公开(公告)号：US07230220B2

公开(公告)日：2007-06-12

申请号：US11387945

申请日：2006-03-24

申请人： Steffen Lauer ,  Ulrich Wegmann ,  Wolfgang Emer ,  Harald Sakowski ,  Martin Schriever

发明人： Steffen Lauer ,  Ulrich Wegmann ,  Wolfgang Emer ,  Harald Sakowski ,  Martin Schriever

IPC分类号： G01J1/20 ,  G03B27/74

CPC分类号： G03F7/706 ,  G03F7/70258

摘要： A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (λ1) and a second wavelength (λ2), wherein a first ratio is defined as an intensity of light λ2 to an intensity of light λ1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least λ1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of λ2 to an intensity of light of λ1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.

摘要翻译： 描述了一种确定投影曝光系统的至少一种光学特性的方法，其中曝光系统包括具有光源的光束传送系统，该光源用于产生具有第一波长（λ< SUB＆gt;）和第二波长（λ2 SUB），其中第一比率被定义为光λ2的光强度λ1， / SUB>曝光光束。 该方法包括向投影光学系统提供包括至少λ1的光的至少一个测量光束，检测已经穿过投影光学系统的波前，以及根据检测到的波前来确定光学特性 其中，所述测量光束中的λ2的光强度与λ1的光强度的第二比率入射在所述波前检测系统的检测器上 小于第一比例。

公开(公告)号：US20060231731A1

公开(公告)日：2006-10-19

申请号：US11387945

申请日：2006-03-24

申请人： Steffen Lauer ,  Ulrich Wegmann ,  Wolfgang Emer ,  Harald Sakowski ,  Martin Schriever

发明人： Steffen Lauer ,  Ulrich Wegmann ,  Wolfgang Emer ,  Harald Sakowski ,  Martin Schriever

IPC分类号： G01J1/20 ,  G01B11/02

CPC分类号： G03F7/706 ,  G03F7/70258

摘要： A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (λ1) and a second wavelength (λ2), wherein a first ratio is defined as an intensity of light λ2 to an intensity of light λ1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least λ1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of λ2 to an intensity of light of λ1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.

摘要翻译： 描述了一种确定投影曝光系统的至少一种光学特性的方法，其中曝光系统包括具有光源的光束传送系统，该光源用于产生具有第一波长（λ< SUB＆gt;）和第二波长（λ2 SUB），其中第一比率被定义为光λ2的光强度λ1， / SUB>曝光光束。 该方法包括向投影光学系统提供包括至少λ1的光的至少一个测量光束，检测已经穿过投影光学系统的波前，以及根据检测到的波前来确定光学特性 其中，所述测量光束中的λ2的光强度与λ1的光强度的第二比率入射在所述波前检测系统的检测器上 小于第一比例。

公开(公告)号：US07436521B2

公开(公告)日：2008-10-14

申请号：US11271806

申请日：2005-11-14

申请人： Wolfgang Emer ,  Ulrich Wegmann ,  Martin Schriever ,  Rainer Hoch

发明人： Wolfgang Emer ,  Ulrich Wegmann ,  Martin Schriever ,  Rainer Hoch

IPC分类号： G01B9/02 ,  G01B11/02 ,  G03B27/42

CPC分类号： G01M11/0264 ,  G01M11/0271 ,  G03F7/706 ,  G03F7/70875 ,  G03F7/70891

摘要： A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of radiation information, for example interference information, which is indicative of imaging errors, having a mask structure arrangement which contains a measurement pattern, and a device for detection and evaluation of the interference information which is indicative of imaging errors; also a method for operation of the optical imaging system including imaging error correction. The apparatus further includes a heating irradiation arrangement for radiation heating of the optical imaging system during measurement operation such that the heating effect of the radiation which is applied to the optical imaging system to be measured equals, within a tolerance range which can be predetermined, the heating effect of the radiation which is passed through the useful pattern during imaging operation of the optical imaging system.

