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公开(公告)号：US06774983B2
公开(公告)日：2004-08-10
申请号：US10217356
申请日：2002-08-12
IPC分类号： G03B2742
CPC分类号： G03F7/70216 , G03F7/70358 , G03F7/70475
摘要： Single-stage projection systems typically have a twice-folded optical path, with mask leg, crossover, 1:1 projection lens system, and substrate leg. They offer seamless patterning of large microlithographic substrates by overlapping complementary small-field scanning. A reverser maintains mask/substrate pattern congruence despite optical reversal, but presents the requirement of large working distance to permit access to the scanning stage. The required working distance demands large-diameter lens elements which are expensive in materials, grinding and assembly. A high-resolution 1:1 projection lens, for high-fluence laser light, adds extreme expense. Dividing the projection lens into two distributed-part-lenses, in mask and substrate legs, maintains satisfactory working distance, minimizes lens diameter requirements, and thus cuts cost. The aperture stop is positioned at the midpoint of the optical path, preferably at the time of manufacture, by an auxiliary stage. The aperture stop is physically asymmetrical because of the optical path length inherent in the reverser.
摘要翻译： 单级投影系统通常具有两倍折叠的光路，具有掩模腿，交叉，1：1投影透镜系统和基板支脚。 它们通过重叠互补小场扫描提供大型微光刻基板的无缝图案化。 尽管光学反转，反转器仍保持掩模/衬底图案一致性，但呈现大的工作距离的要求以允许进入扫描阶段。 所需的工作距离要求在材料，研磨和组装方面昂贵的大直径透镜元件。 高分辨率1：1投影镜头，为高激光激光，增加极大的费用。 将投影透镜分成两个分布式部件透镜，在掩模和基板支脚中，保持令人满意的工作距离，最小化透镜直径要求，从而降低成本。 孔径光阑位于光路的中点处，优选地在制造时由辅助台定位。 由于反向器固有的光程长度，孔径光阑在物理上是不对称的。
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公开(公告)号：US20090107966A1
公开(公告)日：2009-04-30
申请号：US11977879
申请日：2007-10-26
CPC分类号： B23K26/16 , B23K26/0622 , B23K26/1476 , B23K26/40 , B23K2101/40 , B23K2103/50
摘要： A turbulence-controlled vacuum debris removal subsystem safely exhausts particles ejected during photoablation. Nested interconnected chambers provide diminishing sweeping gas partial pressure and diminishing turbulence, ejecting particles from the ablation beam path between pulses, without compromising continuing particle conductance. Removal rate (debris generation rate) depends on conductance and particle sizes. The chambers interconnect through metering holes which enable optimization of partial pressure differentials. Controlled flow accomplishes debris removal, reducing turbulence of the mixture of debris and sweeping gases. A preferred embodiment uses a nest of concentric chambers, providing a clear light path. Another preferred embodiment uses orifices on chamber faces for removal and forming an envelope of gas around the processing region for dynamically containing the ejected particulate matter from the ablation site to the exhaust.
摘要翻译： 湍流控制的真空碎屑去除子系统可以安全地排除在光烧制期间喷射的颗粒。 嵌套互连室提供减少的清扫气体分压和减少湍流，在脉冲之间从消融光束路径喷射颗粒，而不损害持续的颗粒电导。 去除率（碎片产生率）取决于电导和粒度。 这些室通过计量孔相互连接，可以优化分压差。 受控流动完成碎屑清除，减少碎屑和扫气混合物的湍流。 一个优选实施例使用同心腔室，提供清晰的光路。 另一个优选实施例在腔室表面上使用孔口用于移除并在处理区域周围形成气体包络，用于动态地将从排出部位排出的颗粒物质包含到排气口中。
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公开(公告)号：US07158305B2
公开(公告)日：2007-01-02
申请号：US10879887
申请日：2004-06-29
CPC分类号： G03F7/70075 , G02B27/0927 , G02B27/0994
摘要： An optimized illumination system that efficiently produces uniform illumination for exposure, photoablation, and laser crystallization systems. The illumination system includes a homogenizer that uniformizes and shapes a light beam, which is directed onto a mask by condenser optics. The illumination system recycles radiation by directing light reflected by the mask back into the illumination system, where an apertured mirror situated at the input end re-directs it back toward the mask. The relative areas of the mirror and aperture affect recycling efficiency and system throughput, so the system features a larger-diameter recycling segment enabling greater mirror-to-aperture area ratios. An added segment at the output end of the homogenizer matches the homogenizer diameter to the projection imaging system object field size. This standardizes the homogenizer and condenser lens integration, reducing the need for customized parts and thus reducing manufacturing time and expense.
摘要翻译： 一种优化的照明系统，可有效地为曝光，光消融和激光结晶系统产生均匀的照明。 照明系统包括均匀化器，其使通过冷凝器光学器件引导到掩模上的光束均匀化并成形。 照明系统通过将由掩模反射的光引导回到照明系统中来回收辐射，其中位于输入端的多孔镜将其重新引向掩模。 镜面和孔径的相对面积影响回收效率和系统产量，因此该系统具有更大直径的回收部分，从而实现更大的镜面与孔径面积比。 在均化器的输出端附加的段将均匀器直径与投影成像系统对象场尺寸相匹配。 这使得均化器和聚光镜集成的标准化，减少了对定制零件的需求，从而缩短了制造时间和费用。
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公开(公告)号：US07106415B2
公开(公告)日：2006-09-12
申请号：US10731187
申请日：2003-12-09
摘要： A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.
摘要翻译： 安装在投影光路中的零功率相同的一对相反方向的弯月透镜元件用作弯曲的掩模支撑，同时补偿光学异常，例如由弯曲掩模的其他透明支撑产生的光束偏移和光束偏移。 零功率弯月透镜对，不影响透射光束特性，使得光束像普通的平面掩模一样有效地衍射，从而保持投影光刻的部分相干效应和分辨率概念。 这种简单但新颖的光学器件不仅预期能够清除弯曲掩模投影光刻的几个障碍，而且还可以发现在其中准直或会聚光束必须行进额外路径而没有显着像差的其他应用场合。
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公开(公告)号：US07670727B2
公开(公告)日：2010-03-02
申请号：US11512954
申请日：2006-08-30
摘要： A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.
摘要翻译： 安装在投影光路中的零功率相同的一对相反方向的弯月透镜元件用作弯曲的掩模支撑，同时补偿光学异常，例如由弯曲掩模的其他透明支撑产生的光束偏移和光束偏移。 零功率弯月透镜对，不影响透射光束特性，使得光束像普通的平面掩模一样有效地衍射，从而保持投影光刻的部分相干效应和分辨率概念。 这种简单但新颖的光学器件不仅预期能够清除弯曲掩模投影光刻的几个障碍，而且还可以发现在其中准直或会聚光束必须行进额外路径而没有显着像差的其他应用场合。
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