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1.发明申请公开(公告)号：US20140022783A1
公开(公告)日：2014-01-23
申请号：US14007472
申请日：2012-03-29
CPC分类号： G02B5/0221 , F21V3/049 , F21V5/002 , G02B5/0278 , G02B5/0294
摘要： Light transmissive structures include a light transmissive substrate that includes optical microstructures. The optical microstructures have a geometric feature that is configured to reduce glare in light transmitted through the light transmissive structure. Moreover, the plurality of optical microstructures also have a geometric feature that is configured to vary randomly and/or pseudorandomly across the light transmissive substrate so as to diffuse light transmitted through the light transmissive structure. Related fabrication methods are also described.
摘要翻译： 透光结构包括包含光学微结构的透光基底。 光学微结构具有几何特征，其被配置为减少透射通过透光结构的光的眩光。 此外，多个光学微结构还具有被配置为跨透光基板随机和/或伪随机变化以便扩散透过透光结构的光的几何特征。 还描述了相关的制造方法。
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2.发明授权Methods for fabricating optical microstructures by imaging a radiation sensitive layer sandwiched between outer layers 有权通过成像夹在外层之间的辐射敏感层来制造光学微结构的方法公开(公告)号：US07425407B1
公开(公告)日：2008-09-16
申请号：US11465358
申请日：2006-08-17
CPC分类号： G03F7/0015 , G02B3/0025 , G02B3/0031 , G02B5/1852 , G02B5/1857 , G03F7/0005 , G03F7/161 , Y10S430/146
摘要： Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined in the radiation sensitive layer are developed. The radiation sensitive layer sandwiched between the pair of outer layers may be fabricated as webs, to provide microstructure master blanks.
摘要翻译： 通过在成像平台上成像包括夹在一对外层之间的辐射敏感层的微结构母板来形成微结构，以限定辐射敏感层中的微结构。 然后去除至少一个外层。 开发了在辐射敏感层中定义的微结构。 夹在一对外层之间的辐射敏感层可以制成网，以提供微结构母板坯。
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3.发明授权Methods for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam 有权使用圆柱形平台和旋转辐射束制造光学微结构的方法公开(公告)号：US07763417B2
公开(公告)日：2010-07-27
申请号：US11465377
申请日：2006-08-17
IPC分类号： G11B7/26
CPC分类号： G02B3/0031 , G02B3/0012 , G02B3/0043 , G02B5/1857
摘要： Optical microstructures, such as microlenses, are fabricated by rotating a cylindrical platform that includes a radiation sensitive layer thereon, about its axis, while simultaneously axially rastering a laser beam across at least a portion of the radiation sensitive layer. The cylindrical platform is also simultaneously translated axially while it is being rotated. The amplitude of the laser beam is continuously varied while rastering. The optical microstructures that are imaged in the radiation sensitive layer can be developed to provide a master for replicating a microlenses.
摘要翻译： 诸如微透镜的光学微结构通过围绕其轴线旋转包括辐射敏感层的圆柱形平台来制造，同时沿着辐射敏感层的至少一部分轴向地扫描激光束。 圆柱形平台在旋转的同时也被轴向同时平移。 激光束的幅度连续变化。 可以开发在辐射敏感层中成像的光学微结构以提供用于复制微透镜的母版。
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4.发明申请METHODS AND APPARATUS FOR PROCESSING A LARGE AREA PULSED LASER BEAM TO CREATE APERTURES THROUGH MICROLENS ARRAYS 失效用于处理大面积脉冲激光束以通过微阵列产生孔径的方法和装置公开(公告)号：US20080259461A1
公开(公告)日：2008-10-23
申请号：US12120834
申请日：2008-05-15
IPC分类号： G02B27/10
CPC分类号： G02B3/0056 , G02B27/0927 , G02B27/0988
摘要： A pulsed laser beam is used to create apertures in a layer on a back side of a substrate that includes a microlens array on a front side thereof. The pulsed laser beam is focused in a vacuum spatial filter. A profile of the pulsed laser beam that emerges from the vacuum spatial filter is converted to a top hat profile. The laser beam having the top hat profile is diffused. Finally, the pulsed laser beam having the top half profile that has been diffused is impinged through the microlens array on the front side of the substrate and onto the layer on the back side of the substrate. Related apparatus for creating the apertures and microlens array products are also described.
