公开(公告)号：US20070190200A1

公开(公告)日：2007-08-16

申请号：US11690480

申请日：2007-03-23

Applicant: Anshuman Cherala ,  Byung-Jin Choi ,  Pankaj Lad ,  Steven Shackleton

Inventor： Anshuman Cherala ,  Byung-Jin Choi ,  Pankaj Lad ,  Steven Shackleton

IPC: B28B11/08

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/6838 ,  H01L21/6875

Abstract: The present invention is directed towards a chucking system to hold a substrate, said system including, inter alia, a chuck body having first and second opposed sides, said first side including an array of fluid chambers arranged in rows and columns, said fluid chambers each comprising first and second spaced-apart recesses defining first and second spaced-apart support regions, with said first support region cincturing said second support region and said first and second recesses, and said second support region cincturing said second recess, with said substrate resting against said first and second support regions, with said first recess and a portion of said substrate in superimposition therewith defining a first chamber and said second recess and a portion of said substrate in superimposition therewith defining a second chamber, with each column of said first chambers and each row of said second chambers being in fluid communication with a differing source of fluid to control a flow of fluid in said array of fluid chambers.

Abstract translation: 本发明涉及一种用于夹持基板的夹紧系统，所述系统尤其包括具有第一和第二相对侧面的卡盘体，所述第一侧包括排列成行和列的流体室阵列，所述流体室各自 包括限定第一和第二间隔开的支撑区域的第一和第二间隔开的凹部，其中所述第一支撑区域使所述第二支撑区域和所述第一和第二凹部相互影响，并且所述第二支撑区域使所述第二凹部相互嵌合， 所述第一和第二支撑区域与所述第一凹部和所述基板的一部分重叠地限定第一腔室和所述第二凹部以及与所述基底的一部分重叠形成第二腔室，所述第一腔室的每一列和 每排所述第二室与不同的流体源流体连通以控制流动 在所述流体室阵列中的流体。

公开(公告)号：US20060121141A1

公开(公告)日：2006-06-08

申请号：US11101139

申请日：2005-04-07

Applicant: Steven Shackleton ,  Ian McMackin ,  Pankaj Lad ,  Van Truskett

Inventor： Steven Shackleton ,  Ian McMackin ,  Pankaj Lad ,  Van Truskett

IPC: B29C35/08

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

Abstract: A system for controlling a volume of liquid on a mold that features a body defining a volume with an aperture formed into the body and positioned proximate to the mold. A pump system is in fluid communication with the body, and the aperture and the pump system are established to create a stream of fluid moving between the mold and the volume. In this manner a quantity of fluid is removed while retained upon the mold is a desired portion of the fluid to undertake imprint lithographic processes.

Abstract translation: 一种用于控制模具上的液体体积的系统，其特征在于，具有限定体积的主体，所述体积具有形成在所述主体中并且定位成靠近所述模具的孔。 泵系统与主体流体连通，并且孔和泵系统被建立以产生在模具和体积之间移动的流体流。 以这种方式，除去一定量的流体，同时保留在模具上是流体的期望部分以进行压印光刻工艺。

公开(公告)号：US20070228608A1

公开(公告)日：2007-10-04

申请号：US11694193

申请日：2007-03-30

Applicant: Steven Shackleton ,  Pankaj Lad ,  Ian McMackin ,  Frank Xu ,  Sidlgata Sreenivasan

Inventor： Steven Shackleton ,  Pankaj Lad ,  Ian McMackin ,  Frank Xu ,  Sidlgata Sreenivasan

IPC: B29C35/08 ,  B29C43/02

CPC classification number: G03F7/0002 ,  B29C43/003 ,  B29C43/021 ,  B29C43/34 ,  B29C2043/025 ,  B29C2043/142 ,  B29C2043/3438 ,  B29K2105/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.

Abstract translation: 在与基底接触之前在模板上固化印模的方法/方法。 使用固化过程将印记粘附到晶片或基板上。 将单体沉积在模板上，然后使用UV曝光部分固化。 控制曝光使得印迹经过凝胶点固化，但仍然保留在将与晶片结合的表面上的未固化单体的薄液体层。 此外，这种部分固化的层使得能够在两者之间接触之后进行模板和基板之间的对准调整，而不将任何单体拉出特征。