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    Method and system for analyzing the quality of an OPC mask
    1.
    发明申请
    Method and system for analyzing the quality of an OPC mask 失效
    用于分析OPC掩模质量的方法和系统

    公开(公告)号：US20070079277A1

    公开(公告)日：2007-04-05

    申请号：US11239977

    申请日：2005-09-30

    申请人： Ilya Golubtsov ,  Stanislav Aleshin ,  Ranko Scepanovic ,  Sergei Rodin ,  Marina Medvedeva ,  Sergey Uzhakov ,  Evgueny Egorov ,  Nadya Strelkova

    发明人： Ilya Golubtsov ,  Stanislav Aleshin ,  Ranko Scepanovic ,  Sergei Rodin ,  Marina Medvedeva ,  Sergey Uzhakov ,  Evgueny Egorov ,  Nadya Strelkova

    IPC分类号： G06F17/50

    CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F7/705

    摘要： The present invention provides a method and system for analyzing the quality of an OPC mask. The method includes receiving a target layer from a target design, receiving an OPC mask layer from the OPC mask. The method also includes classifying each cell of at least one of the target layer and the OPC mask layer as either repeating or non-repeating, and for each repeating cell, recognizing geometric points in the target layer to determine quality measuring groups. The method also includes simulating the OPC mask layer based on the quality measuring groups, measuring edge placement errors (EPEs) based on at least one of the geometric points, and providing an EPE layer representing EPEs greater than an EPE threshold.

    摘要翻译： 本发明提供了一种用于分析OPC掩模的质量的方法和系统。 该方法包括从目标设计接收目标层，从OPC掩模接收OPC掩模层。 该方法还包括将目标层和OPC掩模层中的至少一个的每个单元分类为重复的或不重复的，并且对于每个重复的单元，识别目标层中的几何点以确定质量测量组。 该方法还包括基于质量测量组模拟OPC掩模层，基于至少一个几何点测量边缘放置误差（EPE），以及提供表示大于EPE阈值的EPE的EPE层。

    First approximation for OPC significant speed-up
    2.
    发明授权
    First approximation for OPC significant speed-up 失效
    第一次逼近OPC显着加速

    公开(公告)号：US06854104B2

    公开(公告)日：2005-02-08

    申请号：US10306067

    申请日：2002-11-27

    申请人： Stanislav Aleshin ,  Marina Medvedeva ,  Jaroslav Kalinin ,  Sergel Rodin

    发明人： Stanislav Aleshin ,  Marina Medvedeva ,  Jaroslav Kalinin ,  Sergel Rodin

    IPC分类号： G03F1/00 ,  G03F7/20 ,  H01L21/027 ,  G06F17/50 ,  G03C9/00

    CPC分类号： G03F7/70441 ,  G03F1/36

    摘要： An optical proximity correction system for local correction of an aerial image produced from a mask having transmissive portions and blocking portions collectively defining a target design includes an analyzer to match one or more segments of the target design to one or more typical case segments from a predetermined set of typical case segments; a controller, coupled to the analyzer, for approximating each of the one or more segments of the target design with matching typical case segments from the set of typical case segments to produce an adjusted aerial image. The method for optical proximity correction using local correction of an aerial image produced from a mask having transmissive portions and blocking portions collectively defining a target design, includes: a) analyzing the target design to produce one or more segments from the target design and to match the one or more segments to one or more typical case segments from a predetermined set of typical case segments; and b) approximating each of the one or more segments of the target design with the matching typical case segments from the set of typical case segments to produce an adjusted aerial image.

    摘要翻译： 用于局部校正由具有透射部分的掩模和共同限定目标设计的阻挡部分产生的空间图像的光学邻近校正系统包括分析器，用于将目标设计的一个或多个段与一个或多个典型的壳段相匹配， 典型案例分组; 耦合到分析器的控制器，用于利用来自典型情况段的集合的匹配典型情况段近似目标设计的一个或多个段中的每一个，以产生经调整的空间图像。 使用由具有透射部分的掩模和共同限定目标设计的阻挡部分产生的空间图像的局部校正的光学邻近校正方法包括：a）分析目标设计以从目标设​​计产生一个或多个段，并且匹配 所述一个或多个段到来自预定的一组典型情况段的一个或多个典型情况段; 以及b）使用来自典型情况段的集合的匹配典型情况段来近似目标设计的一个或多个段中的每一个，以产生经调整的空间图像。

    Method and system for improving aerial image simulation speeds
    4.
    发明申请
    Method and system for improving aerial image simulation speeds 失效
    改善航空图像模拟速度的方法和系统

    公开(公告)号：US20070143734A1

    公开(公告)日：2007-06-21

    申请号：US11305542

    申请日：2005-12-16

    申请人： Sergey Uzhakov ,  Stanislav Aleshin ,  Marina Medvedeva

    发明人： Sergey Uzhakov ,  Stanislav Aleshin ,  Marina Medvedeva

    IPC分类号： G06F17/50

    CPC分类号： G03F1/36

    摘要： A method and system for improving aerial image simulation speeds. The method includes receiving a mask; generating a matrix of node values based on the mask, wherein each node value corresponds to a node of a plurality of nodes in a lattice; performing a one-dimensional (1-D) approximation of a plurality of first approximation values at corresponding first approximation points between pairs of nodes of the plurality of nodes; performing a two-dimensional (2-D) approximation of second approximation values at corresponding second approximation points between pairs of first approximation points, wherein Chebyshev polynomials are used to approximate the first approximation values and the second approximation values. According to the method and system disclosed herein, approximating values using Chebyshev polynomials results in high-resolution aerial images that are generated at faster speeds.