摘要翻译： 使用脉冲激光束在衬底的背面上的层中产生孔，该衬底的前侧包括微透镜阵列。 脉冲激光束聚焦在真空空间滤光片中。 将从真空空间滤波器出来的脉冲激光束的轮廓转换成顶帽型材。 具有顶帽型材的激光束被扩散。 最后，具有已经扩散的上半部分轮廓的脉冲激光束通过衬底正面上的微透镜阵列和衬底的背面上的层上。 还描述了用于产生孔和微透镜阵列产品的相关装置。
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公开(公告)号：US4569881A
公开(公告)日：1986-02-11
申请号：US599647
申请日：1984-04-12
IPC分类号： G11B5/851 , G11B11/10 , G11B11/105 , G11C13/06 , G11B9/00
CPC分类号： G11B11/10593 , G11B11/10584 , G11B11/10586 , G11B11/10591 , G11B5/851 , Y10S428/90 , Y10T428/2495
摘要： A multi-layer magneto optical thin film recording medium is disclosed having very high carrier-to-noise ratios (at least 47 decibels) and high rotation angles. A transmission electron microscope photomicrograph (at 200,000 X) of one such medium is shown in FIG. 1. The magneto optic layer is a multi-phase amorphous material having magnetic anisotropy perpendicular to the plane of the thin film produced in a triode vacuum sputtering process at vacuums in the range of 4.times.10.sup.-3 to 6.times.10.sup.-4 Torr. Various transparent layers, such as dielectric intermediate and anti-reflective layers and a protective covering layer, are combined with the magneto optic layer and a reflective surface to yield media having enhanced carrier-to-noise ratio and magnetic optic angle of rotation.
摘要翻译： 公开了具有非常高的载波噪声比（至少47分贝）和高旋转角度的多层磁光薄膜记录介质。 图1中示出了一种这样的介质的透射电子显微镜显微照片（在200,000×）。 磁光层是具有垂直于薄膜平面的磁各向异性的多相非晶材料，其在真空度为4×10 -3至6×10 -4乇的三极管真空溅射工艺中制得。 各种透明层，例如电介质中间层和抗反射层以及保护覆盖层与磁光层和反射表面组合，以产生具有增强的载波信噪比和磁光旋转角的介质。
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6.发明授权Methods for mastering microstructures through a substrate using negative photoresist 有权通过使用负性光致抗蚀剂的底物来掌握微结构的方法公开(公告)号：US07867695B2
公开(公告)日：2011-01-11
申请号：US10661917
申请日：2003-09-11
IPC分类号： G02B27/72
CPC分类号： G02B3/0025 , B82Y10/00 , B82Y40/00 , G02B5/1857 , G03F7/0002 , G03F7/0005 , G03F7/0007 , G03F7/0015 , G03F7/2053 , G03F7/24
摘要： Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems, microstructure products and microstructure masters also are disclosed.
摘要翻译： 通过将诸如激光束的辐射束通过对激光束透明的衬底照射到衬底上的负光致抗蚀剂层中来制造微结构。 可以随后显影负性光致抗蚀剂层以提供用于光学和/或机械微结构的母版。 还公开了相关系统，微结构产品和微结构主体。
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7.发明授权Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers 有权通过成像夹在外层之间的辐射敏感层来制造微结构的方法公开(公告)号：US07192692B2
公开(公告)日：2007-03-20
申请号：US10661974
申请日：2003-09-11
IPC分类号： G03F7/20
CPC分类号： G03F7/0015 , G02B3/0025 , G02B3/0031 , G02B5/1852 , G02B5/1857 , G03F7/0005 , G03F7/161 , Y10S430/146
摘要： Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined in the radiation sensitive layer are developed. The radiation sensitive layer sandwiched between the pair of outer layers may be fabricated as webs, to provide microstructure master blanks.
