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1.发明授权Method of determining optical properties and projection exposure system comprising a wavefront detection system 有权确定光学特性的方法和包括波前检测系统的投影曝光系统公开(公告)号：US07230220B2
公开(公告)日：2007-06-12
申请号：US11387945
申请日：2006-03-24
CPC分类号： G03F7/706 , G03F7/70258
摘要： A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (λ1) and a second wavelength (λ2), wherein a first ratio is defined as an intensity of light λ2 to an intensity of light λ1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least λ1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of λ2 to an intensity of light of λ1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.
摘要翻译： 描述了一种确定投影曝光系统的至少一种光学特性的方法，其中曝光系统包括具有光源的光束传送系统，该光源用于产生具有第一波长（λ< SUB＆gt;）和第二波长（λ2 SUB），其中第一比率被定义为光λ2的光强度λ1， / SUB>曝光光束。 该方法包括向投影光学系统提供包括至少λ1的光的至少一个测量光束，检测已经穿过投影光学系统的波前，以及根据检测到的波前来确定光学特性 其中，所述测量光束中的λ2的光强度与λ1的光强度的第二比率入射在所述波前检测系统的检测器上 小于第一比例。
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2.发明申请Method of determining optical properties and projection exposure system comprising a wavefront detection system 有权确定光学特性的方法和包括波前检测系统的投影曝光系统公开(公告)号：US20060231731A1
公开(公告)日：2006-10-19
申请号：US11387945
申请日：2006-03-24
CPC分类号： G03F7/706 , G03F7/70258
摘要： A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (λ1) and a second wavelength (λ2), wherein a first ratio is defined as an intensity of light λ2 to an intensity of light λ1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least λ1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of λ2 to an intensity of light of λ1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.
摘要翻译： 描述了一种确定投影曝光系统的至少一种光学特性的方法，其中曝光系统包括具有光源的光束传送系统，该光源用于产生具有第一波长（λ< SUB＆gt;）和第二波长（λ2 SUB），其中第一比率被定义为光λ2的光强度λ1， / SUB>曝光光束。 该方法包括向投影光学系统提供包括至少λ1的光的至少一个测量光束，检测已经穿过投影光学系统的波前，以及根据检测到的波前来确定光学特性 其中，所述测量光束中的λ2的光强度与λ1的光强度的第二比率入射在所述波前检测系统的检测器上 小于第一比例。
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