公开(公告)号：US06436193B1

公开(公告)日：2002-08-20

申请号：US09534342

申请日：2000-03-24

申请人： Shigeru Kasai ,  Teruo Iwata ,  Taro Komiya ,  Tomihiro Yonenaga

发明人： Shigeru Kasai ,  Teruo Iwata ,  Taro Komiya ,  Tomihiro Yonenaga

IPC分类号： C23C1600

CPC分类号： C23C16/45565 ,  C23C16/455 ,  C23C16/45514 ,  H01J37/3244

摘要： A gas processing apparatus is disclosed, that comprises a processing chamber that is airtightly structured, a gas delivery pipe connected to the processing chamber, a gas supply source for supplying gas to the processing chamber through the gas delivery pipe, a holding table for holding a workpiece loaded to the processing chamber, a shower member disposed at a gas outlet of the gas delivery pipe connected to the processing chamber, a spray plate structured as a partition wall of the shower member that faces the holding plate, the spray plate having a plurality of spray holes, and a baffle member disposed between the spray plate in the shower member and the gas outlet and having a plurality of through-holes formed perpendicular to the surface of the baffle member, wherein each of the through-holes of the baffle member has a first opening portion and a second opening portion facing the gas outlet, the second opening portion facing the spray plate, the opening area of the second opening portion being larger than the opening portion of the first opening portion. Thus, a gas processing apparatus and a gas processing method that allow gas to be uniformly supplied to the entire surface of a workpiece are provided. In addition, a baffle member for use with the gas processing apparatus and the gas processing method is provided.

摘要翻译： 公开了一种气体处理装置，其包括气密结构的处理室，连接到处理室的气体输送管，用于通过气体输送管向处理室供应气体的气体供给源，用于保持 装载到处理室的工件，设置在连接到处理室的气体输送管的气体出口处的喷淋构件，构成为与保持板相对的淋浴构件的分隔壁的喷射板，喷射板具有多个 的喷孔，以及设置在淋浴构件中的喷射板和气体出口之间的挡板构件，并且具有垂直于挡板构件的表面形成的多个通孔，其中挡板构件的每个通孔 具有面向气体出口的第一开口部分和第二开口部分，面向喷射板的第二开口部分，第二开口的开口区域 部分大于第一开口部分的开口部分。 因此，提供了允许气体均匀地供应到工件的整个表面的气体处理装置和气体处理方法。 此外，提供了一种与气体处理装置一起使用的挡板部件和气体处理方法。

公开(公告)号：US07648610B2

公开(公告)日：2010-01-19

申请号：US10168451

申请日：2000-12-21

申请人： Taro Komiya ,  Hatsuo Osada ,  Shigetoshi Hosaka ,  Tomihiro Yonenaga ,  Masayuki Tomoyasu

发明人： Taro Komiya ,  Hatsuo Osada ,  Shigetoshi Hosaka ,  Tomihiro Yonenaga ,  Masayuki Tomoyasu

IPC分类号： H01L21/3065 ,  H01L21/306 ,  C23C16/00 ,  C23C16/455

CPC分类号： H01J37/32449 ,  B01J2219/00777 ,  C23C16/4412 ,  C23C16/45591 ,  H01J37/3244 ,  H01J37/32834

摘要： The present invention provides a gas process apparatus that realizes uniform exhaust without depending on process conditions, a gas process chamber that constitutes the gas process apparatus, a baffle plate mounted on the gas process chamber, a method of producing the baffle plate, and an apparatus for producing the baffle plate. The baffle plate of the present invention serves as a partition between a process space in which a chemical process is carried out with a supplied gas, and a duct that is adjacent to the process space and functions to discharge exhaust gas generated as a result of the chemical process. In accordance with the difference between the pressures on both sides of the baffle plate, which difference varies depending on the location on the baffle plate, the baffle holes are disposed on a plurality of locations on the baffle plate.

摘要翻译： 本发明提供了一种不依赖于工艺条件实现均匀排气的气体处理装置，构成气体处理装置的气体处理室，安装在气体处理室上的挡板，制造挡板的方法，以及装置 用于制造挡板。 本发明的挡板用作在其中进行化学处理的处理空间与供给的气体之间的隔板以及与处理空间相邻的管道，并且其功能是排出由于 化学过程。 根据挡板两侧的压力差，该差异根据挡板上的位置而变化，挡板孔设置在挡板上的多个位置上。