摘要翻译： 用于光学，例如干涉测量光学成像系统的测量装置，成像操作中有用图案的成像，包括用于产生辐射信息的装置，例如指示成像误差的干扰信息，具有一个 包含测量图案的掩模结构布置，以及用于检测和评估指示成像误差的干扰信息的装置; 也是包括成像误差校正的光学成像系统的操作方法。 该装置还包括用于在测量操作期间对光学成像系统进行辐射加热的加热辐射装置，使得施加到待测量的光学成像系统的辐射的加热效应等于在可以预定的公差范围内 在光学成像系统的成像操作期间通过有用图案的辐射的加热效果。

公开(公告)号：US20060119838A1

公开(公告)日：2006-06-08

申请号：US11271806

申请日：2005-11-14

申请人： Wolfgang Emer ,  Ulrich Wegmann ,  Martin Schriever ,  Rainer Hoch

发明人： Wolfgang Emer ,  Ulrich Wegmann ,  Martin Schriever ,  Rainer Hoch

IPC分类号： G01B9/00

CPC分类号： G01M11/0264 ,  G01M11/0271 ,  G03F7/706 ,  G03F7/70875 ,  G03F7/70891

摘要： A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of radiation information, for example interference information, which is indicative of imaging errors, having a mask structure arrangement which contains a measurement pattern, and a device for detection and evaluation of the interference information which is indicative of imaging errors; also a method for operation of the optical imaging system including imaging error correction. The apparatus further includes a heating irradiation arrangement for radiation heating of the optical imaging system during measurement operation such that the heating effect of the radiation which is applied to the optical imaging system to be measured equals, within a tolerance range which can be predetermined, the heating effect of the radiation which is passed through the useful pattern during imaging operation of the optical imaging system.

摘要翻译： 用于光学，例如干涉测量光学成像系统的测量装置，成像操作中有用图案的成像，包括用于产生辐射信息的装置，例如指示成像误差的干扰信息，具有一个 包含测量图案的掩模结构布置，以及用于检测和评估指示成像误差的干扰信息的装置; 也是包括成像误差校正的光学成像系统的操作方法。 该装置还包括用于在测量操作期间对光学成像系统进行辐射加热的加热辐射装置，使得施加到待测量的光学成像系统的辐射的加热效应等于在可以预定的公差范围内 在光学成像系统的成像操作期间通过有用图案的辐射的加热效果。

公开(公告)号：US20050007602A1

公开(公告)日：2005-01-13

申请号：US10816896

申请日：2004-04-05

申请人： Helmut Haidner ,  Wolfgang Emer ,  Rainer Hoch ,  Ulrich Wegmann ,  Martin Schriever ,  Markus Goeppert

发明人： Helmut Haidner ,  Wolfgang Emer ,  Rainer Hoch ,  Ulrich Wegmann ,  Martin Schriever ,  Markus Goeppert

IPC分类号： G01B9/02 ,  G01J9/04

CPC分类号： G03F7/706 ,  G01J9/04 ,  G01M11/0264 ,  G01M11/0271

摘要： Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and/or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.

摘要翻译： 用于通过相移干涉测量法对光学成像系统进行波前测量的装置和方法，具有要布置在物体侧的掩模结构（6a）和/或要布置在像侧的光栅结构（7a） 。 物体侧掩模结构包括一个或多个一维掩模结构图案，并且图像侧光栅结构包括一个或多个二维光栅结构图案。 或者，相反地，掩模结构包括一个或多个二维图案，并且光栅结构包括一个或多个一维图案。 附加地或替代地，由掩模结构和检测器元件的横向相对移动引起的瞳孔位置偏移可以通过使用相关联的相移特性反向计算分别由检测器元件记录的干涉图来考虑， 从记录的干涉图中获得的横向运动方向的波前衍生的计算校正。 该方法和/或装置可以通过例如用于在使用剪切或点干涉测量的微光刻曝光机的高分辨率投影物镜的情况下确定像差。

公开(公告)号：US07417745B2

公开(公告)日：2008-08-26

申请号：US10816896

申请日：2004-04-05

申请人： Helmut Haidner ,  Wolfgang Emer ,  Rainer Hoch ,  Ulrich Wegmann ,  Martin Schriever ,  Markus Goeppert

发明人： Helmut Haidner ,  Wolfgang Emer ,  Rainer Hoch ,  Ulrich Wegmann ,  Martin Schriever ,  Markus Goeppert

IPC分类号： G01B9/02

CPC分类号： G03F7/706 ,  G01J9/04 ,  G01M11/0264 ,  G01M11/0271

摘要： Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and/or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.