    摘要翻译： 一种改善航空图像模拟速度的方法和系统。 该方法包括接收掩模; 基于所述掩码生成节点值的矩阵，其中每个节点值对应于格子中的多个节点的节点; 在所述多个节点的节点对之间的对应的第一近似点处执行多个第一近似值的一维（1-D）近似; 在第一近似点对之间的对应的第二近似点执行第二近似值的二维（2-D）近似，其中切比雪夫多项式用于近似第一近似值和第二近似值。 根据本文公开的方法和系统，使用切比雪夫多项式近似值导致以更快的速度产生的高分辨率航空图像。

    OPC edge correction based on a smoothed mask design
    5.
    发明申请
    OPC edge correction based on a smoothed mask design 有权
    基于平滑掩模设计的OPC边缘校正

    公开(公告)号：US20060129966A1

    公开(公告)日：2006-06-15

    申请号：US11012618

    申请日：2004-12-14

    申请人： Sergei Rodin ,  Stanislav Aleshin ,  Marina Medvedeva

    发明人： Sergei Rodin ,  Stanislav Aleshin ,  Marina Medvedeva

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5081 ,  G03F1/36 ,  G06F2217/12 ,  Y02P90/265

    摘要： A method and system is provided for performing edge correction on a mask design. Aspects of the invention include initially fragmenting boundaries of the mask design for optical proximity correction, whereby edge segments of the boundaries are moved by a distance value; interpreting the moved edge segments by defining a new endpoint for respective pairs of neighboring edge segments that meet at an angle, the endpoint being a location of where lines on which the edge segments lie intersect, wherein the new endpoint is used to create a smoothed feature, resulting in a smoothed OPC mask; calculating distances between all pairs of comparable edge segments of the smoothed OPC mask; comparing the distances to a design rule limit; for each edge segment having a distance that exceeds the design rule limit, decreasing the segment's distance value; and optimizing the mask design by repeating the above steps until no distance violations are found.

    摘要翻译： 提供了一种用于对掩模设计执行边缘校正的方法和系统。 本发明的方面包括用于光学邻近校正的掩模设计的开始的边界分割，由此边界的边缘段移动距离值; 通过为相交的边缘段对以一定角度定义新的端点来解释移动的边缘段，该端点是边缘段所在的线相交的位置，其中新的端点用于创建平滑特征 ，导致平滑的OPC掩模; 计算平滑OPC掩模的所有成对的可比较边缘段之间的距离; 将距离与设计规则限制进行比较; 对于每个边缘段具有超过设计规则限制的距离，减小段的距离值; 并通过重复上述步骤来优化掩模设计，直到找不到距离违规。

    Sidelobe correction for attenuated phase shift masks
    6.
    发明授权
    Sidelobe correction for attenuated phase shift masks 失效
    用于衰减相移掩模的旁瓣校正

    公开(公告)号：US06911285B2

    公开(公告)日：2005-06-28

    申请号：US10327451

    申请日：2002-12-20

    申请人： Stanislav Aleshin ,  Marina Medvedeva ,  Sergei Rodin

    发明人： Stanislav Aleshin ,  Marina Medvedeva ,  Sergei Rodin

    IPC分类号： G03C5/00 ,  G03F1/32 ,  G03F1/36 ,  G03F9/00 ,  G06F17/50

    CPC分类号： G03F1/32 ,  G03F1/36

    摘要： A method and system for simply and efficiently correcting sidelobe formation is disclosed. The method for reducing sidelobe formation in an aerial image created from an attenuated phase shift mask used in photolithography includes the steps of: a) generating a density map for an input design having a set of nodes identified as being outside of a periphery of the input design; b) examining the aerial image using the density map to compare an image intensity of the aerial image at a plurality of locations, each location corresponding to one node of the set of nodes; c) marking a node of the density map when the image intensity at the corresponding location of the aerial image satisfies a threshold intensity criterion and a separation distance criterion to create a set of marked nodes; and d) masking each node of the set of marked nodes.

    摘要翻译： 公开了简单有效地校正旁瓣形成的方法和系统。 用于减少由光刻中使用的衰减相移掩模产生的空间图像中的旁瓣形成的方法包括以下步骤：a）产生用于输入设计的密度图，该输入设计具有被识别为在输入的外围之外的一组节点 设计; b）使用密度图检查空中图像以比较多个位置处的空间图像的图像强度，每个位置对应于该组节点的一个节点; c）当空间图像的相应位置处的图像强度满足阈值强度标准和分离距离标准以创建一组标记节点时，标记密度图的节点; 以及d）屏蔽该组标记节点的每个节点。

    Automatic recognition of geometric points in a target IC design for OPC mask quality calculation
    7.
    发明申请
    Automatic recognition of geometric points in a target IC design for OPC mask quality calculation 失效

    公开(公告)号：US20060117292A1

    公开(公告)日：2006-06-01

    申请号：US11002576

    申请日：2004-12-01

    申请人： Sergei Rodin ,  Stanislav Aleshin ,  Ilya Golubtsov

    发明人： Sergei Rodin ,  Stanislav Aleshin ,  Ilya Golubtsov

    IPC分类号： G06F17/50

    CPC分类号： G03F1/36

    摘要： A method and system is provided for automatically recognizing geometric points of features in a target design for OPC mask quality calculation. For each feature in the target design, x, y points comprising the feature are traversed and each neighboring pair of points is connected to define respective segments, wherein a set of contiguous segments form a step if the x values of the segments/points all increase or decrease and the same is true for the y values. Physical characteristics of the segments of the respective features are determined by comparing lengths of the segments to one another and to threshold values. Locations of quality measuring points are then determined along particular ones of the segments based on the physical characteristics.