摘要:
A liquid jet recording head such as an ink jet recording head has liquid passages having liquid outlets through which a recording liquid is discharged in the form of jet of droplet, and electro-thermal transducers for generating heat which produce energy for discharging the liquid in response to inputted electric signals. The electro-thermal transducer has a heat-generating resistance layer which is made of an amorphous material containing halogen atoms and hydrogen atoms in a matrix of carbon atoms. Disclosed also is a recording system incorporating this recording head. The amorphous material can further contain silicon atoms and/or germanium atoms.
摘要:
A thermal recording head comprises at least one set of a heat-generating resistance layer and at least one pair of electrodes connected electrically to said heat-generating resistance layer formed on a substrate, wherein said heat-generating resistance layer comprises an amorphous material containing halogen atoms and hydrogen atoms in a matrix of carbon atoms.
摘要:
A thermal recording head, which comprises at least one set of a heating resistor layer and at least one pair of electrodes electrically connected to the heating resistor layer, formed on a substrate, the heating resistor layer being composed of amorphous material comprising carbon atoms as a matrix and hydrogen atoms.
摘要:
A thermal recording head comprises a heating resistor layer and at least a pair of electrodes electrically connected to said heating resistor layer, at least one combination of said heating resistor layer and said at least a pair of electrodes being formed on a substrate, wherein said heating resistor layer essentially consists of an amorphous material containing carbon atoms as a major constituent and halogen atoms.
摘要:
A heat generating resistor having a functional thin film comprising an amorphous material containing halogen atoms and hydrogen atoms non-uniformly distributed in a matrix of carbon atoms formed on a substrate. Optionally, the thin film also contains silicon and/or germanium, and a substance for controlling the electroconductivity of the thin film. The optional ingredients are also non-uniformly distributed within the thin film.
摘要:
A heat-generating resistor having a functional thin film comprising an amorphous material containing halogen atoms in a matrix of carbon atoms formed on a substrate.
摘要:
A heat-generating resistor, having a functional thin film comprising an amorphous material containing hydrogen atoms in a matrix of carbon atoms formed on a substrate.
摘要:
A planar heat generating resistor has a heat generating resistor layer formed on or above a support member and a pair of opposing electrodes formed on the heat generating resistor layer, such that a width of the heat generating layer at the electrode area is larger than a width of the electrodes and a voltage is applied across the electrodes, in which a ratio of a maximum value of a gradient of .phi., .sqroot.(.differential..phi./.differential.x).sup.2 +(.differential..phi./.differential.y).sup.2 to a value of .sqroot.(.differential..phi./.differential.x).sup.2 +(.differential..phi./.differential.y).sup.2 at a center of the resistor is no larger than 1.4 when a Laplace equation .differential..sup.2 /.differential.x.sup.2 +.differential..sup.2 .phi./.differential.y.sup.2 =0 is solved for the heat generating resistor when an orthogonal coordinate system X-Y is defined on the resistor surface, a potential at a point (x,y) on the resistor surface is represented by .phi.(x,y), a boundary value is imparted to an area of a circumferential boundary of the resistor which contacts to one of the electrodes, a different boundary value is imparted to an area which contacts to the other electrode, and a boundary condition in which a differential coefficient of .phi. to a normal direction of the circumferential boundary is zero is imparted to an area which does not contact to any of the electrodes.
摘要:
A chemical mechanical polishing aqueous dispersion is used to polish a polishing target that includes an interconnect layer that contains tungsten. The chemical mechanical polishing aqueous dispersion includes: (A) a cationic water-soluble polymer; (B) an iron (III) compound; and (C) colloidal silica particles. The content (MA) (mass %) of the cationic water-soluble polymer (A) and the content (MB) (mass %) of the iron (III) compound (B) satisfy the relationship “MA/MB=0.004 to 0.1”. The chemical mechanical polishing aqueous dispersion has a pH of 1 to 3.
摘要:
An apparatus for liquid-jet recording having heat-generating means and means for jetting a liquid utilizing an energy generated by the heat-generating means comprises an electrode provided in contact with the liquid in impart a potential to the liquid lower than the potential used to generate heat.