si基图案部分的整个区域或上部处理成多个硅化物层; 以及通过对所述多个硅化物层进行平坦化处理来去除在所述绝缘膜上形成的所述多个硅化物层。