公开(公告)号：US20090165719A1

公开(公告)日：2009-07-02

申请号：US11965521

申请日：2007-12-27

申请人： Lance G. Hellwig ,  Srikanth Kommu ,  John A. Pitney

发明人： Lance G. Hellwig ,  Srikanth Kommu ,  John A. Pitney

IPC分类号： C23C16/02

CPC分类号： C30B25/12 ,  C23C16/4588

摘要： A barrel susceptor for supporting semiconductor wafers in a heated chamber having an interior space. Each of the wafers has a front surface, a back surface and a circumferential side. The susceptor includes a body having a plurality of faces arranged around an imaginary central axis of the body. Each face has an outer surface and a recess extending laterally inward into the body from the outer surface. Each recess is surrounded by a rim defining the respective recess. The susceptor also includes a plurality of ledges extending outward from the body. Each of the ledges is positioned in one of the recesses and includes an upward facing support surface for supporting a semiconductor wafer received in the recess. Each of the support surfaces is separate from the outer surface of the respective face.

摘要翻译： 用于在具有内部空间的加热室中支撑半导体晶片的桶形基座。 每个晶片具有前表面，后表面和周向侧。 感受体包括具有围绕身体的假想中心轴线布置的多个面的主体。 每个面具有外表面和从外表面横向向内延伸到体内的凹部。 每个凹部被限定相应凹部的边缘包围。 基座还包括从主体向外延伸的多个凸缘。 每个凸缘定位在一个凹部中，并且包括用于支撑容纳在凹部中的半导体晶片的朝上的支撑表面。 每个支撑表面与相应表面的外表面分开。

公开(公告)号：US20080314319A1

公开(公告)日：2008-12-25

申请号：US11965506

申请日：2007-12-27

申请人： Manabu Hamano ,  Srikanth Kommu ,  John A. Pitney ,  Thomas A. Torack ,  Lance G. Hellwig

发明人： Manabu Hamano ,  Srikanth Kommu ,  John A. Pitney ,  Thomas A. Torack ,  Lance G. Hellwig

IPC分类号： C23C16/00

CPC分类号： H01L21/68735 ,  C23C16/4583 ,  C30B25/12 ,  H01L21/68742

摘要： A susceptor for supporting a semiconductor wafer in a heated chamber having an interior space. The susceptor includes a body having an upper surface and a lower surface opposite the upper surface. The susceptor also has a recess extending downward from the upper surface into the body along an imaginary central axis. The recess is sized and shaped for receiving the semiconductor wafer therein. The susceptor includes a plurality of lift pin openings extending through the body from the recess to the lower surface. Each of the lift pin openings is sized for accepting lift pins to selectively lift and lower the wafer with respect to the recess. The susceptor has a central opening extending through the body along the central axis from the recess to the lower surface.

摘要翻译： 一种用于在具有内部空间的加热室中支撑半导体晶片的感受体。 感受体包括具有与上表面相对的上表面和下表面的主体。 基座还具有沿着假想的中心轴线从上表面向下延伸到主体中的凹部。 凹部的尺寸和形状用于在其中接收半导体晶片。 基座包括从凹部延伸穿过主体到下表面的多个提升销开口。 每个提升销开口的尺寸适于接受提升销，以相对于凹部选择性地提升和降低晶片。 基座具有中心开口，该中心开口沿着中心轴线延伸穿过主体从凹部到下表面。

公开(公告)号：US08404049B2

公开(公告)日：2013-03-26

申请号：US11965521

申请日：2007-12-27

申请人： Lance G. Hellwig ,  Srikanth Kommu ,  John A. Pitney

发明人： Lance G. Hellwig ,  Srikanth Kommu ,  John A. Pitney

IPC分类号： C23C16/00

CPC分类号： C30B25/12 ,  C23C16/4588

摘要： A barrel susceptor for supporting semiconductor wafers in a heated chamber having an interior space. Each of the wafers has a front surface, a back surface and a circumferential side. The susceptor includes a body having a plurality of faces arranged around an imaginary central axis of the body. Each face has an outer surface and a recess extending laterally inward into the body from the outer surface. Each recess is surrounded by a rim defining the respective recess. The susceptor also includes a plurality of ledges extending outward from the body. Each of the ledges is positioned in one of the recesses and includes an upward facing support surface for supporting a semiconductor wafer received in the recess. Each of the support surfaces is separate from the outer surface of the respective face.

摘要翻译： 用于在具有内部空间的加热室中支撑半导体晶片的桶形基座。 每个晶片具有前表面，后表面和周向侧。 感受体包括具有围绕身体的假想中心轴线布置的多个面的主体。 每个面具有外表面和从外表面横向向内延伸到体内的凹部。 每个凹部被限定相应凹部的边缘包围。 基座还包括从主体向外延伸的多个凸缘。 每个凸缘定位在一个凹部中，并且包括用于支撑容纳在凹部中的半导体晶片的向上的支撑表面。 每个支撑表面与相应表面的外表面分开。