摘要翻译： 通过在成像平台上成像包括夹在一对外层之间的辐射敏感层的微结构母板来形成微结构，以限定辐射敏感层中的微结构。 然后去除至少一个外层。 开发了在辐射敏感层中定义的微结构。 夹在一对外层之间的辐射敏感层可以制成网，以提供微结构母板坯。
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8.发明授权Methods for mastering microstructures through a substrate using negative photoresist 有权通过使用负性光致抗蚀剂的底物来掌握微结构的方法公开(公告)号：US08263318B2
公开(公告)日：2012-09-11
申请号：US12958153
申请日：2010-12-01
IPC分类号： G02B27/72
CPC分类号： G02B3/0025 , B82Y10/00 , B82Y40/00 , G02B5/1857 , G03F7/0002 , G03F7/0005 , G03F7/0007 , G03F7/0015 , G03F7/2053 , G03F7/24
摘要： Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems, microstructure products and microstructure masters also are disclosed.
摘要翻译： 通过将诸如激光束的辐射束通过对激光束透明的衬底照射到衬底上的负光致抗蚀剂层中来制造微结构。 可以随后显影负性光致抗蚀剂层以提供用于光学和/或机械微结构的母版。 还公开了相关系统，微结构产品和微结构主体。
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9.发明申请METHODS FOR MASTERING MICROSTRUCTURES THROUGH A SUBSTRATE USING NEGATIVE PHOTORESIST 有权通过使用负离子光栅的基板来实现微结构的方法公开(公告)号：US20110070547A1
公开(公告)日：2011-03-24
申请号：US12958153
申请日：2010-12-01
IPC分类号： G03F7/20
CPC分类号： G02B3/0025 , B82Y10/00 , B82Y40/00 , G02B5/1857 , G03F7/0002 , G03F7/0005 , G03F7/0007 , G03F7/0015 , G03F7/2053 , G03F7/24
摘要： Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems, microstructure products and microstructure masters also are disclosed.
摘要翻译： 通过将诸如激光束的辐射束通过对激光束透明的衬底照射到衬底上的负光致抗蚀剂层中来制造微结构。 可以随后显影负性光致抗蚀剂层以提供用于光学和/或机械微结构的母版。 还公开了相关系统，微结构产品和微结构主体。
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公开(公告)号：US07808706B2
公开(公告)日：2010-10-05
申请号：US11053998
申请日：2005-02-09
申请人： Edward Fadel , Robert P. Freese , Richard N. Gardner , Michele E. Nuzum , David L. Reed , Thomas A. Rinehart , Robert L. Wood
发明人： Edward Fadel , Robert P. Freese , Richard N. Gardner , Michele E. Nuzum , David L. Reed , Thomas A. Rinehart , Robert L. Wood
IPC分类号： G02B27/10 , G02F1/1335
CPC分类号： G02B6/0036 , G02B3/0031 , G02B3/0056 , G02B6/0046 , G02B6/005 , G02B6/0055 , G02F1/133526
摘要： Microlens arrays include a substrate, an array of microlenses on a first side of the substrate and an aperture mask on a second side of the substrate. The aperture mask includes an array of apertures at optical axes of the lenses. A second array of apertures may be included in the aperture mask at randomized positions therein. The randomized apertures may be provided in the aperture mask by providing a diffusive layer between the aperture mask and the substrate, and directing coherent radiation through the lens array, the diffusive layer and aperture mask.
摘要翻译： 微透镜阵列包括衬底，在衬底的第一侧上的微透镜阵列和衬底的第二侧上的孔径掩模。 孔径掩模包括在透镜的光轴处的孔阵列。 第二阵列的孔可以包括在孔掩模中的随机位置。 可以通过在孔径掩模和衬底之间提供扩散层并且引导相干辐射穿过透镜阵列，扩散层和孔径掩模，来将孔隙掩模中的随机化孔径设置在孔径掩模中。
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