摘要翻译： 用于通过相移干涉测量法对具有要布置在物体侧的掩模结构（6a）的光学成像系统的波前测量的装置和方法和/或布置在物体侧上的光栅结构（7a） 形象一面 物体侧掩模结构包括一个或多个一维掩模结构图案，并且图像侧光栅结构包括一个或多个二维光栅结构图案。 或者，相反地，掩模结构包括一个或多个二维图案，并且光栅结构包括一个或多个一维图案。 附加地或替代地，由掩模结构和检测器元件的横向相对移动引起的瞳孔位置偏移可以通过使用相关联的相移特性反向计算分别由检测器元件记录的干涉图来考虑， 从记录的干涉图中获得的横向运动方向的波前衍生的计算校正。 该方法和/或装置可以通过例如用于在使用剪切或点干涉测量的微光刻曝光机的高分辨率投影物镜的情况下确定像差。

公开(公告)号：US07286245B2

公开(公告)日：2007-10-23

申请号：US10628431

申请日：2003-07-29

申请人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

发明人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

IPC分类号： G01B9/02

CPC分类号： G03F7/70566 ,  G01J4/04 ,  G01M11/0271 ,  G01M11/0285 ,  G02B27/0025 ,  G03F7/70591

摘要： A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of polarization is directed onto the optical system, the exit-side state of polarization is measured, and the influencing of the state of polarization is determined by the optical system with the aid of evaluation of the exit state of polarization with reference to the entrance state of polarization. An analyser arrangement which can be used for this purpose is also disclosed. The method and the apparatus are used, e.g., to determine the influencing of the state of polarization of optical radiation by an optical imaging system of prescribable aperture, the determination being performed in a pupil-resolved fashion.

摘要翻译： 一种用于通过被测光学系统确定光辐射的偏振状态的影响的方法和装置，其中具有限定的入射极化状态的辐射被引导到光学系统上，测量出射侧的偏振态， 并且通过参考偏振的入射状态来评估偏振的退出状态，由光学系统确定极化状态的影响。 还公开了可用于此目的的分析装置。 使用该方法和装置，例如通过具有规定孔径的光学成像系统来确定光学辐射的偏振状态的影响，该确定以瞳孔分辨的方式执行。

公开(公告)号：US20120113429A1

公开(公告)日：2012-05-10

申请号：US13351710

申请日：2012-01-17

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/02

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US20090021726A1

公开(公告)日：2009-01-22

申请号：US12147034

申请日：2008-06-26

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/00

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

公开(公告)号：US07336371B1

公开(公告)日：2008-02-26

申请号：US10766014

申请日：2004-01-29

申请人： Helmut Haidner ,  Markus Goeppert ,  Martin Schriever ,  Ulrich Wegmann

发明人： Helmut Haidner ,  Markus Goeppert ,  Martin Schriever ,  Ulrich Wegmann

IPC分类号： G01B9/02

CPC分类号： G01M11/0271 ,  G03F7/706

摘要： A device and a method for wavefront measurement of an optical system (7), in particular by an interferometric measurement technique. A dynamic range correction element (12, 12a) is arranged in the beam path upstream of the detector arrangement (11) and is designed such that the variation in the spatially dependent characteristic of a phase of the wavefront forming the interference pattern is kept below a prescribed limit value throughout a detection area. In addition or as an alternative, a set of several diffraction structures of different period length can be used with a shearing interferometry technique and/or a set of several pairs of a reference pinhole and a signal passage opening with different hole spacings can be used with a point diffraction interferometry technique for different sub-areas of the detection area. A remaining distortion error can be taken into account by determining a corresponding distortion transformation and applying the inverse distortion transformation.

摘要翻译： 一种用于光学系统（7）的波前测量的装置和方法，特别是通过干涉测量技术。 动态范围校正元件（12,12a）被布置在检测器装置（11）的上游的光束路径中，并且被设计成使得形成干涉图案的波阵面的相位的空间相关特性的变化保持在 在整个检测区域的规定的极限值。 另外或作为替代，可以使用剪切干涉测量技术的一组不同周期长度的几种衍射结构，和/或一组几对参考针孔和具有不同孔间距的信号通道开口可以与 用于检测区域的不同子区域的点衍射干涉测量技术。 可以通过确定相应的失真变换并应用逆失真变换来考虑剩余的失真误差。